Growth and characterization of GaN/Ga2O3 Nanowire Heterostructures for Ultraviolet Optoelectronics
Ultraviolet-range GaN/b-Ga2O3 heterostructures were fabricated and investigated in both planar and nanowire geometries using pulsed laser deposition and reactive magnetron sputtering from a liquid gallium target for b-Ga2O3 deposition, while both GaN nanowire arrays and planar p-type Mg-doped GaN layers were grown by metal-organic chemical vapor deposition. Precise control of film uniformity and thickness was achieved as confirmed by structural and morphology studies using X-ray diffraction, X-ray photoelectron spectroscopy, atomic force microscopy and scanning electron microscopy. Planar n-Ga2O3/p-GaN heterojunction diodes were electrically and photoelectronically characterized, exhibiting pronounced rectifying behavior, high forward current and a visible-blind ultraviolet photoresponse under zero external bias, demonstrating intrinsic self-powered operation. Furthermore, GaN/b-Ga2O3 core/shell nanowire heterostructures were developed and systematically studied with a focus on morphology control and process optimization. The influence of deposition parameters on shell thickness, uniformity, and tapering was investigated, enabling improved conformality of the b-Ga2O3 coating on the M-plane facets of GaN nanowires. The results highlight the viability of physical vapor deposition techniques for forming GaN/b-Ga2O3 heterostructures and establish a pathway toward nanowire-based ultraviolet optoelectronic devices.