arXiv subjects

Miika Soikkeli

Publications and source records attributed to Miika Soikkeli.

4 recordsLinked to original sources

arXiv2026

Graphene FET Process and Analysis Optimization in 200 mm Pilot Line Environment

The maturity of the chemical vapor deposition graphene-based device processing has increased from chip level demonstrations to wafer-scale fabrication in the past few years. Due to this wafer-scale, electrical characterization and analysis of the fabricated devices has become increasingly important to enable extraction of multiple parameters with minimal number of measurements for the quality control purposes critical for industrial uptake of 2D materials-based devices. As a crucial step, we demonstrate optimization of complementary metal-oxide semiconductor (CMOS) back-end-of-line (BEOL) compatible graphene field-effect transistor (GFET) fabrication and analysis including the gate stack, bottom contact, graphene patterning and encapsulation process steps. The analysis methods include atomic force microscopy, scanning electron microscopy and most importantly electrical characterization. The electrical characterization focuses on comparing different test structures and extraction methods for mobility, contact resistance, IV-curve hysteresis and doping parameters. The comparison shows that the selected measurement test structures and analysis methods can have a large impact on the extracted values and should thus be considered when comparing data sets between different sources. The analysis shows that the optimized process offers high device yield of 98 % with good doping uniformity, contact resistance and mobility as well as low IV-curve hysteresis values on 200 mm wafers.

cond-mat.mes-hall↗

arXiv2024

Piezoresistive PtSe$_2$ pressure sensors with reliable high sensitivity and their integration into CMOS ASIC substrates

Membrane-based sensors are an important market for microelectromechanical systems (MEMS). Two-dimensional (2D) materials, with their low mass, are excellent candidates for suspended membranes to provide high sensitivity, small footprint sensors. The present work demonstrates pressure sensors employing large-scale-synthesized 2D platinum diselenide (PtSe${_2}$) films as piezoresistive membranes supported only by a thin polymer layer. We investigate three different synthesis methods with contrasting growth parameters and establish a reliable high yield fabrication process for suspended PtSe${_2}$/PMMA membranes across sealed cavities. The pressure sensors reproducibly display sensitivities above 6 x 10${^4}$ kPa${^{-1}}$. We show that the sensitivity clearly depends on the membrane diameter and the piezoresistive gauge factor of the PtSe${_2}$ film. Reducing the total device size by decreasing the number of membranes within a device leads to a significant increase in the area-normalized sensitivity. This allows the manufacturing of pressure sensors with high sensitivity but a much smaller device footprint than the current state-of-the-art MEMS technology. We further integrate PtSe${_2}$ pressure sensors with CMOS technology, improving the technological readiness of PtSe${_2}$-based MEMS and NEMS devices.

physics.app-ph↗

arXiv2023

Wafer-scale graphene field-effect transistor biosensor arrays with monolithic CMOS readout

The reliability of analysis is becoming increasingly important as point-of-care diagnostics are transitioning from single analyte detection towards multiplexed multianalyte detection. Multianalyte detection benefits greatly from complementary metal-oxide semiconductor (CMOS) integrated sensing solutions, offering miniaturized multiplexed sensing arrays with integrated readout electronics and extremely large sensor counts. The development of CMOS back end of line integration compatible graphene field-effect transistor (GFET) based biosensing has been rapid during the last few years, both in terms of the fabrication scale-up and functionalization towards biorecognition from real sample matrices. The next steps in industrialization relate to improving reliability and require increased statistics. Regarding functionalization towards truly quantitative sensors and on-chip bioassays with improved statistics require sensor arrays with reduced variability in functionalization. Such multiplexed bioassays, whether based on graphene or on other sensitive nanomaterials, are among the most promising technologies for label-free electrical biosensing. As an important step towards that, we report wafer-scale fabrication of CMOS integrated GFET arrays with high yield and uniformity, designed especially for biosensing applications. We demonstrate the operation of the sensing platform array with 512 GFETs in simultaneous detection for sodium chloride concentration series. This platform offers a truly statistical approach on GFET based biosensing and further to quantitative and multi-analyte sensing. The reported techniques can also be applied to other fields relying on functionalized GFETs, such as gas or chemical sensing or infrared imaging.

cond-mat.mes-hall↗

arXiv2022

Geometrical magnetoresistance effect and mobility in graphene field-effect transistors

Further development of the graphene field-effect transistors (GFETs) for high-frequency electronics requires accurate evaluation and study of the mobility of charge carriers in a specific device. Here, we demonstrate that the mobility in the GFETs can be directly characterized and studied using the geometrical magnetoresistance (gMR) effect. The method is free from the limitations of other approaches since it does not require an assumption of the constant mobility and the knowledge of the gate capacitance. Studies of a few sets of GFETs in the wide range of transverse magnetic fields indicate that the gMR effect dominates up to approximately 0.55 T. In higher fields, the physical magnetoresistance effect starts to contribute. The advantages of the gMR approach allowed us to interpret the measured dependencies of mobility on the gate voltage, i.e., carrier concentration, and identify the corresponding scattering mechanisms. In particular, the range of the fairly constant mobility is associated with the dominating Coulomb scattering. The decrease in mobility at higher carrier concentrations is associated with the contribution of the phonon scattering. Analysis shows that the gMR mobility is typically 2-3 times higher than that found via the commonly used drain resistance model. The latter underestimates the mobility since it does not take the interfacial capacitance into account.

cond-mat.mes-hall↗