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Krzysztof Maćkosz

Publications and source records attributed to Krzysztof Maćkosz.

2 recordsLinked to original sources

Double helical plasmonic antennas

Plasmonic double helical antennas are a means to funnel circularly polarized light down to the nanoscale. Here, an existing design tool for single helices is extended to the case of double helices and used to design antennas that combine large chiroptical interaction strength with highly directional light emission. Full-field numerical modeling underpins the design and provides additional insight into surface charge distributions and resonance widths. The helical antennas are fabricated by direct writing with a focused electron beam, a technique that is unrivaled in terms of spatial resolution and 3D shape fidelity. After the printing process, the structures are purified using ozone plasma at room temperature, resulting in the smallest continuous double helix antennas ever realized in gold. Fabricated antennas are studied regarding their polarization-dependent transmission behavior, which shows a large and broadband dissymmetry factor in the visible range. Since the polarization of light is an important tool for implementing logic functionality in photonic and quantum photonic devices, these helices are potential building blocks for future nanophotonic circuits, but also for chiral metamaterials or phase plates.

physics.optics↗

Area Selective Chemical Vapor Deposition of Gold by Electron Beam Seeding

Chemical vapour deposition (CVD) is an established method for producing high-purity thin films, but it typically necessitates the pre- and post-processing of a mask to produce structures. This paper presents a novel maskless patterning technique that enables area selective CVD of gold. A focused electron beam is used to decompose the metal-organic precursor Au(acac)Me$_2$ locally, thereby creating an autocatalytically active seed layer for subsequent CVD with the same precursor. The procedure can be included in the same CVD cycle without the need for clean room lithographic processing. Moreover, it operates at low temperatures of 80 °C, over 200 K lower than standard CVD temperatures for this precursor, reducing thermal load on the specimen. Given that electron beam seeding operates on any even moderately conductive surface, the process does not constrain device design. This is demonstrated by the example of vertical nanostructures with high aspect ratios of around 40:1 and more. Written using a focused electron beam and the same precursor, these nanopillars exhibit catalytically active nuclei on their surface. Furthermore, they allow for the first time the precise determination of the local temperature increase caused by the writing of nanostructures with an electron beam.

cond-mat.mtrl-sci↗