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Luke Doucette

Publications and source records attributed to Luke Doucette.

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Substrate-dependent thermally driven morphological evolution of Pt$_{0.9}$Ni$_{0.1}$ thin films on sapphire and langasite

We examine the thermal evolution of 100-nm-thick Pt$_{0.9}$Ni$_{0.1}$ alloy films on sapphire and langasite substrates with a 10-nm Zr adhesion layer. Sequential vacuum annealing from room temperature to 800 $^\circ$C produces a substrate-dependent morphological pathway that is quantified by atomic force microscopy, image segmentation, height-distribution analysis, and effective coarsening metrics. Both types of films remain densely granular up to 400 $^\circ$C, undergo a sharp coarsening transition between 400 and 600 $^\circ$C, and evolve into coalesced faceted crystallites by 800 $^\circ$C. The mean projected feature area increases from $7.84 \times 10^2$ to $1.09 \times 10^5$ nm$^2$ on langasite and from $3.32 \times 10^2$ to $1.67 \times 10^5$ nm$^2$ on sapphire. Sapphire therefore develops the larger faceted crystallites, while langasite exhibits the larger roughness maximum at 600 $^\circ$C. Area distributions reveal that the 400-600 $^\circ$C transition does not uniformly shift the initial granular population but instead replaces it with a distinct large-feature ensemble. Height and roughness measurements show a pronounced maximum at 600 $^\circ$C, followed by partial smoothing at 800 $^\circ$C, consistent with rapid coalescence followed by faceting-limited growth. An effective Arrhenius analysis based on $\Delta\langle r^2\rangle$, with $\langle r^2\rangle = \langle A\rangle/\pi$, identifies the 400-600 $^\circ$C interval as the dominant coarsening window. These results show that the thermal stability of PtNi/Zr films on sapphire and langasite is governed by the coupled influence of alloy mobility, interfacial energetics, and substrate-dependent morphological selection.

cond-mat.mtrl-sci

Investigation on the temperature dependence of substrate-induced in-plane uniaxial magnetic anisotropy in Ni thin films grown on 128{\deg} Y-cut LiNbO3

We report the temperature dependence of the substrate-induced magnetic anisotropy in continuous Ni thin films deposited at room temperature using magnetron sputtering on a 128{\deg} Y-cut LiNbO3 substrate. Ultrathin films exhibit a pronounced temperature dependence in magnetization, with as-grown films showing isotropic behavior and an unconventional hysteresis branch crossing at relatively low temperatures, whereas no branch crossing is observed in annealed films over the investigated temperature range, indicating suppression of the underlying mechanism. Temperature-dependent magnetization measurements show that post-deposition annealing establishes uniaxial anisotropy with well-defined easy and hard axes, whose strength evolves with temperature due to the nature of residual strain governed by both lattice mismatch and coefficient of thermal expansion (CTE) mismatch between the Ni film and the 128{\deg} Y-cut substrate, independent of film thickness for both 5 nm and 100 nm films. The emergence of this anisotropy following annealing indicates enhanced magnetoelastic coupling at the film-substrate interface, as the magnetic response begins to follow the anisotropic strain imposed by lattice mismatch and CTE mismatch.

cond-mat.mtrl-sci