SearcharxivSearch

arXiv subjects

Oren Goldberg

Publications and source records attributed to Oren Goldberg.

2 recordsLinked to original sources

Transmission-Mode Silicon-Rich Nitride Mie-Void Metasurfaces in the Visible

Mie-void metasurfaces have so far been developed mainly in reflection, where subwavelength voids embedded in high-index media support localized resonances and spectrally selective optical responses. Yet, many optical systems could benefit from integrating such optical elements operating in transmission mode. Motivated by this great need, we hereby introduce Mie-void metasurfaces operating in transmission. To allow for their operation in the visible range, our Mie-voids are implemented using the silicon-rich nitride (SRN) platform. We show that this transition from reflection to transmission is not a simple change in geometry: placing the voids in a finite film on a substrate introduces slab-guided and Fabry-Perot-like contributions that hybridize with the underlying Mie-void response. Rigorous coupled-wave analysis shows that the dominant spectral transformation occurs when the semi-infinite host is replaced by a finite SRN film, while the substrate acts mainly as a secondary perturbation. Thickness-dependent dispersion maps reveal an avoided crossing between interacting modes, supporting the interpretation of a hybrid transmission regime and identifying film thickness as a clean parameter for tracking the evolution of the coupled modal structure. Experimentally, we realize transmission-mode structural colors by varying the void depth and observe good agreement between measured and simulated spectra and chromaticity coordinates. By spatially programming the void depth, we further demonstrate transmitted-light patterns and image encoding within a single metasurface architecture. These results establish transmission-mode Mie-void metasurfaces as a viable inverse-dielectric platform operating in transmission, with plethora of potential important applications such as transmissive spectral filtering, optical encoding, and display-oriented photonic elements, to name a few.

physics.optics

Single-Step Grayscale Lithography of Multi-Depth Mie Void Metasurfaces

The height of dielectric metasurfaces is largely considered a constant in the fabrication process due to the top-down fabrication approach, resulting in a binary structure. Yet, for the recently introduced Mie voids metasurfaces, controlling the thickness of the voids locally is crucial for achieving significant spectral tuning. In this work we demonstrate Mie voids metasurfaces with local precise depth control using electron beam grayscale lithography. We underexpose PMMA with varying doses, which in turn translates to multiple depth levels in the developed resist. Transferring the pattern to a silicon substrate we generate Mie voids, trapping the light in the void which generates colors in reflection. By controlling the depth of the void at the nanoscale, we tune the resonance over the whole visible range and with high precision, resulting in a large gamut of colors, which is demonstrated with spectral measurements, images of uniform patterns and spatially varying patterns showcasing different geometrical designs and a detailed artistic image. The demonstrated approach can be used for the implementation of various types of dielectric metasurfaces, providing an additional important degree of freedom for their realization, with potential applications in structured light and structural colors, imaging, robotics, polarization control, sensing, virtual reality and more.

physics.optics