arXiv subjects

MVS Chandrashekhar

Publications and source records attributed to MVS Chandrashekhar.

5 recordsLinked to original sources

arXiv2026

Scandium diboride: a semi-metallic, lattice, thermally matched substrate for vertical AlGaN power electronics

We report the properties of hexagonal (space group P6/mmm) scandium diboride ($\mathrm{ScB}_2$) single crystals grown by a laser diode floating zone method at growth rates of ~1mm/hr under B-rich conditions with (002) rocking curve widths $Δω$=38'' approaching the quality of commercial SiC/GaN substrates. Lattice expansion measurements reveal matching to $\mathrm{Al_{0.55}Ga_{0.45}N}$ with a coefficient of thermal expansion ~5ppm/K at typical AlGaN growth temperatures, enabling thick AlGaN layers for ultra-wide bandgap (UWBG) power electronics >1kV. We measure semi-metallic room temperature resistivity ~15$μΩ$ cm, climbing to ~93$μΩ$ cm at 773K with a $T^2$ dependence effectively eliminating substrate parasitic resistance, the limiting factor in exploiting the full potential of UWBG. The Debye temperature $θ_{D,ScB_2}$ from heat capacity and lattice expansion is ~850K well matched to $θ_{D,ScB_2}$, but lower than the 1100K measured for Sc-rich growth conditions. We discuss Debye matching as a key substrate codesign criterion providing significant overlap in phonon modes for heat removal and thermal matching during AlGaN growth. The competitive thermal conductivity at room temperature 53W/mK is half that from full first principles calculations, a discrepancy we attribute to the presence of Sc-vacancies generated by B-rich growth. while the resistivity is ~2x the theoretical value, indicating that both electrons and phonons play equal role in thermal transport. The smooth ~2.5nm rms roughness surface enables advanced heat removal modalities through engineered phonon bridges and phonon polaritons in $\mathrm{ScB}_2$/AlGaN interfacial heterostructures, potentially allowing ~10-100x increase in power handling over state-of-the-art GaN/SiC.

cond-mat.mtrl-sci↗

arXiv2026

Crystal growth and characterization of the ultra-high temperature substrate $\mathrm{Ta_{1-x}Hf_{x}C_{0.5}}$

Incorporation of $\mathrm{Al_{y}Ga_{1-y}N}$ (AGN) semiconductors into high power electronics offers efficiency improvements in power transmission, generation, and use, if approaches to eliminate the defects arising from film-lattice mismatch can be established. Here, we report the optical floating zone crystal growth of $\mathrm{Ta_{1-x}Hf_{x}C_{0.5}}$ (x = 0.2), a new metallic substrate material family lattice matched to the ultra-wide-band-gap, Al-rich side (y = 0.91) of the AGN solid solution. Laue diffraction demonstrates large single crystal domains in the as-grown boule. Single crystal x-ray diffraction at T = 213 K in conjunction with first principles calculations shows that the material adopts a layered crystal structure with AA-type stacking of (Ta/Hf)-C-(Ta/Hf) trilayers described in the trigonal space group P-3m1 (#164), with a = 3.1168(4) Å, c = 4.9644(4) Å, and $β$ = 120.0°. X-ray photoelectron spectroscopy (XPS) measurements show the Hf:Ta ratio to be close to the nominal value of 0.8:0.2 in the grown crystal. Density Functional Theory calculations reveal that this structure is stabilized by the low energy of carbon-vacancy formation of a hypothetical $\mathrm{(Ta/Hf)_{1}C_{1}}$ anti-NiAs structure type, and imply flexibility in interface structure with an overlayer nitride film. A surface preparation/polishing procedure is developed that reduces root mean square (RMS) surface roughness from as-cut 130 nm to 7 nm as measured by atomic force microscopy. Scanning electron microscopy shows the presence of a native surface oxide, removed by polishing, along with carbon-rich pits. Time-domain thermoreflectance measurements show a room temperature thermal conductivity of $κ$ = 18.1(4) W m-1 K-1. These results provide key first steps for utilizing metallic, lattice matched, substrates for the growth of Al-rich AGN semiconductors.

cond-mat.mtrl-sci↗

arXiv2013

A comparative study of SiC epitaxial growth in vertical hotwall CVD reactor using silane and dichlorosilane precursor gases

SiC epitaxial films grown in an inverted chimney CVD reactor are analyzed and compared for growth rates, doping concentration and surface morphology using silane-propane-hydrogen and dichlorosilane (DCS)-propane-hydrogen chemistry systems. A general 1-D analytical model is presented to estimate the diffusivity of precursor gases, boundary layer thickness and growth rates for both gas systems. Decomposition of precursor gases into Si growth species is investigated by a commercial simulation tool, Virtual Reactor (VR). DCS suppresses the formation of elemental Si at lower pressures, reduces precursor losses, and leads to increased growth rate. However, at higher pressures, even DCS decomposes into elemental Si, which contributes to high Si depletion, limiting the maximum achievable growth rate. Reduction of Si loss using DCS is verified by mass measurements of parasitic depositions in the injector tube. The doping concentration of the epitaxial film is governed by the effective C/Si ratio at the growth surface rather than the inlet C/Si ratio, which is examined at various growth pressures. In addition to the widely known Si-depletion, C-depletion is also shown to exist and it plays a critical role in determining the doping concentration at various growth conditions. Increased roughness for the DCS growth at higher pressures is addressed and attributed to excessive HCl etching at higher pressures.

cond-mat.mtrl-sci↗

arXiv2011

High purity semi-insulating 4H-SiC epitaxial layers by Defect-Competition Epitaxy

Thick, high-purity semi-insulating (SI)homoepitaxial layers on Si-face 4H-SiC weregrownsystematically, with resistivity \geq 109Ω-cmby maintaining high C/Si ratios 1.3-15 during growth.Comparison of secondary ion mass spectra betweenlow-dopedepilayers grown at C/Si ratio<1.3andSI-epilayers grown at C/Si ratio>1.3 showed little difference in residual impurity concentrations. A reconciliation of impurity concentration with measured resistivity indicated a compensating trap concentration of ~1015cm-3present only in the SI-epilayers. High- resolution photo induced transient spectroscopy (HRPITS) identified themas Si-vacancy related deep centers, with no detectable EH6/7 and Z1/2levels. Recombination lifetimes ~5ns suggest application in fast-switching power devices.

cond-mat.mtrl-sci↗

arXiv2010

Graphene to Graphane: Novel Electrochemical Conversion

A novel electrochemical means to generate atomic hydrogen, simplifying the synthesis and controllability of graphane formation on graphene is presented. High quality, vacuum grown epitaxial graphene (EG) was used as starting material for graphane conversion. A home-built electrochemical cell with Pt wire and exposed graphene as the anode and cathode, respectively, was used to attract H+ ions to react with the exposed graphene. Cyclic voltammetry of the cell revealed the potential of the conversion reaction as well as oxidation and reduction peaks, suggesting the possibility of electrochemically reversible hydrogenation. A sharp increase in D peak in the Raman spectra of EG, increase of D/G ratio, introduction of a peak at ~2930 cm-1 and respective peak shifts as well as a sharp increase in resistance showed the successful hydrogenation of EG. This conversion was distinguished from lattice damage by thermal reversal back to graphene at 1000°C.

physics.chem-ph↗