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Nema Abdelazim

Publications and source records attributed to Nema Abdelazim.

3 recordsLinked to original sources

Lateral electrodeposition of MoS2 semiconductor over an insulator

Developing novel techniques for depositing transition metal dichalcogenides is crucial for the industrial adoption of 2D materials in optoelectronics. In this work, the lateral growth of molybdenum disulfide (MoS2) over an insulating surface is demonstrated using electrochemical deposition. By fabricating a new type of microelectrodes, MoS2 2D films grown from TiN electrodes across opposite sides have been connected over an insulating substrate, hence, forming a lateral device structure through only one lithography and deposition step. Using a variety of characterization techniques, the growth rate of MoS2 has been shown to be highly anisotropic with lateral to vertical growth ratios exceeding 20-fold. Electronic and photo-response measurements on the device structures demonstrate that the electrodeposited MoS2 layers behave like semiconductors, confirming their potential for photodetection applications. This lateral growth technique paves the way towards room temperature, scalable and site-selective production of various transition metal dichalcogenides and their lateral heterostructures for 2D materials-based fabricated devices.

physics.app-ph↗

Phase Change Memory by GeSbTe Electrodeposition in Crossbar Arrays

Phase change memories (PCM) is an emerging type of non-volatile memory that has shown a strong presence in the data-storage market. This technology has recently attracted significant research interest in the development of non-Von Neumann computing architectures such as in-memory and neuromorphic computing. Research in these areas has been primarily motivated by the scalability potential of phase change materials and their compatibility with industrial nanofabrication processes. In this work, we are presenting our development of crossbar phase change memory arrays through the electrodeposition of GeSbTe (GST). We show that GST can be electrodeposited in microfabricated TiN crossbar arrays using a scalable process. Our phase switching test of the electrodeposited materials have shown that a SET/RESET resistance ratio of 2-3 orders of magnitude is achievable with a switching endurance of around 80 cycles. These results represent the first phase switching of electrodeposited GeSbTe in microfabricated crossbar arrays. Our work paves the way towards developing large memory arrays involving electrodeposited materials for passive selectors and phase switching devices. It also opens opportunities for developing a variety of different electronic devices using electrodeposited materials.

cond-mat.mtrl-sci↗

Large-Area Electrodeposition of Few-Layer MoS2 on Graphene for 2D Material Heterostructures

Heterostructures involving two-dimensional (2D) transition metal dichalcogenides and other materials such as graphene have a strong potential to be the fundamental building block of many electronic and opto-electronic applications. The integration and scalable fabrication of such heterostructures is of essence in unleashing the potential of these materials in new technologies. For the first time, we demonstrate the growth of few-layer MoS2 films on graphene via non-aqueous electrodeposition. Through methods such as scanning and transmission electron microscopy, atomic force microscopy, Raman spectroscopy, energy and wavelength dispersive X-ray spectroscopies and X-ray photoelectron spectroscopy, we show that this deposition method can produce large-area MoS2 films with high quality and uniformity over graphene. We reveal the potential of these heterostructures by measuring the photo-induced current through the film. These results pave the way towards developing the electrodeposition method for the large-scale growth of heterostructures consisting of varying 2D materials for many applications.

physics.app-ph↗