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Jiangnan Liu

Publications and source records attributed to Jiangnan Liu.

7 recordsLinked to original sources

Ultra-Low-Loss Silicon Nitride on Sapphire for Broad-Transparency Nonlinear and Quantum Photonics

The field of photonic integrated circuits (PIC) has flourished in the past two decades, fueling numerous cutting-edge applications across sensing, networking, data interconnect, and quantum information processing. As a guiding material for PIC, Si$_3$N$_4$ has seen extensive use for its ultra-low loss, broad transparency, and diversity in implementation across both thin and thick films. Although the standard, traditional silicon dioxide (SiO$_2$) on silicon (Si) substrates that underpin the majority of Si$_3$N$_4$ photonics face drawbacks in the form of long-wavelength transparency limited by SiO$_2$, high-stress deposition for anomalous dispersion thick-film Si$_3$N$_4$, and leakage loss to the Si layer for low-confinement thin-film Si$_3$N$_4$. Featuring increased long-wavelength transparency into the mid-infrared, low-stress deposition of Si$_3$N$_4$, and a low index, this work investigates sapphire substrates as alternate hosts for Si$_3$N$_4$ photonics with greater spectral coverage and reduced fabrication complexity. This work presents a robust method of fabricating ultra-low loss photonic integrated circuits on a 500-nm-thick Si$_3$N$_4$-on-sapphire platform, exhibiting record-low losses below $0.1 \rm \;dB/cm$. Implemented using this process are high-Q microrings with intrinsic quality factors in excess of $4.5\times10^6$ and coupled-ring photonic molecules to support nonlinear gain. Leveraging the achievable low loss and high-Q, this work further reports the first demonstration of Kerr-comb and soliton generation on the Si$_3$N$_4$-on-sapphire platform. These advances in loss, quality factor, and soliton generation on this versatile, broad-transparency platform pave the way for future work in spectroscopy and quantum-enhanced sensing across previously prohibited spectral regions for Si$_3$N$_4$ photonics with reduced fabrication complexity.

physics.optics

Electrically pumped AlGaN edge-emitting UV-B laser diodes grown by molecular beam epitaxy

Mid and deep ultraviolet (UV) laser diodes remain among the least explored devices in semiconductor optoelectronics, despite their importance for spectroscopy, biochemical sensing, disinfection, and emerging quantum photonics. Here, we demonstrate an electrically pumped AlGaN-based laser diode operating in the UV-B band (280-315 nm). The device is grown by molecular beam epitaxy (MBE) on single-crystal AlN substrate and fabricated in a ridge-waveguide geometry. The laser diode operates at 298.5 nm and exhibits a relatively low threshold current density of 3.4 kA/cm$^2$. Clear nonlinear light-current characteristics and pronounced spectral narrowing with a full-width-at-half-maximum (FWHM) of 0.2 nm are measured above threshold.

physics.optics

Hybrid Scandium Aluminum Nitride/Silicon Nitride Integrated Photonic Circuits

Scandium-doped aluminum nitride has recently emerged as a promising material for quantum photonic integrated circuits (PICs) due to its unique combination of strong second-order nonlinearity, ferroelectricity, piezoelectricity, and complementary metal-oxide-semiconductor (CMOS) compatibility. However, the relatively high optical loss reported to date-typically above 2.4 dB/cm-remains a key challenge that limits its widespread application in low-loss PICs. Here, we present a monolithically integrated $\mathrm{Si}_3\mathrm{N}_4$-ScAlN waveguide platform that overcomes this limitation. By confining light within an etched $\mathrm{Si}_3\mathrm{N}_4$ waveguide while preserving the functional properties of the underlying ScAlN layer, we achieve an intrinsic quality factor of $Q_{\mathrm{i}} = 3.35 \times 10^5$, corresponding to a propagation loss of 1.03 dB/cm-comparable to that of commercial single-mode silicon-on-insulator (SOI) waveguides. This hybrid architecture enables low-loss and scalable fabrication while retaining the advanced functionalities offered by ScAlN, such as ferroelectricity and piezoelectricity. Our results establish a new pathway for ScAlN-based PICs with potential applications in high-speed optical communication, modulation, sensing, nonlinear optics, and quantum optics within CMOS-compatible platforms.

physics.optics

Unprecedented Enhancement of Piezoelectricity in Wurtzite Nitride Semiconductors via Thermal Annealing

