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M. Stiller

Publications and source records attributed to M. Stiller.

3 recordsLinked to original sources

Fabrication and electrical transport properties of embedded graphite microwires in a diamond matrix

Micrometer width and nanometer thick wires with different shapes were produced $\approx 3~\upmu$m below the surface of a diamond crystal using a microbeam of He$^+$ ions with 1.8~MeV energy. Initial samples are amorphous and after annealing at $T\approx 1475$~K, the wires crystallized into a graphite-like structures, according to confocal Raman spectroscopy measurements. The electrical resistivity at room temperature is only one order of magnitude larger than the in-plane resistivity of highly oriented pyrolytic bulk graphite and shows a small resistivity ratio($ρ(2{\rm K})/ρ(315{\rm K}) \approx 1.275$). A small negative magnetoresistance below $T=200$~K was measured and can be well understood taking spin-dependent scattering processes into account. The used method provides the means to design and produce millimeter to micrometer sized conducting circuits with arbitrary shape embedded in a diamond matrix.

cond-mat.mes-hall

Influence of rhombohedral stacking order in the electrical resistance of bulk and mesoscopic graphite

The electrical, in-plane resistance as a function of temperature $R(T)$ of bulk and mesoscopic thin graphite flakes obtained from the same batch was investigated. Samples thicker than $\sim 30$ nm show metalliclike contribution in a temperature range that increases with the sample thickness, whereas a semiconductinglike behavior was observed for thinner samples. The temperature dependence of the in-plane resistance of all measured samples and several others from literature can be very well explained between 2 K and 1100 K assuming three contributions in parallel: a metalliclike conducting path at the interfaces between crystalline regions, composed of two semiconducting phases, i.e. Bernal and rhombohedral stacking. From the fits of $R(T)$ we obtain a semiconducting energy gap of $110 \pm 20$meV for the rhombohedral and $38\pm 8 $meV for the Bernal phase. The presence of these crystalline phases was confirmed by x-ray diffraction measurements. We review similar experimental data from literature of the last 33 years and two more theoretical models used to fit $R(T)$.

cond-mat.mtrl-sci

Topological Insulator Thin Films Starting from the Amorphous Phase - Bi$_2$Se$_3$ as Example

We present a new method to obtain topological insulator Bi$_2$Se$_3$ thin films with a centimeter large lateral length. To produce amorphous Bi$_2$Se$_3$ thin films we have used a sequential flash-evaporation method at room temperature. Transmission electron microscopy has been used to verify that the prepared samples are in a pure amorphous state. During annealing the samples transform into the rhombohedral Bi$_2$Se$_3$ crystalline strcuture which was confirmed using X-ray diffraction and Raman spectroscopy. Resistance measurements of the amorphous films show the expected Mott variable range hopping conduction process with a high specific resistance compared to the one obtained in the crystalline phase (metallic behavior). We have measured the magnetoresistance (MR) and the Hall effect (HE) at different temperatures between 2 K and 275 K. At temperatures $T \lesssim 50$ K and fields $B \lesssim 1$ T we observe weak anti-localization in the MR; the Hall measurements confirm the n-type character of the samples. All experimental results of our films are in quantitative agreement with results from samples prepared using more sophisticated methods.

cond-mat.mtrl-sci