arXiv subjects

Jennifer Selvidge

Publications and source records attributed to Jennifer Selvidge.

5 recordsLinked to original sources

arXiv2024

Large Area Near-Field Thermophotovoltaics for Low Temperature Applications

Thermophotovoltaics, devices that convert thermal infrared photons to electricity, offer a key pathway for a variety of critical renewable energy technologies including thermal energy storage, waste heat recovery, and direct solar-thermal power generation. However, conventional far-field devices struggle to generate reasonable powers at lower temperatures. Near-field thermophotovoltaics provide a pathway to substantially higher powers by leveraging photon tunneling effects. Here we present a large area near-field thermophotovoltaic device, created with an epitaxial co-fabrication approach, that consists of a self-supported 0.28 cm2 emitter-cell pair with a 150 nm gap. The device generates 1.22 mW at 460 C, a twenty-five-fold increase over the same cell measured in a far-field configuration. Furthermore, the near-field device demonstrates short circuit current densities greater than the far-field photocurrent limit at all the temperatures tested, confirming the role of photon tunneling effects in the performance enhancement. Modeling suggests several practical directions for cell improvements and further increases in power density. These results highlight the promise of near-field thermophotovoltaics, especially for low temperature applications.

cond-mat.mtrl-sci↗

arXiv2023

Dislocation-induced structural and luminescence degradation in InAs quantum dot emitters on silicon

We probe the extent to which dislocations reduce carrier lifetimes and alter luminescence and growth morphology in InAs quantum dots (QD) grown on silicon. These heterostructures are key ingredients to achieving a highly reliable monolithically integrated light source on silicon necessary for photonic integrated circuits. We find up to 20-30% shorter carrier lifetimes at spatially resolved individual dislocations from both the QD ground and excited states at room temperature using time-resolved cathodoluminescence spectroscopy. These lifetimes are consistent with differences in the intensity measured under steady-state excitation suggesting that trap-assisted recombination limits the minority carrier lifetime, even away from dislocations. Our techniques also reveal the dramatic growth of misfit dislocations in these structures under carrier injection fueled by recombination-enhanced dislocation glide and III-V/Si residual strain. Beyond these direct effects of increased nonradiative recombination, we find the long-range strain field of misfit dislocations deeper in the defect filter layers employed during III-V/Si growth alter the QD growth environment and introduce a crosshatch-like variation in the QD emission color and intensity when the filter layer is positioned close to the QD emitter layer. Sessile threading dislocations generate even more egregious hillock defects that also reduce emission intensities by altering layer thicknesses, as measured by transmission electron microscopy and atom probe tomography. Our work presents a more complete picture of the impacts of dislocations relevant for the development of light sources for scalable silicon photonic integrated circuits.

cond-mat.mes-hall↗

arXiv2021

Laser soliton microcombs on silicon

Silicon photonics enables wafer-scale integration of optical functionalities on chip. A silicon-based laser frequency combs could significantly expand the applications of silicon photonics, by providing integrated sources of mutually coherent laser lines for terabit-per-second transceivers, parallel coherent LiDAR, or photonics-assisted signal processing. Here, we report on heterogeneously integrated laser soliton microcombs combining both InP/Si semiconductor lasers and ultralow-loss silicon nitride microresonators on monolithic silicon substrate. Thousands of devices are produced from a single wafer using standard CMOS techniques. Using on-chip electrical control of the microcomb-laser relative optical phase, these devices can output single-soliton microcombs with 100 GHz repetition rate. Our approach paves the way for large-volume, low-cost manufacturing of chip-based frequency combs for next-generation high-capacity transceivers, datacenters, space and mobile platforms.

physics.optics↗

arXiv2020

Defect filtering for thermal expansion induced dislocations in III-V lasers on silicon

Epitaxially integrated III-V semiconductor lasers for silicon photonics have the potential to dramatically transform information networks, but currently, dislocations limit performance and reliability even in defect tolerant InAs quantum dot (QD) based lasers. Despite being below critical thickness, QD layers in these devices contain previously unexplained misfit dislocations, which facilitate non-radiative recombination. We demonstrate here that these misfit dislocations form during post-growth cooldown due to the combined effects of (1) thermal-expansion mismatch between the III-V layers and silicon and (2) precipitate and alloy hardening in the active region. By incorporating an additional sub-critical thickness, indium-alloyed misfit dislocation trapping layer, we leverage these mechanical hardening effects to our advantage, successfully displacing 95% of misfit dislocations from the QD layer in model structures. Unlike conventional dislocation mitigation strategies, the trapping layer reduces neither the number of threading dislocations nor the number of misfit dislocations. It simply shifts the position of misfit dislocations away from the QD layer, reducing the defects' impact on luminescence. In full lasers, adding a misfit dislocation trapping layer both above and below the QD active region displaces misfit dislocations and substantially improves performance: we measure a twofold reduction in lasing threshold currents and a greater than threefold increase in output power. Our results suggest that devices employing both traditional threading dislocation reduction techniques and optimized misfit dislocation trapping layers may finally lead to fully integrated, commercially viable silicon-based photonic integrated circuits.

physics.app-ph↗

arXiv2019

A narrow-linewidth III-V/Si/Si3N4 laser using multilayer heterogeneous integration

Silicon nitride (Si3N4), as a complementary metal-oxide-semiconductor (CMOS) material, finds wide use in modern integrated circuit (IC) technology. The past decade has witnessed tremendous development of Si3N4 in photonic areas, with innovations in nonlinear photonics, optical sensing, etc. However, the lack of an integrated laser with high performance prohibits the large-scale integration of Si3N4 waveguides into complex photonic integrated circuits (PICs). Here, we demonstrate a novel III-V/Si/Si3N4 structure to enable efficient electrically pumped lasing in a Si3N4 based laser external cavity. The laser shows superior temperature stability and low phase noise compared with lasers purely dependent on semiconductors. Beyond this, the demonstrated multilayer heterogeneous integration provides a practical path to incorporate efficient optical gain with various low-refractive-index materials. Multilayer heterogeneous integration could extend the capabilities of semiconductor lasers to improve performance and enable a new class of devices such as integrated optical clocks and optical gyroscopes.

physics.app-ph↗