Searcharxiv⌕ Search

arXiv subjects

Johann Knechtel

Publications and source records attributed to Johann Knechtel.

63 records · Page 4Linked to original sources

A New Paradigm in Split Manufacturing: Lock the FEOL, Unlock at the BEOL

Split manufacturing was introduced as an effective countermeasure against hardware-level threats such as IP piracy, overbuilding, and insertion of hardware Trojans. Nevertheless, the security promise of split manufacturing has been challenged by various attacks, which exploit the well-known working principles of physical design tools to infer the missing BEOL interconnects. In this work, we advocate a new paradigm to enhance the security for split manufacturing. Based on Kerckhoff's principle, we protect the FEOL layout in a formal and secure manner, by embedding keys. These keys are purposefully implemented and routed through the BEOL in such a way that they become indecipherable to the state-of-the-art FEOL-centric attacks. We provide our secure physical design flow to the community. We also define the security of split manufacturing formally and provide the associated proofs. At the same time, our technique is competitive with current schemes in terms of layout overhead, especially for practical, large-scale designs (ITC'99 benchmarks).

cs.CR↗

Protect Your Chip Design Intellectual Property: An Overview

The increasing cost of integrated circuit (IC) fabrication has driven most companies to "go fabless" over time. The corresponding outsourcing trend gave rise to various attack vectors, e.g., illegal overproduction of ICs, piracy of the design intellectual property (IP), or insertion of hardware Trojans (HTs). These attacks are possibly conducted by untrusted entities residing all over the supply chain, ranging from untrusted foundries, test facilities, even to end-users. To overcome this multitude of threats, various techniques have been proposed over the past decade. In this paper, we review the landscape of IP protection techniques, which can be classified into logic locking, layout camouflaging, and split manufacturing. We discuss the history of these techniques, followed by state-of-the-art advancements, relevant limitations, and scope for future work.

cs.CR↗

Best of Both Worlds: Integration of Split Manufacturing and Camouflaging into a Security-Driven CAD Flow for 3D ICs

With the globalization of manufacturing and supply chains, ensuring the security and trustworthiness of ICs has become an urgent challenge. Split manufacturing (SM) and layout camouflaging (LC) are promising techniques to protect the intellectual property (IP) of ICs from malicious entities during and after manufacturing (i.e., from untrusted foundries and reverse-engineering by end-users). In this paper, we strive for "the best of both worlds," that is of SM and LC. To do so, we extend both techniques towards 3D integration, an up-and-coming design and manufacturing paradigm based on stacking and interconnecting of multiple chips/dies/tiers. Initially, we review prior art and their limitations. We also put forward a novel, practical threat model of IP piracy which is in line with the business models of present-day design houses. Next, we discuss how 3D integration is a naturally strong match to combine SM and LC. We propose a security-driven CAD and manufacturing flow for face-to-face (F2F) 3D ICs, along with obfuscation of interconnects. Based on this CAD flow, we conduct comprehensive experiments on DRC-clean layouts. Strengthened by an extensive security analysis (also based on a novel attack to recover obfuscated F2F interconnects), we argue that entering the next, third dimension is eminent for effective and efficient IP protection.

cs.CR↗

Raise Your Game for Split Manufacturing: Restoring the True Functionality Through BEOL

Split manufacturing (SM) seeks to protect against piracy of intellectual property (IP) in chip designs. Here we propose a scheme to manipulate both placement and routing in an intertwined manner, thereby increasing the resilience of SM layouts. Key stages of our scheme are to (partially) randomize a design, place and route the erroneous netlist, and restore the original design by re-routing the BEOL. Based on state-of-the-art proximity attacks, we demonstrate that our scheme notably excels over the prior art (i.e., 0% correct connection rates). Our scheme induces controllable PPA overheads and lowers commercial cost (the latter by splitting at higher layers).

cs.CR↗

Concerted Wire Lifting: Enabling Secure and Cost-Effective Split Manufacturing

Here we advance the protection of split manufacturing (SM)-based layouts through the judicious and well-controlled handling of interconnects. Initially, we explore the cost-security trade-offs of SM, which are limiting its adoption. Aiming to resolve this issue, we propose effective and efficient strategies to lift nets to the BEOL. Towards this end, we design custom "elevating cells" which we also provide to the community. Further, we define and promote a new metric, Percentage of Netlist Recovery (PNR), which can quantify the resilience against gate-level theft of intellectual property (IP) in a manner more meaningful than established metrics. Our extensive experiments show that we outperform the recent protection schemes regarding security. For example, we reduce the correct connection rate to 0\% for commonly considered benchmarks, which is a first in the literature. Besides, we induce reasonably low and controllable overheads on power, performance, and area (PPA). At the same time, we also help to lower the commercial cost incurred by SM.

