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Lorenzo Piatti

Publications and source records attributed to Lorenzo Piatti.

2 recordsLinked to original sources

Antireflection by design in bilayer metasurfaces

Antireflection coatings are ubiquitous in optical systems, where they maximize transmission and suppress undesirable reflections by impedance-matching uniform interfaces. Extending this principle to metasurfaces, however, is fundamentally more challenging because wavefront control requires a library of geometrically distinct meta-atoms, each locally imposing a prescribed phase that is tethered to its transmittance. Here, we show that vertical integration resolves this constraint by allowing bilayer meta-atoms to operate simultaneously as a phase shifter and an impedance-matching stack. Using an effective thin-film model, we derive a design rule that links the effective indices of two independently patterned layers and identifies antireflective bilayer libraries with full $0$-$2π$ transmission-phase coverage. We realize this concept in a free-standing TiO$_2$/TiO$_2$ metalens operating at 1310 nm, which suppresses reflectance below that of bare glass while preserving diffraction-limited focusing. These results establish bilayer metasurfaces as a framework for co-engineering optical impedance and wavefront response at the meta-atom level.

physics.optics

Fundamental Understanding of Exposure and Process Chemistry for Enhanced Lithography and Stability of Metal Oxide Resists

Metal oxide resists (MORs) have shown great promise for high resolution patterning in extreme ultraviolet (EUV) lithography, with potential for integration into high volume manufacturing. However, MORs have recently been shown to exhibit sensitivity to process conditions and environment, leading to critical dimension (CD) variation. While this variation can be reduced with proper process control, there is little knowledge on how these aspects affect the image formation mechanism. To bridge these knowledge gaps, we deploy a coordinated, fundamentals-focused approach to yield deep insights into MOR exposure and process chemistry. Our results on a model MOR, an n-butyl Sn-Oxo system, reveal how parameters such as exposure dose, post-exposure bake temperature, and atmospheric species influence the image formation mechanism. Our results, and the coordinated approach using correlative spectroscopies, provide a strong foundation for understanding the image formation mechanism in MOR materials with potential to link mechanistic aspects to CD variation.

cond-mat.mtrl-sci