arXiv subjects

Kathy Anderson

Publications and source records attributed to Kathy Anderson.

5 recordsLinked to original sources

arXiv2026

Crystallinity Evolution of MOCVD-Grown $\beta$-Ga$_2$O$_3$ Films Probed by In Situ HT-XRD under Different Reactor Heights

The crystallinity of $\beta$-Ga$_2$O$_3$ thin films grown by metal-organic chemical vapor deposition (MOCVD) is strongly influenced by reactor design and the resulting growth environment. In this work, we investigate the role of reactor height on the crystallinity evolution of MOCVD-grown $\beta$-Ga$_2$O$_3$ films by directly comparing long- and short-chamber showerhead configurations. Structural evolution was probed by in situ high-temperature X-ray diffraction (HT-XRD) as the MOCVD-grown films were heated from 25~$^\circ$C to 1100~$^\circ$C. Temperature-dependent XRD reveals a consistent redshift of the $\beta$-Ga$_2$O$_3$~($-201$) reflection after HT-XRD heating and subsequent cooling to room temperature for both reactor geometries, indicating a similar thermally driven strain response. Quantitative rocking-curve analysis shows a non-monotonic temperature dependence of the ($-201$) full width at half maximum (FWHM), with minimum values of approximately 2.03$^\circ$ and 2.72$^\circ$ for the short- and long-chamber films, respectively, reflecting differences in mosaic alignment established during growth. Atomic force microscopy further shows that short-chamber-grown films exhibit smoother surfaces, with root-mean-square roughness values of approximately 7.7~nm before and 7.3~nm after HT-XRD heating, compared to 19.3~nm and 12.3~nm, respectively, for long-chamber-grown films. Overall, these results indicate that reactor height influences the initial crystalline and morphological templates of $\beta$-Ga$_2$O$_3$ films and modulates their elevated-temperature structural response, providing practical insights for optimizing MOCVD reactor design for high-quality $\beta$-Ga$_2$O$_3$ growth.

cond-mat.mtrl-sci↗

arXiv2025

In situ XRD Study of Strain Evolution in AlGaN/GaN HEMT at High Temperatures up to 1000 {\deg}C

The thermal stability and structural evolution of a GaN high-electron-mobility transistor (HEMT) heterostructure grown on a Si (111) substrate were investigated using in situ high-temperature X-ray diffraction (HT-XRD), reciprocal space mapping (RSM), Raman spectroscopy, and rocking-curve (RC) analysis at varying temperatures. The heterostructure, consisting of a p-GaN cap, an AlGaN barrier, and a GaN channel supported by two AlGaN/AlGaN superlattice (SL) buffer layers, maintained clear and periodic satellite peaks up to a temperature of 1000 deg C, confirming excellent structural integrity. Symmetric and asymmetric RSM results reveal that both the Si and GaN diffraction peaks shift to lower angles with increasing temperature, consistent with thermal expansion, and show no significant broadening or relaxation throughout the heating process. The c-lattice constant follows the theoretical expansion predicted by the multi-frequency Einstein model, whereas the a-lattice expansion is slower due to in-plane strain constraints imposed by the underlying Si substrate and buffer layers. Rapid lattice contraction during the fast-cooling stage induces a residual compressive strain of approximately 0.3 percent in the GaN channel after cooling. Raman spectra further confirm this strain state through a blue shift of approximately 1.5 cm-1 of the GaN E2 (high) phonon mode, corresponding to an in-plane strain of about 0.2 percent. Rocking-curve analysis reveals an increase in both screw and edge dislocation densities by 28 percent and 12 percent, respectively. These results collectively demonstrate that the GaN HEMT heterostructure exhibits robust crystalline stability up to 1000 deg C, with only minor strain redistribution and limited dislocation activity, providing experimental evidence for GaN device applications under high-temperature conditions.

