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Maxim Knyazev

Publications and source records attributed to Maxim Knyazev.

2 recordsLinked to original sources

All-in-plane image sensors free from readout integrated circuits

High resolution image sensors require electrical access to each individual pixel for signal readout. Such access is especially challenging for ultra-miniaturized pixels, for heterogeneously integrated sensing and readout layers in long-wavelength detectors, and for novel light-sensing materials with unestablished integration to silicon chips. Here, we introduce and experimentally validate a novel imaging approach that does not require electrical connections to individual pixels. The sensor matrix involves photoresistive pixels connected neighbor-to-neighbor and packed into a rectangular lattice. The signal readout is based on electrical impedance tomography applied to the photoresistance: the photovoltage is measured at the matrix boundary at various positions of injected bias current, and the image is reconstructed algorithmically. We present experimental validations for moderate-size infrared imagers based on multilayer graphene (24 pixels) and amorphous vanadium oxide (264 pixels). The reconstruction procedure is mathematically stable, sustainable to variations of pixel resistivity and photosensitivity, and its complexity is that of linear system solution. The proposed method enables unprecedented architecture simplification of imaging devices.

cond-mat.mes-hall

Electron-beam assisted selective growth of graphenic carbon thin films on SiO2/Si and quartz substrates

The first selective growth of graphenic carbon thin films on silicon dioxide is reported. A preliminary e-beam exposure of the substrate is found to strongly affect the process of such films growth. The emphasis is placed on the influence of substrate exposure on the rate of carbon deposition. The explanation of this effect is proposed. The data of electrical and optical measurements and the results of atomic force and scanning electron microscopy and Raman spectroscopy studies are reported. The results suggest that the selective growth of graphenic carbon thin films on an irradiated SiO2/Si substrate is a promising approach to producing a microstructure at the pre-synthesis step without full lithography process.

cond-mat.mtrl-sci