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Konstantin Kolegov

Publications and source records attributed to Konstantin Kolegov.

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Simulation aspects of patterning polymer films via evaporative lithography and composite substrates

The continuing development of evaporative lithography is important for many areas such as the creation of photonic crystals for optronics and microelectronics, the development of biosensors for medical applications and biotechnology, and for the formation of functional coatings for nanotechnology, including the application of thin, protective polymer coatings. The article proposes a mathematical model that allows us to explain the basic mechanisms of the formation of thin polymer films (less than 50 $μ$m thick) during their deposition onto a composite substrate by methanol evaporation from a solution. If the thermal conductivity of the substrate is spatially non-uniform, this results in inhomogeneous evaporation along the free film surface. Therefore, as the film dries, a patterned polymer coating is left behind on the substrate. The mathematical model described here is based on the lubrication approximation and takes into account the dependence of the solution density on the concentration. The numerical computation results are in qualitative agreement with the experimental data of other authors. The article shows that solutal Marangoni flow plays a primary role in the process under consideration. This study allows us to better understand the mechanisms that can be used in evaporative lithography.

cond-mat.soft

Average cluster size inside sediment left after droplet desiccation

In this work, we continue to study the formation of particle chains (clusters) inside the annular sediment during the drying of a colloidal droplet on a substrate. The average value of the cluster size was determined after processing experimental data from other authors. We performed a series of calculations and found the value of the model parameter allowed to get numerical results agreed with the experiment. Also, a modification of the previously proposed algorithm is analyzed here.

cond-mat.soft

Applying Droplets and Films in Evaporative Lithography

This review covers experimental results of evaporative lithography and analyzes existing mathematical models of this method. Evaporating droplets and films are used in different fields, such as cooling of heated surfaces of electronic devices, diagnostics in health care, creation of transparent conductive coatings on flexible substrates, and surface patterning. A method called evaporative lithography emerged after the connection between the coffee ring effect taking place in drying colloidal droplets and naturally occurring inhomogeneous vapor flux densities from liquid--vapor interfaces was established. Essential control of the colloidal particle deposit patterns is achieved in this method by producing ambient conditions that induce a nonuniform evaporation profile from the colloidal liquid surface. Evaporative lithography is part of a wider field known as "evaporative-induced self-assembly" (EISA). EISA involves methods based on contact line processes, methods employing particle interaction effects, and evaporative lithography. As a rule, evaporative lithography is a flexible and single-stage process with such advantages as simplicity, low price, and the possibility of application to almost any substrate without pretreatment. Since there is no mechanical impact on the template in evaporative lithography, the template integrity is preserved in the process. The method is also useful for creating materials with localized functions, such as slipperiness and self-healing. For these reasons, evaporative lithography attracts increasing attention and has a number of noticeable achievements at present. We also analyze limitations of the approach and ways of its further development.

physics.app-ph

Joint effect of advection, diffusion, and capillary attraction on the spatial structure of particle depositions from evaporating droplets

A simplified model is developed, which allows us to perform computer simulations of the particles transport in an evaporating droplet with a contact line pinned to a hydrophilic substrate. The model accounts for advection in the droplet, diffusion and particle attraction by capillary forces. On the basis of the simulations, we analyze the physical mechanisms of forming of individual chains of particles inside the annular sediment. The parameters chosen correspond to the experiments of Park and Moon [Langmuir 22, 3506 (2006)], where an annular deposition and snakelike chains of colloid particles have been identified. The annular sediment is formed by advection and diffusion transport. We find that the close packing of the particles in the sediment is possible if the evaporation time exceeds the characteristic time of diffusion-based ordering. We show that the chains are formed by the end of the evaporation process due to capillary attraction of particles in the region bounded by a fixing radius, where the local droplet height is comparable to the particle size. At the beginning of the evaporation, the annular deposition is shown to expand faster than the fixing radius moves. However, by the end of the process, the fixing radius rapidly outreaches the expanding inner front of the ring. The snakelike chains are formed at this final stage when the fixing radius moves toward the symmetry axis.

cond-mat.soft