cond-mat.mtrl-sci↗

arXiv2025

Phase Competition and Rutile Phase Stabilization of Growing GeO2 Films by MOCVD

Rutile germanium dioxide (r-GeO2) is an ultra-wide bandgap semiconductor with potential for ambipolar doping, making it a promising candidate for next-generation power electronics and optoelectronics. Growth of phase-pure r-GeO2 films by vapor phase techniques like metalorganic chemical vapor deposition (MOCVD) is challenging because of polymorphic competition from amorphous and quartz GeO2. Here, we introduce seed-driven stepwise crystallization (SDSC) as a segmented growth strategy for obtaining r-GeO2 films on r-TiO2 (001) substrate. SDSC divides the growth into repeated cycles of film deposition and cooling-heating ramps, which suppress the non-rutile phases. We discuss the underlying mechanisms of phase selection during SDSC growth. We demonstrate continuous, phase-pure, partially epitaxial r-GeO2 (001) films exhibiting x-ray rocking curves with a FWHM of 597 arcsec. SDSC-based growth provides a generalizable pathway for selective vapor-phase growth of metastable or unstable phases, offering new opportunities for phase-selective thin-film engineering.

cond-mat.mtrl-sci↗

arXiv2025

Phase Evolution and Substrate-Dependent Nucleation of Quartz GeO$_2$ Films Grown by MOCVD on r- and c-Plane Sapphires

Ultrawide-bandgap (UWBG) semiconductors, such as GeO$_2$, are gaining significant attention for their potential in high-performance applications, particularly in piezoelectric devices. Despite extensive research, a comprehensive understanding of the growth dynamics and phase evolution of GeO$_2$ films via metal-organic chemical vapor deposition (MOCVD) remains insufficient. In this study, we investigate the growth behavior and morphological evolution of GeO$_2$ thin films on r-plane and c-plane sapphire substrates for the MOCVD growth process. The temporal evolution of crystallization and the amorphous-to-quartz phase transition are systematically elucidated for the first time. As growth time increases, the spherulitic quartz patterns expand in size, and elevated growth temperatures are found to enhance the crystallization rate. Distinct morphological symmetries emerge depending on the substrate orientation: quadrangular patterns on r-plane sapphire and hexagonal patterns on c-plane sapphire. Atomic force microscopy reveals that these spherulitic domains exhibit pyramid-like surface topography, consistent with volumetric contraction during the amorphous-to-quartz phase transition. These findings offer new insights into the phase evolution and substrate-dependent crystallization behavior of GeO$_2$ films grown by MOCVD.

cond-mat.mtrl-sci↗

arXiv2024

Growth of GeO2 on R-plane and C-plane Sapphires by MOCVD

Rutile Germanium Dioxide (GeO2) has been recently theoretically identified as an ultrawide bandgap (UWBG) semiconductor with bandgap 4.68 eV similar to Ga2O3 but having bipolar dopability and ~2x higher electron mobility, Baliga figure of merit (BFOM) and thermal conductivity than Ga2O3. Bulk crystal growth is rapidly moving towards making large sized native substrates available. These outstanding material properties position GeO2 as a highly attractive UWBG semiconductor for various applications. However, the epitaxial growth in the most advantageous polymorph (rutile), ensuring controlled phase, pristine surface/interface quality, precise microstructure, and optimal functional properties, is still in its infancy. In this work, we explored growth of GeO2 by metal-organic chemical vapor deposition (MOCVD) on both C- and R-plane sapphire. Utilizing tetramethylgermane (TMGe) as a precursor, we have investigated the influences of different parameters on the film properties, including growth temperature, chamber pressure, TMGe flow rate, oxygen flow rate, shroud gas flow rate, and rotation speed. The total pressure emerged as a crucial parameter while growth attempts at low total pressure resulted in no films for a wide range of temperatures, precursor flow rate, argon flow rates, and susceptor rotation rate. A phase diagram, derived from our experimental findings, delineates the growth windows for GeO2 films on sapphire substrates. This study serves as a pioneering guide for the MOCVD growth of GeO2 films.

cond-mat.mtrl-sci↗