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Konrad Seidel

Publications and source records attributed to Konrad Seidel.

3 recordsLinked to original sources

BEOL Ferroelectric Compute-in-Memory Ising Machine for Simulated Bifurcation

Computationally hard combinatorial optimization problems are pervasive in science and engineering, yet their NP-hard nature renders them increasingly inefficient to solve on conventional von Neumann architectures as problem size grows. Ising machines implemented using dynamical, digital and compute-in-memory (CiM) approaches offer a promising alternative, but often suffer from poor initialization and a fundamental trade-off between algorithmic performance and hardware efficiency. Hardware-friendly schemes such as simulated annealing converge slowly, whereas faster algorithms, including simulated bifurcation, are difficult to implement efficiently in CiM hardware, limiting both convergence speed and solution quality. To address these limitations, here we present a ferroelectric field-effect transistor (FeFET)-based CiM Ising framework that tightly co-designs algorithms and hardware to efficiently solve large-scale combinatorial optimization problems. The proposed approach employs a two-step algorithmic flow: an attention-inspired initialization that exploits global spin topology and reduces the required iterations by up to 80%, followed by a lightweight simulated bifurcation algorithm specifically tailored for CiM implementation. To natively accelerate the core vector-matrix and vector-matrix-vector operations in both steps, we fabricate a 32x256 FeFET CiM chip using ferroelectric capacitors integrated at the back end of line of a 180-nm CMOS platform. Across Max-Cut instances with up to 100,000 nodes, the proposed hardware-software co-designed solver achieves up to a 175.9x speedup over a GPU-based simulated bifurcation implementation while consistently delivering superior solution quality.

cs.ET

Enhanced Performance of FeFET Gate Stack via Heterogeneously co-doped Ferroelectric HfO$_2$ Films

In this work, we explore the impact of spatially controlled Zr and Al heterogeneous co-doping in HfO$_2$ thin films tailored for metal-ferroelectric-insulator-semiconductor (MFIS) gate stacks of ferroelectric field effect transistors (FeFETs). By precisely modulating the vertical arrangement of Zr and Al dopants during atomic layer deposition, we introduce deliberate compositional gradients that affect crystallization dynamics during subsequent annealing. This strategy enables us to systematically tune the phase evolution and domain nucleation within the ferroelectric layer, directly influencing device reliability and performance. From a structural perspective, our findings demonstrate that the phase composition of annealed HfO$_2$ films in MFIS stacks is primarily determined by the spatial arrangement of dopants. From an electrical perspective, we observe significant enhancement of remanent polarization and endurance of the gate stacks through heterogeneous co-doping, depending on the spatial arrangement of dopants.

cond-mat.mtrl-sci

Revealing the Influence of Dopants on the Properties of Fluorite Structure Ferroelectrics

Fluorite structure ferroelectrics, especially hafnium oxide, are widely investigated for their application in non-volatile memories, sensors, actuators, RF devices and energy harvesters. Due to the metastable nature of the ferroelectric phase in these materials, dopants and process parameters need to be optimized for its stabilization. Here, we present clear evidence of how dopants affect the properties in this material system and solutions to achieve improved reliability, desired crystallization behavior and polarization hysteresis shape/position through co-doping. Finally, the benefits of co-doping in a variety of application fields are demonstrated.

cond-mat.mtrl-sci