arXiv subjects

Maria Hilse

Publications and source records attributed to Maria Hilse.

13 recordsLinked to original sources

arXiv2026

Enhanced Superconductivity in Multilayer FeSe Films by Simplified Molecular Beam Epitaxy

Multi-unit-cell (UC) \b{eta}-FeSe films grown on SrTiO3(100) continue to attract attention because of the significant enhancement in the superconducting transition temperature (Tc) compared to that in bulk FeSe. In prior reports of molecular beam epitaxy (MBE)-grown \b{eta}-FeSe/SrTiO3(100), elaborate growth protocols have been used to achieve enhanced Tc, leading to a general belief that careful pre-treatment of the SrTiO3 substrate and post-growth annealing in ultrahigh vacuum (UHV) are essential. Here, we report a greatly simplified protocol for the MBE growth of superconducting multi-UC \b{eta}-FeSe films on SrTiO3(100), eliminating the need for careful substrate pre-treatment and post-growth UHV annealing while still achieving an enhanced Tc. With appropriate capping, epitaxial films with 14 UC thickness exhibit a zero-resistance transition temperature Tc ~ 20 K in ex situ electrical transport measurements. The MBE optimization process is guided by the growth-parameter dependencies of film morphology and structural properties, as characterized by reflection high-energy electron diffraction, X-ray diffraction, atomic force microscopy, and scanning transmission electron microscopy.

cond-mat.supr-con↗

arXiv2026

Transport Evidence of Magnetic Polarization in the Altermagnetic Candidate MnTe

The ability to precisely control magnetic properties is central to the development of future spin-based electronics. In this work, we report the successful growth of epitaxial {\alpha}-MnTe thin films on InP(111) substrates using molecular beam epitaxy. Magneto-transport measurements at low temperatures reveal a distinct, hysteretic butterfly longitudinal magnetoresistance alongside a nonlinear transverse magneto-resistance response, suggesting the presence of a finite net magnetic polarization in the films. To understand the origin of this behavior, density functional theory (DFT) calculations were performed. While pristine bulk MnTe is a compensated antiferromagnet, our computational results suggest multiple pathways through which a finite magnetization can emerge in thin-film geometries, including interface-induced symmetry breaking and point defects. These findings demonstrate an epitaxial route for engineering magnetic responses in thin films.

cond-mat.mtrl-sci↗

arXiv2026

Molecular Beam Epitaxy of Mn2In2Se5 van der Waals Layers Using Mn Intercalation

The weak van der Waals (vdW) force in layered chalcogenide materials has enabled the growth of ternary chalcogenide layers using unconventional approaches. Here, we report the molecular beam epitaxy (MBE) growth of Mn2In2Se5, a spin glass material with high level of magnetic frustration, through the heterointegration of MnSe on In2Se3. Directly depositing {\alpha}-MnSe on the vdW In2Se3 layers results in Mn intercalation, transforming the In2Se3 layer into Mn2In2Se5. Large growth windows, including substrate temperatures from 250-450 {\deg}C and Se:Mn flux ratio of 1.1-3.1, have been identified for the intercalation process. With an optimized MnSe deposition time, smooth, single-crystalline, and (0001)-oriented Mn2In2Se5 layers with a root-mean-square (RMS) roughness of 1.5 nm can be synthesized. Further extending the MnSe deposition time results in the growth of uniform rock-salt structured {\alpha}-MnSe (111) layers with a thickness of up to 8 nm and a narrow full-width-at-half-maximum (FWHM) of 0.35{\deg} in MnSe (222) XRD rocking curves. This report presents a unique approach for the growths of uniform and single-crystalline Mn2In2Se5 vdW layers using MBE, and potentially opens a pathway for synthesis of ternary vdW chalcogenides by intercalation of new atomic species in binary vdW chalcogenides.

