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Nikhil V Medhekar

Publications and source records attributed to Nikhil V Medhekar.

2 recordsLinked to original sources

Sub-Thermionic Switching in a Negative-Capacitance Bandgap-Change Field-Effect Transistor

Overcoming the approximately 60~mV/dec Boltzmann limit of the subthreshold swing remains a central challenge for low-power nanoelectronics. Negative-capacitance field-effect transistors address it by amplifying the channel potential, but their effectiveness is constrained by capacitance matching and by the quantum capacitance of conventional channels. Here we model a negative-capacitance bandgap-change field-effect transistor (NC-BCFET), in which the ferroelectric gate stack instead amplifies the electric field that opens the bandgap of the channel, using experimentally proven materials: bilayer graphene as a channel with an electrically tunable bandgap and Al$_{0.55}$Sc$_{0.45}$N as the negative-capacitance ferroelectric. Our self-consistent framework couples a four-band tight-binding Hamiltonian with GW-corrected screening, a quasistatic Landau--Devonshire ferroelectric response, and ballistic Landauer--Büttiker transport. Negative capacitance amplifies the interlayer potential difference, compressing the switching window 37-fold relative to a dielectric-gated control. At 300~K, the optimized NC-BCFET achieves a subthreshold swing of 15~mV/dec, four times below the Boltzmann limit, improving to 2.5~mV/dec at 100~K. The room-temperature on/off ratio is limited to $\sim 10^{2}$ by the bandgap of bilayer graphene. The concept extends directly to materials with larger field-tunable bandgaps, where deep subthermionic switching and high on/off ratios can be achieved together at room temperature.

cond-mat.mes-hall↗

Near-direct bandgap $WSe_2$/$ReS_2$ type-II pn heterojunction for enhanced ultrafast photodetection and high-performance photovoltaics

PN heterojunctions comprising layered van der Waals (vdW) semiconductors have been used to demonstrate current rectifiers, photodetectors, and photovoltaic devices. However, a direct or near-direct bandgap at the heterointerface that can significantly enhance optical generation, for high light absorbing few/multi-layer vdW materials, has not yet been shown. In this work, for the first time, few-layer group-6 transition metal dichalcogenide (TMD) $WSe_2$ is shown to form a sizeable (0.7 eV) near-direct bandgap with type-II band alignment at its interface with the group-7 TMD $ReS_2$ through density functional theory calculations. Further, the type-II alignment and photogeneration across the interlayer bandgap have been experimentally confirmed through micro-photoluminescence and IR photodetection measurements, respectively. High optical absorption in few-layer flakes, large conduction and valence band offsets for efficient electron-hole separation and stacking of light facing, direct bandgap $ReS_2$ on top of gate tunable $WSe_2$ are shown to result in excellent and tunable photodetection as well as photovoltaic performance through flake thickness dependent optoelectronic measurements. Few-layer flakes demonstrate ultrafast response time (5 $μ$s) at high responsivity (3 A/W) and large photocurrent generation and responsivity enhancement at the heterostructure overlap region (10-100X) for 532 nm laser illumination. Large open-circuit voltage of 0.64 V and short-circuit current of 2.6 $μ$A enables high output electrical power. Finally, long term air-stability and a facile single contact metal fabrication process makes the multi-functional few-layer $WSe_2$/$ReS_2$ heterostructure diode technologically promising for next-generation optoelectronic applications.

physics.app-ph↗