Naoto Horiguchi | Searcharxiv

arXiv2026

Wafer-Level 1/f Noise Characterization of Scaled P-Type Nanosheets and Comparison with Planar HKMG Transistors

We present a comprehensive wafer-level 1/f noise study of scaled Gate-All-Around (GAA) p-type nanosheet transistors and benchmark them against large-area planar High- \k{appa} Metal Gate (HKMG) devices to assess the impact of device architecture on reliability. By statistically analyzing noise data from 188 nanosheets, we extract the effective trap density in the dielectric and compare it to that of planar transistors with identical gate stack, comparable processing thermal budgets, and no specific reliability anneals. The effective trap density extracted from 1/f noise is comparable in planar and nanosheet architectures. This indicates that transitioning to GAA nanosheets does not increase noise, which remains governed by gate stack quality.

cond-mat.mes-hall↗

arXiv2024

Non-Destructive, High-Resolution, Chemically Specific, 3D Nanostructure Characterization using Phase-Sensitive EUV Imaging Reflectometry

Next-generation nano and quantum devices have increasingly complex 3D structure. As the dimensions of these devices shrink to the nanoscale, their performance is often governed by interface quality or precise chemical or dopant composition. Here we present the first phase-sensitive extreme ultraviolet imaging reflectometer. It combines the excellent phase stability of coherent high-harmonic sources, the unique chemical- and phase-sensitivity of extreme ultraviolet reflectometry, and state-of-the-art ptychography imaging algorithms. This tabletop microscope can non-destructively probe surface topography, layer thicknesses, and interface quality, as well as dopant concentrations and profiles. High-fidelity imaging was achieved by implementing variable-angle ptychographic imaging, by using total variation regularization to mitigate noise and artifacts in the reconstructed image, and by using a high-brightness, high-harmonic source with excellent intensity and wavefront stability. We validate our measurements through multiscale, multimodal imaging to show that this technique has unique advantages compared with other techniques based on electron and scanning-probe microscopies.

physics.optics↗