cond-mat.mtrl-sci↗

arXiv2026

Molecular Beam Epitaxy Growth of Wafer-scale SnSe van der Waals Ultrathin Layers

Tin selenide (SnSe) is a van der Waals (vdW) layered post-transition metal monochalcogenide compound which is promising for a wide range of device applications when its thickness is reduced to a few layers. Hence, developing a mature synthesis technique to obtain wafer-scale, high-quality ultrathin SnSe layers is crucial. In this work, we present a comprehensive study on the effect of growth parameters on the material quality of ultrathin SnSe thin films grown by molecular beam epitaxy. A growth window including substrate temperature of 210-270{\deg}C and low Se/Sn flux ratio with Se valve position of 10-30 mils has been identified which results in SnSe films with root-mean-square (RMS) roughness as low as 0.6 nm and full-width-at-half-maximum (FWHM) of 0.1{\deg} in SnSe (400) x-ray diffraction (XRD) rocking curve. Finally, using a three-step growth approach, we demonstrate wafer-scale coalesced ultrathin SnSe layers with thicknesses from 20 nm down to 5 nm, with good crystallinity, structural quality, and surface morphology. This work establishes a growth condition framework for MBE-grown SnSe and presents a viable route for developing wafer-scale single-layer films, unlocking the potential of this highly promising material for advanced device integration.

cond-mat.mtrl-sci↗

arXiv2025

Perspective: Mitigation of structural defects during the growth of two-dimensional van der Waals chalcogenides by molecular beam epitaxy

The growth of wafer-scale van der Waals (vdW) thin films and heterostructures by molecular beam epitaxy (MBE) is important for future applications in quantum technologies, next generation optoelectronic devices, and fundamental physics investigations. When grown using co-deposition methods that are typically used for compound semiconductor MBE, vdW materials typically show a high density of structural defects including twin or antiphase domains, spiral growth, and pyramidal growth. These defects are caused by the relatively weak film/substrate interaction and/or the poor wettability of typical substrates by many vdW materials. These difficulties can be mitigated using a multi-step growth procedure in which growth stages including nucleation and coalescence can be rigorously controlled, resulting in high-quality deposition of vdW thin films. This article will describe a general recipe for the growth of highly-crystalline wafer-scale vdW thin films by MBE.

cond-mat.mtrl-sci↗

arXiv2024

Growth Conditions and Interfacial Misfit Array in SnTe (111) films Grown on InP (111)A Substrates by Molecular Beam Epitaxy

Tin telluride (SnTe) is an IV-VI semiconductor with a topological crystalline insulator band structure, high thermoelectric performance, and in-plane ferroelectricity. Despite its many applications, there has been little work focused on understanding the growth mechanisms of SnTe thin films. In this manuscript, we investigate the molecular beam epitaxy (MBE) synthesis of SnTe (111) thin films on InP (111)A substrates. We explore the effect of substrate temperature, Te:Sn flux ratio, and growth rate on the film quality. Using a substrate temperature of 340 {\deg}C, a Te:Sn flux ratio of 3, and a growth rate of 0.48 {\AA}/s, fully coalesced and single crystalline SnTe (111) epitaxial layers with x-ray rocking curve full-width-at-half-maxima (FWHM) of 0.09{\deg} and root-mean-square surface roughness as low as 0.2 nm have been obtained. Despite the 7.5% lattice mismatch between the SnTe (111) film and the InP (111)A substrate, reciprocal space mapping indicates that the 15 nm SnTe layer is fully relaxed. We show that a periodic interfacial misfit (IMF) dislocation array forms at the SnTe/InP heterointerface, where each IMF dislocation is separated by 14 InP lattice sites/13 SnTe lattice sites, providing rapid strain relaxation and yielding the high quality SnTe layer. This is the first report of an IMF array forming in a rock-salt on zinc-blende material system and at an IV-VI on III-V heterointerface, and highlights the potential for SnTe as a buffer layer for epitaxial telluride film growth. This work represents an important milestone in enabling the heterointegration between IV-VI and III-V semiconductors to create multifunctional devices.

cond-mat.mtrl-sci↗

arXiv2024

Mixed polytype/polymorph formation and its effects on the electronic properties in InSe films grown by molecular beam epitaxy on GaAs(111)B

