Adsorption-Controlled Epitaxy and Twin Control of $\gamma$-GaSe on GaAs (111)B
The III-Se layered semiconductors, including InSe and GaSe, are promising optoelectronic materials due to their relatively high electron mobilities at room temperature, nonlinear optical responses, ferroelectricity, self-passivated van der Waals surfaces, and ability to alloy and synthesize heterostructures for bandgap engineering. Adsorption control is a widely utilized strategy for controlling the stoichiometry and phase formation of these materials; however, the bounds of the adsorption-controlled growth window for GaSe have not been systematically established. Additionally, challenges with control over polytype and twinning remain. Here, we use molecular beam epitaxy to experimentally map the adsorption-controlled growth window of GaSe films on vicinal GaAs (111)B substrates. The observed phase boundaries show qualitative agreement with Ellingham diagram predictions. All films crystallize in the $\gamma$ ($R3m$) polytype. Increasing growth and annealing temperature leads to decreased mosaicity measured by x-ray rocking curve and smoother surfaces measured by atomic force microscopy, at the expense of a transition from singly oriented $\gamma$ to twinned $\gamma$ with $60\degree$ rotated domains.