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Jesús D. Cifuentes

Publications and source records attributed to Jesús D. Cifuentes.

5 recordsLinked to original sources

Gate Stack Engineering for High-Mobility and Low-Noise SiMOS Quantum Devices

We systematically investigate the interplay between materials engineering, quantum transport, and low-frequency charge noise in silicon metal--oxide--semiconductor (SiMOS) quantum devices. By combining Hall-bar transport measurements with charge-noise spectroscopy of gate-defined quantum dots, we identify correlations between gate-stack design, carrier mobility, and electrostatic noise, providing an experimental case study of material and process dependencies relevant to low-noise, high-mobility operation. Hall-bar studies reveal that increasing the atomic-layer-deposition temperature of Al$_2$O$_3$ markedly enhances mobility, whereas the choice of oxidant has little impact. Devices incorporating HfO$_2$ exhibit improved carrier mobility, an interesting observation that can plausibly be attributed to defect passivation associated with aluminum diffusion from the gate metal into the HfO$_2$ layer. Charge-noise measurements show a strong correlation between higher mobility and reduced noise, with TiPd-gated devices displaying both degraded transport and elevated charge noise. In contrast, the poly-Si-gated CMOS-foundry device achieves the lowest noise levels. Finally, dual-feedback dot--sensor stability mapping demonstrates enhanced charge stability in devices with the gate stacks studied here, underscoring their promise for scalable, high-fidelity silicon spin-qubit platforms.

cond-mat.mes-hall↗

Enhancement of Electric Drive in Silicon Quantum Dots with Electric Quadrupole Spin Resonance

Quantum computation with electron spin qubits requires coherent and efficient manipulation of these spins, typically accomplished through the application of alternating magnetic or electric fields for electron spin resonance (ESR). In particular, electrical driving allows us to apply localized fields on the electrons, which benefits scale-up architectures. However, we have found that Electric Dipole Spin Resonance (EDSR) is insufficient for modeling the Rabi behavior in recent experimental studies. Therefore, we propose that the electron spin is being driven by a new method of electric spin qubit control which generalizes the spin dynamics by taking into account a quadrupolar contribution of the quantum dot: electric quadrupole spin resonance (EQSR). In this work, we explore the electric quadrupole driving of a quantum dot in silicon, specifically examining the cases of 5 and 13 electron occupancies.

cond-mat.mes-hall↗

A 2x2 quantum dot array in silicon with fully tuneable pairwise interdot coupling

Recent advances in semiconductor spin qubits have achieved linear arrays exceeding ten qubits. Moving to two-dimensional (2D) qubit arrays is a critical next step to advance towards fault-tolerant implementations, but it poses substantial fabrication challenges, particularly because enabling control of nearest-neighbor entanglement requires the incorporation of interstitial exchange gates between quantum dots in the qubit architecture. In this work, we present a 2D array of silicon metal-oxide-semiconductor (MOS) quantum dots with tunable interdot coupling between all adjacent dots. The device is characterized at 4.2 K, where we demonstrate the formation and isolation of double-dot and triple-dot configurations. We show control of all nearest-neighbor tunnel couplings spanning up to 30 decades per volt through the interstitial exchange gates and use advanced modeling tools to estimate the exchange interactions that could be realized among qubits in this architecture. These results represent a significant step towards the development of 2D MOS quantum processors compatible with foundry manufacturing techniques.

cond-mat.mes-hall↗

Bounds to electron spin qubit variability for scalable CMOS architectures

Spins of electrons in CMOS quantum dots combine exquisite quantum properties and scalable fabrication. In the age of quantum technology, however, the metrics that crowned Si/SiO2 as the microelectronics standard need to be reassessed with respect to their impact upon qubit performance. We chart the spin qubit variability due to the unavoidable atomic-scale roughness of the Si/SiO$_2$ interface, compiling experiments in 12 devices, and developing theoretical tools to analyse these results. Atomistic tight binding and path integral Monte Carlo methods are adapted for describing fluctuations in devices with millions of atoms by directly analysing their wavefunctions and electron paths instead of their energy spectra. We correlate the effect of roughness with the variability in qubit position, deformation, valley splitting, valley phase, spin-orbit coupling and exchange coupling. These variabilities are found to be bounded and lie within the tolerances for scalable architectures for quantum computing as long as robust control methods are incorporated.

quant-ph↗

Path integral simulation of exchange interactions in CMOS spin qubits

The boom of semiconductor quantum computing platforms created a demand for computer-aided design and fabrication of quantum devices. Path integral Monte Carlo (PIMC) can have an important role in this effort because it intrinsically integrates strong quantum correlations that often appear in these multi-electron systems. In this paper we present a PIMC algorithm that estimates exchange interactions of three-dimensional electrically defined quantum dots. We apply this model to silicon metal-oxide-semiconductor (MOS) devices and we benchmark our method against well-tested full configuration interaction (FCI) simulations. As an application, we study the impact of a single charge trap on two exchanging dots, opening the possibility of using this code to test the tolerance to disorder of CMOS devices. This algorithm provides an accurate description of this system, setting up an initial step to integrate PIMC algorithms into development of semiconductor quantum computers.

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