The top-down synthesis of inherently ferroelectric semiconductors and their integration with traditional material platforms have the potential to enable new low power logic devices, and to harness the bulk photoelectric effect for more efficient photovoltaic cells. InSe is a layered van der Waals compound exhibiting multiple polytypes, with semiconducting gamma-InSe revealing a non-centrosymmetric space group and showing a high carrier mobility at room temperature. Here we report the growth of InSe films on close to lattice matched semi-insulating GaAs(111)B substrates by molecular beam epitaxy (MBE). Excellent nucleation behavior resulted in the growth of smooth, single phase InSe films. The dominant polytype determined from X-ray diffraction was the targeted gamma-InSe, however Raman spectroscopy revealed spatial variations in the overall low-intensity non-centrosymmetric vibration modes. Transmission electron microscopy uncovered the presence of the three bulk polytypes beta, gamma, and epsilon-InSe coexisting in the films arranging in nanosized domains. The different polytypes can be interpreted as sequences of stacking faults and rotational twin boundaries of gamma-InSe made from individual non-centrosymmetric Se-In-In-Se layers with P-6m2 symmetry. A second, centrosymmetric Se-In-In-Se layer polymorph was identified with P-3m symmetry, which is typically not present in InSe bulk phases. First principles calculations revealed small formation energy differences between the InSe polymorphs and polytypes, yet sizeable differences in their electronic properties. Nanoscale domain sizes of varying polytypes thus resulted in sizeable electronic disorder in the grown films that dominated the electronic transport properties. Our results indicate that bottom-up thin film synthesis is a viable synthesis route towards stabilization of InSe polytypes not present in the bulk.

cond-mat.mtrl-sci↗

arXiv2024

Quasi-van der Waals Epitaxial Growth of {\gamma}'-GaSe Thin Films on GaAs(111)B Substrates

GaSe is an important member of the post-transition metal chalcogenide family and is an emerging two-dimensional (2D) semiconductor material. Because it is a van der Waals material, it can be fabricated into atomic-scale ultrathin films, making it suitable for the preparation of compact, heterostructure devices. In addition, GaSe possesses unusual optical and electronic properties, such as a shift from an indirect-bandgap single-layer film to a direct-bandgap bulk material, rare intrinsic p-type conduction, and nonlinear optical behaviors. These properties make GaSe an appealing candidate for the fabrication of field-effect transistors, photodetectors, and photovoltaics. However, the wafer-scale production of pure GaSe single crystal thin films remains challenging. This study develops an approach for the direct growth of nanometer-thick GaSe films on GaAs substrates using molecular beam epitaxy. It yields smooth thin GaSe films with the rare {\gamma}'-polymorph. We analyze the formation mechanism of {\gamma}'-GaSe using density functional theory and speculate that it is stabilized by Ga vacancies since the formation enthalpy of {\gamma}'-GaSe tends to become lower than that of other polymorphs when the Ga vacancy concentration increases. Finally, we investigate the growth conditions of GaSe, providing valuable insights for exploring 2D/3D quasi-van der Waals epitaxial growth.

cond-mat.mtrl-sci↗

arXiv2024

Review of Nanolayered Post-transition Metal Monochalcogenides: Synthesis, Properties, and Applications

Nanolayered post-transition metal monochalcogenides (PTMMCs) stand out as promising advanced two-dimensional (2D) materials. Beyond inheriting the general advantages associated with traditional 2D materials, they exhibit unique properties, including a wide bandgap range covering the ultraviolet to the mid-infrared spectral ranges, thickness-dependent bandgap behaviors, good nonlinear optical performance, high thermoelectric coefficients, and ferroelectricity. Consequently, these materials hold significant potential in diverse applications such as photodetectors, field effect transistors, thermoelectrics, ferroelectrics, photovoltaics, and electrochemical devices, especially in the manufacturing of nanoscale devices. However, there is still a lack of systematic understanding of the PTMMC family. This study provides a broad overview of the crystal structures, bandgap structures, synthesis methods, physical properties, and state-of-the-art applications of PTMMC materials with a motif of X-M-M-X (M=Ga, In, Ge, Sn; X=S, Se, Te). An outlook for the development trends is emphasized at the end, underscoring the critical importance of this work to the future exploration of nanolayered PTMMCs.

