arXiv subjects

Laurens Willems van Beveren

Publications and source records attributed to Laurens Willems van Beveren.

3 recordsLinked to original sources

arXiv2015

Development of nanowire devices with quantum functionalities

Silicon has dominated the microelectronics industry for the last 50 years. With its zero nuclear spin isotope (28Si) and low spin orbit coupling, it is believed that silicon can become an excellent host material for an entirely new generation of devices that operate under the laws of quantum mechanics [1}. Semiconductor nanowires however, offer huge potential as the next building blocks of nano-devices due to their one-dimensional structure and properties [2]. We describe a fabrication process to prepare doped vapor-liquid-solid (VLS) grown silicon nanowire samples in a 2- and 4-terminal measurement setup for electrical characterisation.

cond-mat.mtrl-sci↗

arXiv2015

Indium Tin Oxide film characterization using the classical Hall effect

We have used the classical Hall effect to electrically characterize Indium Tin Oxide (ITO) films grown by two different techniques on silica substrates. ITO films have the unique property that they can be both electrically conducting (and to be used for a gate electrode for example) as well as optically transparent (at least in the visible part of the spectrum). In the near infrared (NIR) the transmission typically reduces. However, the light absorption can in principle be compensated by growing thinner films.

cond-mat.mtrl-sci↗

arXiv2015

A TEM study of Si-SiO2 interfaces in silicon nanodevices

The fabrication of micro- and nano-scale silicon electronic devices requires precision lithography and controlled processing to ensure that the electronic properties of the device are optimized. Importantly, the Si-SiO2 interface plays a crucial role in defining these properties. While transmission electron microscopy (TEM) can be used to observe the device architecture, substrate / contact crystallinity and interfacial roughness, the preparation and isolation of the device active area is problematic. In this work, we describe the use of focussed ion beam technologies to isolate and trench-cut targeted device structures for subsequent TEM analysis. Architectures studied include radio frequency, single electron transistors and electrically detected, magnetic resonance devices that have also undergone ion implantation, rapid thermal and forming gas anneals.

cond-mat.mtrl-sci↗