arXiv subjects

Marina Baryshnikova

Publications and source records attributed to Marina Baryshnikova.

4 recordsLinked to original sources

arXiv2026

Stoichiometric Epitaxial Strontium Titanate Thin Films on Silicon by High-Temperature Sr Segregation

Thin-film strontium titanate (SrTiO$_3$, STO) layers grown on silicon require accurate stoichiometry and single-crystalline order to exploit their functional properties optimally. Oxide molecular beam epitaxy can provide an epitaxial interface, but suffers from source oxidation and resulting flux instabilities, yielding only a narrow growth process window for cationic stoichiometry control. Here, we investigate post-growth annealing in oxygen as a pathway to drive the STO layer toward stoichiometry in intentionally Sr-rich epitaxial STO films on silicon (001). Annealing over a broad temperature range revealed two distinct Sr-segregation mechanisms. Below 800 °C, excess Sr segregates toward the surface, forming SrO outgrowths that progressively sublimate at elevated temperatures. Above 800 °C, a second mechanism dominates: Sr accumulates within the interfacial SiO$_2$ layer formed by oxygen diffusion at the STO/Si interface. Together, these mechanisms effectively remove excess Sr from the STO lattice, yielding a more stoichiometric perovskite layer. Our results demonstrate that growing slightly Sr-rich STO templates followed by controlled annealing provides a practical route to improve crystalline quality, offering a scalable strategy for high-quality STO integration on silicon.

cond-mat.mtrl-sci↗

arXiv2025

Stoichiometry and Thickness of Epitaxial SrTiO$_{3}$ on Silicon (001): an Investigation of Physical, Optical and Electrical Properties

Strontium titanate (SrTiO$_{3}$, STO) stands out as a promising material for various electronic applications thanks to its exceptional dielectric properties. Molecular beam epitaxy is one of the few techniques which allows epitaxial growth of STO directly on industry-relevant silicon substrates. However, maintaining precise stoichiometry and high crystalline quality in this process remains a significant challenge. Establishing this is essential to obtain STO with bulk-like dielectric properties and to minimize leakage current and optical absorbance. In this study, the importance of cationic stoichiometry and the effect of thickness are investigated for STO thin films epitaxially grown on silicon. We employed real-time reflection high-energy electron diffraction (RHEED) as a feedback loop mechanism to counteract Sr source oxidation and maintain a constant flux. Additionally, high-temperature post-growth annealing treatments in O$_{2}$ were investigated to promote layer relaxation and reduce oxygen vacancy concentration, thereby improving the physical, electrical, and optical properties of stoichiometric STO. As a result, high-quality STO thin films exceeding 100 nm were successfully fabricated featuring a bulk-like out-of-plane lattice parameter and refractive index, as well as rocking curve full width at half maximum below 0.2°, smooth surface (R$_{q}$ < 0.2 nm) and a leakage current density below 1E-7 A/cm$^{2}$.

cond-mat.mtrl-sci↗

arXiv2025

Engineering high Pockels coefficients in thin-film strontium titanate for cryogenic quantum electro-optic applications

Materials which exhibit the Pockels effect are notable for their strong electro-optic interaction and rapid response times and are therefore used extensively in classical electro-optic components for data and telecommunication applications. Yet many materials optimized for room-temperature operation see their Pockels coefficients at cryogenic temperatures significantly reduced - a major hurdle for emerging quantum technologies which have even more rigorous demands than their classical counterpart. A noted example is $\mathrm{BaTiO_3}$, which features the strongest effective Pockels coefficient at room temperature, only to see it reduced to a third (i.e. $\mathrm{r_{eff}} \approx$ 170 pm/V) at a few Kelvin. Here, we show that this behaviour is not inherent and can even be reversed: Strontium titanate ($\mathrm{SrTiO_3}$), a material normally not featuring a Pockels coefficient, can be engineered to exhibit an $\mathrm{r_{eff}}$ of 345 pm/V at cryogenic temperatures - a record value in any thin-film electro-optic material. By adjusting the stoichiometry, we can increase the Curie temperature and realise a ferroelectric phase that yields a high Pockels coefficient, yet with limited optical losses - on the order of decibels per centimetre. Our findings position $\mathrm{SrTiO_3}$ as one of the most promising materials for cryogenic quantum photonics applications.

physics.optics↗

arXiv2023

GaAs nano-ridge laser diodes fully fabricated in a 300 mm CMOS pilot line

Silicon photonics is a rapidly developing technology that promises to revolutionize the way we communicate, compute, and sense the world. However, the lack of highly scalable, native CMOS-integrated light sources is one of the main factors hampering its widespread adoption. Despite significant progress in hybrid and heterogeneous integration of III-V light sources on silicon, monolithic integration by direct epitaxial growth of III-V materials remains the pinnacle in realizing cost-effective on-chip light sources. Here, we report the first electrically driven GaAs-based multi-quantum-well laser diodes fully fabricated on 300 mm Si wafers in a CMOS pilot manufacturing line. GaAs nano-ridge waveguides with embedded p-i-n diodes, InGaAs quantum wells and InGaP passivation layers are grown with high quality at wafer scale, leveraging selective-area epitaxy with aspect-ratio trapping. After III-V facet patterning and standard CMOS contact metallization, room-temperature continuous-wave lasing is demonstrated at wavelengths around 1020 nm in more than three hundred devices across a wafer, with threshold currents as low as 5 mA, output powers beyond 1 mW, laser linewidths down to 46 MHz, and laser operation up to 55 °C. These results illustrate the potential of the III-V/Si nano-ridge engineering concept for the monolithic integration of laser diodes in a Si photonics platform, enabling future cost-sensitive high-volume applications in optical sensing, interconnects and beyond.

physics.optics↗