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Mamour Sall

Publications and source records attributed to Mamour Sall.

4 recordsLinked to original sources

Formation of Ag and Au Plasmonic Nanoparticles by Ion Implantation in Ga$_2$O$_3$ thin films

Gallium oxide (Ga$_2$O$_3$) is a wide-bandgap semiconductor with exceptional electrical and optical properties, making it a promising material for optoelectronic and sensing applications. In this work, we demonstrate for the first time the formation of plasmonic silver (Ag) and gold (Au) nanoparticles embedded in Ga$_2$O$_3$ thin films via ion implantation. Ga$_2$O$_3$ films deposited by RF sputtering on sapphire substrates were implanted with Ag or Au ions at 150 keV and a nominal fluence of 5 $\times$ 10$^{16}$ ions/cm$^2$, followed by thermal annealing between 200 and 700 {\deg}C. Rutherford backscattering spectrometry (RBS) measurements revealed saturation effects during implantation, resulting in lower incorporated fluences, as well as out-diffusion with post-implantation annealing. Transmission electron microscopy confirmed the formation of metallic nanoparticles with a distribution consistent with the metal profiles measured by RBS. Optical absorption measurements showed a pronounced localized surface plasmon resonance (LSPR) band in the Ag-implanted films, visible even in the as-implanted state and red-shifting with increasing annealing temperature, while Au-implanted films exhibited a distinct LSPR peak only after annealing at $\geq$500 {\deg}C. The observed LSPR shifts with annealing are attributed primarily to changes in the Ga$_2$O$_3$ matrix rather than a change in nanoparticle size. These results establish ion implantation as a viable approach for integrating plasmonic nanostructures into Ga$_2$O$_3$.

cond-mat.mtrl-sci

Growth mechanisms of GaN/GaAs nanostructures by droplet epitaxy explained by complementary experiments and simulations

In this work, we present conception and study of gallium nitride (GaN) nanostructures on a gallium arsenide (GaAs) substrate with (111)A orientation. The nanostructures were designed by GaN droplet epitaxy and studied in-situ by X-ray photoelectron spectroscopy and ex-situ by atomic force microscopy, scanning electron microscopy and transmission electron microscopy. These studies were coupled with kinetic Monte Carlo simulations to precisely understand the phenomena occurring during the nitridation and to find the optimum conditions for complete nitridation of gallium droplets. The HRTEM observation showed a cubic (zinc blende) crystal structure of the GaN nanodots for a nitridation at 300{\deg}C. Ramping the temperature from 100{\deg}C to 350{\deg}C during droplet nitridation enabled to obtain a very high density (>1011cm-2) of GaN nanodots with the zinc blende crystallinity.

cond-mat.mtrl-sci

Revealing nanoscale disorder in W/CoFeB/MgO ultra-thin films using domain wall motion

Disorder in ultra-thin magnetic films can significantly hinder domain wall motion. One of the main issues on the path towards efficient domain wall based devices remains the characterization of the pinning landscape at the nanoscale. In this paper, we study domain wall motion in W/CoFeB/MgO thin films with perpendicular magnetic anisotropy crystallized by annealing at 400$^{\circ}$C and a process based on He$^{+}$ irradiation combined with elevated temperatures. Magnetic properties are similar for the whole series of samples, while the magnetic domain wall mobility is critically improved in the irradiated samples. By using an analytical model to extract nanoscale pinning parameters, we reveal important variations in the disorder of the crystallized samples. This work offers a unique opportunity to selectively analyze the effects of disorder on the domain wall dynamics, without the contribution of changes in the magnetic properties. Our results highlight the importance of evaluating the nanoscale pinning parameters of the material when designing devices based on domain wall motion, which in return can be a powerful tool to probe the disorder in ultra-thin magnetic films.

cond-mat.mtrl-sci

Ion irradiation and implantation modifications of magneto-ionically induced exchange bias in Gd/NiCoO

Magneto-ionic control of magnetic properties through ionic migration has shown promise in enabling new functionalities in energy-efficient spintronic devices. In this work, we demonstrate the effect of helium ion irradiation and oxygen implantation on magneto-ionically induced exchange bias effect in Gd/Ni$_{0.33}$Co$_{0.67}$O heterostructures. Irradiation using $He^+$ leads to an expansion of the Ni$_{0.33}$Co$_{0.67}$O lattice due to strain relaxation. At low He+ fluence ($\leq$ 2$\times$10$^{14}$ ions cm$^{-2}$), the redox-induced interfacial magnetic moment initially increases, owing to enhanced oxygen migration. At higher fluence, the exchange bias is suppressed due to reduction of pinned uncompensated interfacial Ni$_{0.33}$Co$_{0.67}$O spins. For oxygen implanted samples, an initial lattice expansion below a dose of 5$\times$10$^{15}$ cm$^{-2}$ is subsequently dominated at higher dose by a lattice contraction and phase segregation into NiO and CoO-rich phases, which in turn alters the exchange bias. These results highlight the possibility of ion irradiation and implantation as an effective means to tailor magneto-ionic effects.

cond-mat.mtrl-sci