arXiv subjects

Michael Pellin

Publications and source records attributed to Michael Pellin.

2 recordsLinked to original sources

arXiv2015

Analysis of Nb3Sn surface layers for superconducting RF cavity applications

We present an analysis of the Nb3Sn surface layers grown on a bulk niobium (Nb) coupon prepared at the same time and by the same vapor diffusion process used to make Nb3Sn coatings on 1.3 GHz cavities. Tunneling spectroscopy reveals a well-developed, homogeneous superconducting density of states at the surface with a gap value distribution centered around 2.7 meV and superconducting critical temperature (Tc) up to 16.3 K. Scanning Electron microscopy (STEM) performed on cross section of the sample's surface region shows a 2 microns thick Nb3Sn surface layer. The elemental composition map exhibits a Nb over Sn ratio of 3 and reveals the presence of buried sub-stoichiometric regions that have a ratio f 5. Synchrotron x-ray diffraction experiments indicate a polycrystalline Nb3Sn film and confirm the presence of Nb rich regions that occupy about a third of the coating volume. These low Tc regions could play an important role in the dissipation mechanism occurring during RF tests of Nb3Sn-coated cavities and open the way for further improving a very promising alternative to pure Nb cavities for particle accelerators.

cond-mat.supr-con↗

arXiv2011

Atomic layer deposition and superconducting properties of NbSi films

Atomic layer deposition was used to synthesize niobium silicide (NbSi) films with a 1:1 stoichiometry, using NbF5 and Si2H6 as precursors. The growth mechanism at 200oC was examined by in-situ quartz crystal microbalance (QCM) and quadrupole mass spectrometer (QMS). This study revealed a self-limiting reaction with a growth rate of 4.5 Å/cycle. NbSi was found to grow only on oxide-free films prepared using halogenated precursors. The electronic properties, growth rate, chemical composition, and structure of the films were studied over the deposition temperature range 150-400oC. For all temperatures, the films are found to be stoichiometric NbSi (1:1) with no detectable fluorine impurities, amorphous with a density of 6.65g/cm3, and metallic with a resistivity ρ=150 μΩ.cm at 300K for films thicker than 35 nm. The growth rate was nearly constant for deposition temperatures between 150-275oC, but increases above 300oC suggesting the onset of non-self limiting growth. The electronic properties of the films were measured down to 1.2K and revealed a superconducting transition at Tc=3.1K. To our knowledge, a superconducting niobium silicide film with a 1:1 stoichiometry has never been grown before by any technique.

cond-mat.mtrl-sci↗