arXiv subjects

Minseok Moon

Publications and source records attributed to Minseok Moon.

3 recordsLinked to original sources

arXiv2026

Atomic-Scale Mechanisms of SiO$_2$ Plasma-Enhanced Chemical Vapor Deposition Revealed by Molecular Dynamics with a Machine-Learning Interatomic Potential

Plasma-enhanced chemical vapor deposition (PECVD) of silicon dioxide (SiO$_2$) is widely used for low-temperature fabrication of dielectric thin films, yet its atomic-scale growth mechanisms remain incompletely understood. In this work, we investigate SiO$_2$ PECVD using silane and N$_2$O as source gases via molecular dynamics simulations driven by a machine-learning interatomic potential. By systematically varying the oxidant-to-silane-derived species ratio $r$, we elucidate the evolution of film stoichiometry, density, and hydrogen content. Formation of the Si-O-Si network primarily proceeds via oxidation of surface Si-H groups to form Si-OH species, followed by condensation of neighboring Si-OH groups that produces H$_2$O as the dominant byproduct. At low $r$, H$_2$ formation via reactions between Si-H and Si-OH groups also contributes to the network formation. Increasing oxidant supply promotes the network formation through oxidation of residual Si-H species, suppressing hydrogen incorporation and leading to saturation of the Si/O ratio. Rapid chemisorption of silane-derived species, together with steric hindrance from pre-deposited species, results in localized growth and surface roughness. We further show that high-kinetic-energy plasma species can etch SiO$_2$ films, which potentially limits growth rates and enhances surface roughness under high RF-power conditions. These results provide atomic-scale insight into PECVD growth and guidance for optimizing film composition and quality.

cond-mat.mtrl-sci↗

arXiv2025

Atomistic insights into hydrogen migration in IGZO from machine-learning interatomic potential: linking atomic diffusion to device performance

Understanding hydrogen diffusion is critical for improving the reliability and performance of oxide thin-film transistors (TFTs), where hydrogen plays a key role in carrier modulation and bias instability. In this work, we investigate hydrogen diffusion in amorphous IGZO ($a$-IGZO) and $c$-axis aligned crystalline IGZO (CAAC-IGZO) using machine learning interatomic potential molecular dynamics (MLIP-MD) simulations. We construct accurate phase-specific MLIPs by fine-tuning SevenNet-0, a universal pretrained MLIP, and validate the models against a comprehensive dataset covering hydrogen-related configurations and diffusion environments. Hydrogen diffusivity is evaluated over 650--1700 K, revealing enhanced mobility above 750 K in $a$-IGZO due to the glassy matrix, while diffusion at lower temperatures is constrained by the rigid network. Arrhenius extrapolation of the diffusivity indicates that hydrogen in $a$-IGZO can reach the channel/insulator interface within $10^{4}$ seconds at 300--400 K, likely contributing to negative bias stress-induced device degradation. Trajectory analysis reveals that long-range diffusion in $a$-IGZO is enabled by a combination of hydrogen hopping and flipping mechanisms. In CAAC-IGZO, hydrogen exhibits high in-plane diffusivity but severely restricted out-of-plane transport due to a high energy barrier along the $c$-axis. This limited vertical diffusion in CAAC-IGZO suggests minimal impact on bias instability. This work bridges the atomic-level hydrogen transport mechanism and device-level performance in oxide TFTs by leveraging large-scale MLIP-MD simulations.

cond-mat.mtrl-sci↗

arXiv2025

Unveiling defect motifs in amorphous GeSe using machine learning interatomic potentials

Ovonic threshold switching (OTS) selectors play a critical role in non-volatile memory devices because of their nonlinear electrical behavior and polarity-dependent threshold voltages. However, the atomic-scale origins of the defect states responsible for these properties are not yet fully understood. In this study, we use molecular dynamics simulations accelerated by machine-learning interatomic potentials to investigate defects in amorphous GeSe. We begin by benchmarking several potential architectures-including descriptor-based models and graph neural network (GNN) models-and show that faithfully representing amorphous GeSe requires capturing higher-order interactions (at least four-body correlations) and medium-range structural order. We find that GNN architectures with multiple interaction layers successfully capture these correlations and structural motifs, preventing the spurious defects that less expressive models introduce. With our optimized GNN potential, we examine twenty independent 960-atom amorphous GeSe structures and identify two distinct defect motifs: aligned Ge chains, which give rise to defect states near the conduction band, and overcoordinated Ge chains, which produce defect states near the valence band. We further correlate these electronic defect levels with specific structural features-namely, the average alignment of bond angles in the aligned chains and the degree of local Peierls distortion around overcoordinated Ge atoms. These findings provide a theoretical framework for interpreting experimental observations and deepen our understanding of defect-driven OTS phenomena in amorphous GeSe.

cond-mat.mtrl-sci↗