arXiv subjects

Marcin Maździarz

Publications and source records attributed to Marcin Maździarz.

21 records · Page 2Linked to original sources

arXiv2017

A comment on "Ab initio calculations of pressure-dependence of high-order elastic constants using finite deformations approach" by I. Mosyagin, A.V. Lugovskoy, O.M. Krasilnikov, Yu.Kh. Vekilov, S.I. Simak and I.A. Abrikosov

Recently, I. Mosyagin, A.V. Lugovskoy, O.M. Krasilnikov, Yu.Kh. Vekilov, S.I. Simak and I.A. Abrikosov in the paper: "Ab initio calculations of pressure-dependence of high-order elastic constants using finite deformations approach"[Computer Physics Communications 220 (2017) 2030] presented a description of a technique for ab initio calculations of the pressure dependence of second- and third-order elastic constants. Unfortunately, the work contains serious and fundamental flaws in the field of finite-deformation solid mechanics.

cond-mat.soft↗

arXiv2017

A comment on the article "The Schwarz alternating method in solid mechanics" by Alejandro Mota, Irina Tezaur and Coleman Alleman [Comput. Methods Appl. Mech. Engrg. 319 (2017) 1951]

Recently, in the paper "The Schwarz alternating method in solid mechanics" by Alejandro Mota, Irina Tezaur and Coleman Alleman [Comput. Methods Appl. Mech. Engrg. 319 (2017) 1951] the authors extended the well known Schwarz alternating method from linear to finite-deformation solid mechanics. They developed and introduced four variants of the Schwarz alternating method, presented proof of geometric convergence of the method and prepared parallel implementation applied to some examples. Unfortunately, the work contains serious errors, both from the point of view of finite-deformation solid mechanics as well as mathematical elasticity.

math.NA↗

arXiv2016

Hybrid reciprocal lattice: application to layer stress appointment in GaAlN/GaN(0001) systems with patterned substrates

Epitaxy of semiconductors is a process of tremendous importance in applied science and optoelectronic industry. Controlling of defects introduced during epitaxial growth is a key point in manufacturing devices of high efficiency and durability. In this work, we demonstrate how useful hybrid reflections are on the study of epitaxial structures with anisotropic strain gradients due to patterned substrates. High accuracy to detect and distinguish elastic and plastic relaxations are one of the greatest advantages of measuring this type of reflection, as well as the fact that it can be exploited in symmetrical reflection geometry on a commercial high-resolution diffractometer.

cond-mat.mtrl-sci↗