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Jith Sarker

Publications and source records attributed to Jith Sarker.

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Coordination-Sensitive Nanoscale Analysis of Defect-Driven Phase Transformation in Si-Doped (AlXGa1-X)2O3

Defect-driven phase instability critically influences the structural reliability of ultrawide bandgap oxides, yet direct nanoscale metrics linking local chemistry to structural transformation remain limited. Here, we introduce a coordination-sensitive atom probe tomography framework that quantitatively resolves reductions in local cation coordination and links them directly to defect-driven phase transformation. Using Si-doped beta-(AlxGa1-x)2O3 heterostructures with controlled Al composition (6-17%) and doping levels (10^17-10^20 cm^-3), we show that gamma-phase inclusions emerge exclusively under the combined conditions of elevated Al content and heavy Si doping. Two-dimensional compositional mapping reveals pronounced lateral Al/Ga inhomogeneity in these regions, while nearest-neighbor and radial distribution analyses quantitatively resolve a significant reduction in first-shell Ga coordination, consistent with local cation deficiency. Correlative scanning transmission electron microscopy confirms that these coordination-depleted regions coincide spatially with gamma-phase inclusions. Density functional theory further supports this mechanism, demonstrating that Al incorporation reduces monoclinic lattice stability and, in conjunction with donor-induced vacancy formation, facilitates vacancy-mediated cation rearrangement and coordination collapse. Together, these results establish coordination loss as a measurable nanoscale signature directly linked to defect-driven phase instability. This framework provides a generalizable approach for probing defect-driven phase instability in doped and alloyed ultrawide bandgap semiconductors.

cond-mat.mtrl-sci

Metalorganic Chemical Vapor Deposition of \b{eta}-(AlxGa1-x)2O3 thin films on (001) \b{eta}-Ga2O3 substrates

Phase pure \b{eta}-(AlxGa1-x)2O3 thin films are grown on (001) oriented \b{eta}-Ga2O3 substrates via metalorganic chemical vapor deposition (MOCVD). By systematically tuning the precursor molar flow rates, the epitaxial growth of coherently strained \b{eta}-(AlxGa1-x)2O3 films are demonstrated with up to 25% Al compositions as evaluated by high resolution x-ray diffraction (XRD). The asymmetrical reciprocal space mapping confirms the growth of coherent \b{eta}-(AlxGa1-x)2O3 films (x < 25%) on (001) \b{eta}-Ga2O3 substrates. While the films show smooth surface morphologies, the alloy inhomogeneity with local segregation of Al along (-201) plane is observed from atomic resolution STEM imaging, resulting in wavy and inhomogeneous interfaces in \b{eta}-(AlxGa1-x)2O3/\b{eta}-Ga2O3 superlattice structure. Room temperature Raman spectra of \b{eta}-(AlxGa1-x)2O3 films show similar characteristics peaks as (001) \b{eta}-Ga2O3 substrate without obvious Raman shifts for films with different Al compositions. Atom probe tomography (APT) was used to investigate the atomic level structural chemistry with increasing Al content in the \b{eta}-(AlxGa1-x)2O3 films. A monotonous increase in chemical heterogeneity is observed from the in-plane Al/Ga distributions which was further confirmed via statistical frequency distribution analysis (FDA). Although the films exhibit alloy fluctuations, n-type doping with good electrical properties are demonstrated for films with various Al compositions. The determined valence and conduction band offsets at \b{eta}-(AlxGa1-x)2O3/\b{eta}-Ga2O3 heterojunctions using x-ray photoelectron spectroscopy (XPS) reveal the formation of type-II (staggered) band alignment.

cond-mat.mtrl-sci

Direct observation of site-specific dopant substitution in Si doped (AlxGa1-x)2O3 via Atom Probe Tomography

In this work, the interaction of n-type dopants in Si doped (AlxGa1-x)2O3 films with varying Al content over the entire composition range (x = 0-100%) was analyzed using atom probe tomography. An almost uniform dopant distribution with dopant density in the range of 1018 cm-3 was obtained in all (AlxGa1-x)2O3 layers containing different Al contents. We have demonstrated that for the single phase \b{eta}-(AlxGa1-x)2O3 films with Al content of x<0.30, dopants prefer to occupy on Ga sites while Al site is preferred for high Al content (x>0.50) (AlxGa1-x)2O3 layers. It was also observed for Al content, x = 0.30-0.50, no specific cationic site occupancy was observed, Si occupies either Al or Ga sites. This can be attributed to highly inhomogeneous layers within this composition range due to which dopant Si atoms are either in the Al-rich or Al-depleted regions.

physics.app-ph