cs.CR↗

Advancing Hardware Security Using Polymorphic and Stochastic Spin-Hall Effect Devices

Protecting intellectual property (IP) in electronic circuits has become a serious challenge in recent years. Logic locking/encryption and layout camouflaging are two prominent techniques for IP protection. Most existing approaches, however, particularly those focused on CMOS integration, incur excessive design overheads resulting from their need for additional circuit structures or device-level modifications. This work leverages the innate polymorphism of an emerging spin-based device, called the giant spin-Hall effect (GSHE) switch, to simultaneously enable locking and camouflaging within a single instance. Using the GSHE switch, we propose a powerful primitive that enables cloaking all the 16 Boolean functions possible for two inputs. We conduct a comprehensive study using state-of-the-art Boolean satisfiability (SAT) attacks to demonstrate the superior resilience of the proposed primitive in comparison to several others in the literature. While we tailor the primitive for deterministic computation, it can readily support stochastic computation; we argue that stochastic behavior can break most, if not all, existing SAT attacks. Finally, we discuss the resilience of the primitive against various side-channel attacks as well as invasive monitoring at runtime, which are arguably even more concerning threats than SAT attacks.

cs.CR↗

Obfuscating the Interconnects: Low-Cost and Resilient Full-Chip Layout Camouflaging

Layout camouflaging (LC) is a promising technique to protect chip design intellectual property (IP) from reverse engineers. Most prior art, however, cannot leverage the full potential of LC due to excessive overheads and/or their limited scope on an FEOL-centric and accordingly customized manufacturing process. If at all, most existing techniques can be reasonably applied only to selected parts of a chip---we argue that such "small-scale or custom camouflaging" will eventually be circumvented, irrespective of the underlying technique. In this work, we propose a novel LC scheme which is low-cost and generic---full-chip LC can finally be realized without any reservation. Our scheme is based on obfuscating the interconnects (BEOL); it can be readily applied to any design without modifications in the device layer (FEOL). Applied with split manufacturing in conjunction, our approach is the first in the literature to cope with both the FEOL fab and the end-user being untrustworthy. We implement and evaluate our primitives at the (DRC-clean) layout level; our scheme incurs significantly lower cost than most of the previous works. When comparing fully camouflaged to original layouts (i.e., for 100% LC), we observe on average power, performance, and area overheads of 12%, 30%, and 48%, respectively. Here we also show empirically that most existing LC techniques (as well as ours) can only provide proper resilience against powerful SAT attacks once at least 50% of the layout is camouflaged---only large-scale LC is practically secure. As indicated, our approach can deliver even 100% LC at acceptable cost. Finally, we also make our flow publicly available, enabling the community to protect their sensitive designs.

cs.CR↗

Rethinking Split Manufacturing: An Information-Theoretic Approach with Secure Layout Techniques

Split manufacturing is a promising technique to defend against fab-based malicious activities such as IP piracy, overbuilding, and insertion of hardware Trojans. However, a network flow-based proximity attack, proposed by Wang et al. (DAC'16) [1], has demonstrated that most prior art on split manufacturing is highly vulnerable. Here in this work, we present two practical layout techniques towards secure split manufacturing: (i) gate-level graph coloring and (ii) clustering of same-type gates. Our approach shows promising results against the advanced proximity attack, lowering its success rate by 5.27x, 3.19x, and 1.73x on average compared to the unprotected layouts when splitting at metal layers M1, M2, and M3, respectively. Also, it largely outperforms previous defense efforts; we observe on average 8x higher resilience when compared to representative prior art. At the same time, extensive simulations on ISCAS'85 and MCNC benchmarks reveal that our techniques incur an acceptable layout overhead. Apart from this empirical study, we provide---for the first time---a theoretical framework for quantifying the layout-level resilience against any proximity-induced information leakage. Towards this end, we leverage the notion of mutual information and provide extensive results to validate our model.

cs.CR↗

On Mitigation of Side-Channel Attacks in 3D ICs: Decorrelating Thermal Patterns from Power and Activity

Various side-channel attacks (SCAs) on ICs have been successfully demonstrated and also mitigated to some degree. In the context of 3D ICs, however, prior art has mainly focused on efficient implementations of classical SCA countermeasures. That is, SCAs tailored for up-and-coming 3D ICs have been overlooked so far. In this paper, we conduct such a novel study and focus on one of the most accessible and critical side channels: thermal leakage of activity and power patterns. We address the thermal leakage in 3D ICs early on during floorplanning, along with tailored extensions for power and thermal management. Our key idea is to carefully exploit the specifics of material and structural properties in 3D ICs, thereby decorrelating the thermal behaviour from underlying power and activity patterns. Most importantly, we discuss powerful SCAs and demonstrate how our open-source tool helps to mitigate them.

cs.CR↗