The incorporation of rare-earth elements in wurtzite nitride semiconductors, e.g., scandium alloyed aluminum nitride (ScAlN), promises dramatically enhanced piezoelectric responses, critical to a broad range of acoustic, electronic, photonic, and quantum devices and applications. Experimentally, however, the measured piezoelectric responses of nitride semiconductors are far below what theory has predicted. Here, we show that the use of a simple, scalable, post-growth thermal annealing process can dramatically boost the piezoelectric response of ScAlN thin films. We achieve a remarkable 3.5-fold increase in the piezoelectric modulus, d33 for 30% Sc content ScAlN, from 12.3 pC/N in the as-grown state to 45.5 pC/N, which is eight times larger than that of AlN. The enhancement in piezoelectricity has been unambiguously confirmed by three separate measurement techniques. Such a dramatic enhancement of d33 has been shown to impact the effective electromechanical coupling coefficient kt2 : increasing it from 13.8% to 76.2%, which matches the highest reported values in millimeter thick lithium niobate films but is achieved in a 100 nm ScAlN with a 10,000 fold reduction in thickness, thus promising extreme frequency scaling opportunities for bulk acoustic wave resonators for beyond 5G applications. By utilizing a range of material characterization techniques, we have elucidated the underlying mechanisms for the dramatically enhanced piezoelectric responses, including improved structural quality at the macroscopic scale, more homogeneous and ordered distribution of domain structures at the mesoscopic scale, and the reduction of lattice parameter ratio (c/a) for the wurtzite crystal structure at the atomic scale. Overall, the findings present a simple yet highly effective pathway that can be extended to other material families to further enhance their piezo responses.

cond-mat.mtrl-sci

Electric-Field-Induced Domain Walls in Wurtzite Ferroelectrics

Wurtzite ferroelectrics possess transformative potential for next-generation microelectronics. A comprehensive understanding of their ferroelectric properties and domain energetics is crucial for tailoring their ferroelectric characteristics and exploiting their functional properties in practical devices. Despite burgeoning interest, the exact configurations, and electronic structures of the domain walls in wurtzite ferroelectrics remain elusive. In this work, we elucidate the atomic configurations and electronic properties of electric-field-induced domain walls in ferroelectric ScGaN. By combining transmission electron microscopy and theoretical calculations, a novel charged domain wall with a buckled two-dimensional hexagonal phase is revealed. The dangling bonds associated with these domain walls give rise to unprecedented metallic-like mid-gap states within the forbidden band. Quantitative analysis further unveils a universal charge-compensation mechanism stabilizing antipolar domain walls in ferroelectric materials, wherein the polarization discontinuity at the 180° domain wall is compensated by the dangling bond electrons. Furthermore, the reconfigurable conductivity of these domain walls is experimentally demonstrated, showcasing their potential for ultra-scaled device applications. Our findings represent a pivotal advancement in understanding the structural and electronic properties of wurtzite ferroelectric domain walls and lay the groundwork for fundamental physics studies and device applications.

cond-mat.mtrl-sci

Impact of Distributed Rate Limiting on Load Distribution in a Latency-sensitive Messaging Service

The cloud's flexibility and promise of seamless auto-scaling notwithstanding, its ability to meet service level objectives (SLOs) typically calls for some form of control in resource usage. This seemingly traditional problem gives rise to new challenges in a cloud setting, and in particular a subtle yet significant trade-off involving load-distribution decisions (the distribution of workload across available cloud resources to optimize performance), and rate limiting (the capping of individual workloads to prevent global over-commitment). This paper investigates that trade-off through the design and implementation of a real-time messaging system motivated by Internet-of-Things (IoT) applications, and demonstrates a solution capable of realizing an effective compromise. The paper's contributions are in both explicating the source of this trade-off, and in demonstrating a possible solution.

cs.NI

Real-Time Edge Classification: Optimal Offloading under Token Bucket Constraints

To deploy machine learning-based algorithms for real-time applications with strict latency constraints, we consider an edge-computing setting where a subset of inputs are offloaded to the edge for processing by an accurate but resource-intensive model, and the rest are processed only by a less-accurate model on the device itself. Both models have computational costs that match available compute resources, and process inputs with low-latency. But offloading incurs network delays, and to manage these delays to meet application deadlines, we use a token bucket to constrain the average rate and burst length of transmissions from the device. We introduce a Markov Decision Process-based framework to make offload decisions under these constraints, based on the local model's confidence and the token bucket state, with the goal of minimizing a specified error measure for the application. Beyond isolated decisions for individual devices, we also propose approaches to allow multiple devices connected to the same access switch to share their bursting allocation. We evaluate and analyze the policies derived using our framework on the standard ImageNet image classification benchmark.

cs.LG