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Mahsa Torfeh

Publications and source records attributed to Mahsa Torfeh.

3 recordsLinked to original sources

Dimension expansion for simulation-efficient nanophotonic neural networks

Inverse design of nanophotonic structures is challenging due to the large design space, nonlinear structure-response relationships, and the high computational cost of iterative electromagnetic simulations. Existing deep-learning approaches typically rely on large precomputed datasets or libraries of optimized structures, which limits scalability to continuous and complex inverse-design tasks. We introduce a Dimension Expansion Network (DEN), a fully unsupervised, simulation-efficient framework for nanophotonic inverse design. DEN addresses the mismatch between low-dimensional design objectives and high-dimensional nanophotonic structures by transforming compact target parameters into structured, high-dimensional conditioning representations before inverse design. This improves target expressivity and conditioning quality for structure generation. The model is trained end-to-end using differentiable electromagnetic simulations, removing the need for any pre-generated dataset. We validate DEN on free-form metalens and asymmetric Y-splitter design problems. For metalens design, DEN achieves focal intensities comparable to adjoint-based optimization while reducing simulation cost by approximately 50% and generalizing across tens to thousands of focal targets within a shared focal region. For Y-splitter design, DEN accurately produces arbitrary power-splitting ratios using only 21 training targets and demonstrates robust broadband performance. Ablation studies and representation analyses show that dimension expansion enhances sensitivity to target variations, increases structural diversity, and reduces mode-collapse-like behavior. Overall, DEN provides a scalable conditioning strategy for inverse design with low-dimensional objectives, enabling efficient photonic design across large continuous target spaces.

eess.IV

Visible metalenses with high focusing efficiency fabricated using nanoimprint lithography

Metasurfaces enable precise control over the properties of light and hold promise for commercial applications. However, fabricating visible metasurfaces suitable for high-volume production is challenging and requires scalable processes. Nanoimprint lithography is a cost-effective and high-throughput technique that can meet this scalability requirement. This work presents a mask-templating nanoimprint lithography process for fabricating metasurfaces with varying fill factors and negligible wavefront aberrations using composite stamps. As a proof-of-concept, a 6 mm diameter metalens formed of silicon nitride nano-posts with a numerical aperture of 0.2 that operates at 550 nm is demonstrated. The nanoimprinted metalens achieves a peak focusing efficiency of ($81\pm1$)%, comparable to the control metalens made with electron beam lithography with a focusing efficiency of ($89\pm1$)%. Spatially resolved deflection efficiency and wavefront data, which informs design and process optimization, is also presented. These results highlight nanoimprint lithography as a cost-effective, scalable method for visible metasurface fabrication that has the potential for widespread adoption in consumer electronics and imaging systems.

physics.optics

Modeling metasurfaces using discrete-space impulse response technique

Metasurfaces are arrays of subwavelength meta-atoms that shape waves in a compact and planar form factor. Analysis and design of metasurfaces require methods for modeling their interactions with waves. Conventional modeling techniques assume that metasurfaces are locally periodic structures excited by plane waves, restricting their applicability to gradually varying metasurfaces that are illuminated with plane waves. Here we introduce the discrete-space impulse response concept that enables the development of accurate and general models for metasurfaces. According to the proposed model, discrete impulse responses are assigned to metasurface unit cells and are used to determine the metasurface response to any arbitrary incident waves. We verify the accuracy of the model by comparing its results with full-wave simulations. The proposed concept and modeling technique are applicable to linear metasurfaces with arbitrary meta-atoms, and the resulting system-level models can be used to accurately incorporate metasurfaces into simulation and design tools that use wave or ray optics.

physics.optics