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M. V. Voitovych

Publications and source records attributed to M. V. Voitovych.

4 recordsLinked to original sources

DHICA ion-modified melanin based porous Si solar cell

This work studies photosensitivity and current-voltage characteristics under illumination of water-soluble eumelanin films based on DHICA tetramers and hybrid eumelanin/porous Si photovoltaic cells aimed at optimizing their characteristics. By using DMSO to dissolve melanin containing protonated carboxyl groups and to remove ammonium cations, it became possible to significantly reduce the ionic component of conductivity, thus improved the electron transport. It was found out that dissolution in DMSO provides a denser {\pi}-{\pi} stacking of DHICA tetramers, which led to a significant improvement in the photovoltaic cell parameters. In particular, the efficiency increased from 0.023 % to 4.4 % and the series resistance decreased from 119 {\Omega} to 42.6 {\Omega}. Modeling demonstrated that high-temperature annealing, which causes decarboxylation, leads to a structural rearrangement of tetramers from a Christmas tree-like configuration to a "toothed helix". At this, one of the planes partially straightens. This emphasizes the critical importance of the morphology of the organic layer for photogeneration of carriers in a heterojunction.

cond-mat.mtrl-sci

Identification of formation of amorphous Si phase in SiOxNy films produced by plasma enhanced chemical vapor deposition

Peculiarities of formation of inclusions of amorphous Si (a-Si) phase in Si-rich Si oxynitride films grown by plasma-enhanced chemical vapor deposition (PECVD) are studied by combined Raman scattering and infrared (IR) absorption spectroscopy. The Raman scattering results identify presence of a-Si phase in the studied films at the relative Si content exceeding a threshold value of about 0.4. The a-Si amount correlates with the concentration of hydrogen in the films, the presence of which is detected by characteristic IR absorption bands corresponding to Si-H bending (about 660 cm-1) and stretching (a composite band in the range of about 1900-2400 cm-1) vibrations. The method of deconvolution of IR absorbance spectra in the range of about 600 to 1300 cm-1 developed earlier is used to reliably separate the IR band at about 660 cm-1. This band is identified to origin from the amorphous Si phase within the studied Si oxynitride films. This makes it possible to propose IR spectroscopy with analysis of the low-wavenumber part of the spectra as an efficient method of identifying phase composition of Si-rich Si oxynitride films. The obtained results contribute to understanding of the regularities of formation of phase compositions of PECVD grown Si oxynitride films and are useful for controlling the films properties for practical applications.

cond-mat.mtrl-sci