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Nian-Ke Chen

Publications and source records attributed to Nian-Ke Chen.

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Unconventional crystallization pathway bypassing the intermediate cubic phase in phase-change superlattices

The Ge-Sb-Te (GST) superlattice phase-change material is a promising candidate for overcoming the high power-consumption of phase-change memory (PCM). However, the working mechanism of the superlattice PCM remains controversial. Partial amorphization, which is currently considered the most plausible mechanism, remains hotly debated: how does the partially amorphized GST recrystallize into its superlattice phase instead of the conventionally expected cubic phase? Here, we address this issue using large-scale molecular dynamics simulations enabled by a machine-learning interatomic potential. Starting from a partially melted GST superlattice, we demonstrate that the residual crystalline regions serve as nuclei, enabling the amorphous GST to recrystallize directly into the superlattice phase without passing through the intermediate cubic phase. Moreover, the recrystallized phase is not an ideal superlattice, but rather a structurally ordered and chemically disordered defective superlattice characterized by anti-site defects and stacking faults. The defective superlattice region is also more susceptible to melting than the defect-free superlattice, and thereby can act as the active region of the PCM device. These results help to clarify the longstanding debates concerning the mechanism of superlattice-based PCM.

cond-mat.mtrl-sci

Inert gas as electronic impurity in semiconductors: The case for active infrared absorption in silicon

Inert (noble gas) elements are extremely inactive to surrounding chemical environment and are frequently employed as protective gas in various semiconductor fabrication processes. In this work, we surprisingly discover that high doses of argon up to $10^{17}-10^{20} cm^{-3}$ can be measured in silicon exposed by laser pulses even after 1300 days. First-principles calculations and molecular dynamics identify a unique argon-locking-vacancy (ALV) defect atomic model in silicon. The ALV defect is dynamically robust in contrast to the frequently moving pure Si vacancy. While argon is chemically inert, it readily modulates defect states of the occupied vacancy via steric repulsion and rattling motions, leading to significant band splitting within bandgap and thus strong infrared absorptions. Moreover, the repulsion between substitutional argon and dangling bonds results in shallow donors which explains the confusion of enhanced n-type carriers in experiments. The work paves a way of using noble gas element to produce active infrared absorption source for the non-heteroepitaxy photonic detectors directly on silicon wafer at infrared communication wavelength.

cond-mat.mtrl-sci