cond-mat.mtrl-sci↗

arXiv2020

Changes of Magnetism in a Magnetic Insulator due to Proximity to a Topological Insulator

This letter reports the modification of magnetism in a magnetic insulator Y3Fe5O12 thin film by topological surface states (TSS) in an adjacent topological insulator Bi2Se3 thin film. Ferromagnetic resonance measurements show that the TSS in Bi2Se3 produces a perpendicular magnetic anisotropy, results in a decrease in the gyromagnetic ratio, and enhances the damping in Y3Fe5O12. Such TSS-induced changes become more pronounced as the temperature decreases from 300 K to 50 K. These results suggest a completely new approach for control of magnetism in magnetic thin films.

physics.app-ph↗

arXiv2016

Diffraction at GaAs/Fe$_{3}$Si core/shell nanowires: the formation of nanofacets

GaAs/Fe$_{3}$Si core/shell nanowire structures were fabricated by molecular-beam epitaxy on oxidized Si(111) substrates and investigated by synchrotron x-ray diffraction. The surfaces of the Fe$_3$Si shells exhibit nanofacets. These facets consist of well pronounced Fe$_3$Si{111} planes. Density functional theory reveals that the Si-terminated Fe$_3$Si{111} surface has the lowest energy in agreement with the experimental findings. We can analyze the x-ray diffuse scattering and diffraction of the ensemble of nanowires avoiding the signal of the substrate and poly-crystalline films located between the wires. Fe$_3$Si nanofacets cause streaks in the x-ray reciprocal space map rotated by an azimuthal angle of 30° compared with those of bare GaAs nanowires. In the corresponding TEM micrograph the facets are revealed only if the incident electron beam is oriented along [1$\overline{1}$0] in accordance with the x-ray results. Additional maxima in the x-ray scans indicate the onset of chemical reactions between Fe$_{3}$Si shells and GaAs cores occurring at increased growth temperatures.

cond-mat.mtrl-sci↗

arXiv2015

Facetted growth of Fe3Si shells around GaAs nanowires on Si(111)

GaAs nanowires and GaAs/Fe3Si core/shell nanowire structures were grown by molecular-beam epitaxy on oxidized Si(111) substrates and characterized by transmission electron microscopy. The surfaces of the original GaAs NWs are completely covered by magnetic Fe3Si exhibiting nanofacets and an enhanced surface roughness compared to the bare GaAs NWs. Shell growth at a substrate temperature of T{S} = 200 °C leads to regular nanofacetted Fe3Si shells. These facets, which lead to thickness inhomogeneities of the shells, consist mainly of well pronounced Fe3Si(111) planes. The crystallographic orientation of core and shell coincide, i.e. they are pseudomorphic. The nanofacetted Fe3Si shells found in the present work are probably the result of the Vollmer-Weber island growth mode of Fe3Si on the {110} side facets of the GaAs NWs.

cond-mat.mtrl-sci↗

arXiv2014

Real structure of lattice matched GaAs-Fe3Si core-shell nanowires

GaAs nanowires and GaAs-Fe3Si core-shell nanowire structures were grown by molecular-beam epitaxy on oxidized Si(111) substrates and characterized by transmission electron microscopy (TEM) and X-ray diffraction (XRD). Ga droplets were formed on the oxide surface, and the semiconducting GaAs nanowires grew epitaxially via the vapor-liquid-solid mechanism as single-crystals from holes in the oxide film. We observed two stages of growth of the GaAs nanowires, first the regular growth and second the residual growth after the Ga supply was finished. The magnetic Fe3Si shells were deposited in an As-free chamber. They completely cover the GaAs cores although they consist of small grains. High-resolution TEM micrographs depict the differently oriented grains in the Fe3Si shells. Selected area diffraction of electrons and XRD gave further evidence that the shells are textured and not single crystals. Facetting of the shells was observed, which lead to thickness inhomogeneities of the shells.

cond-mat.mtrl-sci↗