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Kristoffer Almdal

Publications and source records attributed to Kristoffer Almdal.

3 recordsLinked to original sources

Lateral Contrast Enhancement in Tomographic Volumetric 3D-Printing via Binary Photoinhibition

Tomographic volumetric 3D-printing (TVP) utilizes a nonlinear photoresponse of polymer precursor to cure all points in a three-dimensional (3D) object in parallel. A key challenge in TVP is to build up dose contrast between in-part and out-of-part points in a lateral plane, which relies on coordinated illumination from various projecting angles. This challenge has mainly been tackled by projection optimization. Here we show that designing material responses to photo-excitation can be a more effective way of addressing this challenge. By introducing a secondary photo-inhibitory species that reacts to external ultraviolet (UV) stimulus, we create a binary photoinhibition (BPI) system that greatly enhances the achievable dose contrast in a lateral plane. We first show that, in theory, combining dose subtraction with sufficient projection angles can guarantee an exact mathematical reconstruction of any greyscale design. We then propose a theoretical framework for BPI, in which a single stationary state with swappable stability can be used to realize dose subtraction. We use oxygen-lophyl radical pair as an approximation to show improvements in print quality enabled by enhanced dose contrast. In situ shadowgraphy shows that BPI improves the lateral patterning with various geometric features, creating differentiable changes in refractive index within 54 um or less. We show qualitative improvements in surface features and internal hollowness in physical prints. The direct impacts of UV light on the formation of positive and negative features on vertical and lateral planes of 5 workpieces are analyzed quantitatively. We conclude that introducing BPI with UV irradiation grants us direct control over the formation of negative features on the lateral plane.

physics.optics

Experimental demonstration of graphene plasmons working close to the near-infrared window

Due to strong mode-confinement, long propagation-distance, and unique tunability, graphene plasmons have been widely explored in the mid-infrared and terahertz windows. However, it remains a big challenge to push graphene plasmons to shorter wavelengths in order to integrate graphene plasmon concepts with existing mature technologies in the near-infrared region. We investigate localized graphene plasmons supported by graphene nanodisks and experimentally demonstrated graphene plasmon working at 2 μm with the aid of a fully scalable block copolymer self-assembly method. Our results show a promising way to promote graphene plasmons for both fundamental studies and potential applications in the near-infrared window.

physics.optics

Large-Area Nanopatterned Graphene For Ultrasensitive Gas Sensing

Chemical vapor deposited graphene is nanopatterned by a spherical block-copolymer etch mask. The use of spherical rather than cylindrical block copolymers allows homogeneous patterning of cm-scale areas without any substrate surface treatment. Raman spectroscopy was used to study the controlled generation of point defects in the graphene lattice with increasing etching time, confirming that alongside the nanomesh patterning, the nanopatterned CVD graphene presents a high defect density between the mesh holes. The nanopatterned samples showed sensitivities for NO2 of more than one order of magnitude higher than for non-patterned graphene. NO2 concentrations as low as 300 ppt were detected with an ultimate detection limit of tens of ppt. This is so far the smallest value reported for not UV illuminated graphene chemiresistive NO2 gas sensors. The drastic improvement in the gas sensitivity is believed to be due to the high adsorption site density, thanks to the combination of edge sites and point defect sites. This work opens the possibility of large area fabrication of nanopatterned graphene with extreme density of adsorption sites for sensing applications.

cond-mat.mes-hall