A scanning probe microscopy approach for identifying defects in aluminum oxide
The coherence of quantum dot qubits fabricated in semiconductors is often limited by charge noise from defects in gate dielectrics, which are material- and process-dependent. Characterizing these defects is an important step towards reducing their impact and improving qubit coherence. The identification of individual defects requires atomic-scale spatial resolution, however, and sufficient spectral sensitivity to determine their electronic structure. Electrostatic force microscopy (EFM) provides highly resolved maps of the surface potential of dielectrics, and importantly, is also sensitive to single-electron charging processes that reflect the spectral structure of underlying defects. In this work, we use cryogenic EFM to characterize aluminum oxide grown by atomic layer deposition (ALD) on bulk silicon. These measurements reveal defects close to the surface that exchange electrons with the EFM tip as they transition through different charge states. Detailed electrostatic modeling opens the door to powerful techniques for mapping tip-backgate charging voltages onto defect transition energies, allowing defects such as aluminum vacancies, and carbon, oxygen, or hydrogen impurities to be identified, by comparing to density functional theory (DFT). These results point towards EFM as a powerful tool for exploring defect structures in solid-state qubits.