Searcharxiv⌕ Search

arXiv subjects

Pablo Mota-Santiago

Publications and source records attributed to Pablo Mota-Santiago.

3 recordsLinked to original sources

Unraveling the Mechanisms of Ultrasound-Induced Mechanical Degradation of Microgels: Effects of Mechanoresponsive Crosslinks, Softness, and Core-Shell Architecture

Ultrasound-induced degradation of soft polymeric colloids, like microgels, as well as a controlled drug release enabled by mechanoresponsive bonds, has recently attracted considerable attention. However, most examples in the literature focus primarily on the applications rather than examining the underlying mechanisms of the structural changes occurring in microgels due to cavitation - changes that are crucial for developing effective drug delivery systems. In this work, we provide a comprehensive view on how microgel structure governs the susceptibility to rupture and mass loss upon cavitation, investigating both conventional microgels containing mechanoresponsive disulfide bonds and more complex asymmetrically crosslinked core-shell microgels. By combining dynamic and static light scattering, small-angle X-ray scattering, and atomic force microscopy, we demonstrate that an interplay between mechanoresponsive crosslinks and the swelling degree determines the microgels susceptibility to ultrasound-induced damage. Our findings indicate that local stress from cavitation bubbles varies strongly within the microgel dispersion. The majority of microgels undergo gradual erosion at their periphery, resulting in smaller yet structurally intact particles over time, observable by light scattering and AFM. In contrast, microgels closer to a cavitation bubble can experience partial rupture or completely disintegrate, producing smaller, more polydisperse fragments, which contributes substantially to the overall mass loss observed. In the core-shell microgels with different crosslinkers in the core and shell, degradation occurs nearly uniformly across both regions, instead of selectively targeting the weaker part. These observations highlight the complexity of the degradation dynamics as well as the similarity to processes seen in linear polymers and bulk hydrogels.

cond-mat.soft↗

Characterization of ion track etched conical nanopores in thermal and PECVD SiO$_{2}$ using small angle X-ray scattering

Conical nanopores in amorphous SiO$_{2}$ thin films fabricated using the ion track etching technique show promising potential for filtration, sensing and nanofluidic applications. The characterization of the pore morphology and size distribution, along with its dependence on the material properties and fabrication parameters, is crucial to designing nanopore systems for specific applications. Here, we present a comprehensive study of track-etched nanopores in thermal and plasma-enhanced chemical vapor deposited (PECVD) SiO$_{2}$ using synchrotron-based small-angle X-ray scattering (SAXS). We present a new approach for analyzing the complex highly anisotropic 2-dimensional SAXS patterns of the pores by reducing the analysis to two orthogonal 1-dimensional slices of the data. The simultaneous fit of the data enables an accurate determination of the pore geometry and size distribution. The analysis reveals substantial differences between the nanopores in thermal and PECVD SiO$_{2}$. The track-to-bulk etching rate ratio is significantly different for the two materials, producing nanopores with cone angles that differ by almost a factor of 2. Furthermore, thermal SiO$_2$ exhibits an exceptionally narrow size distribution of only ~2-4%, while PECVD SiO$_2$ shows a higher variation ranging from ~8-18%. The impact of ion energy between 89 MeV and 1.6 GeV on the size of the nanopores was also investigated for pores in PECVD SiO$_{2}$ and shows only negligible influence. These findings provide crucial insights for the controlled fabrication of conical nanopores in different materials, which is essential for optimizing membrane performance in applications that require precise pore geometry.

physics.app-ph↗

Annealing of swift heavy ion tracks in amorphous silicon dioxide

The annealing kinetics of the high energy ion damage in amorphous silicon dioxide (a-SiO2) are still not well understood, despite the material's widespread application in material science, physics, geology, and biology. This study investigates how annealing temperature, duration, and ambient environment affect the recovery of irradiation damage produced along the trajectory of swift heavy ions in a-SiO2. The track-annealing kinetics and the changing ion track morphology were investigated using synchrotron-based small-angle X-ray scattering (SAXS) and etching methods. We found that track annealing proceeds quicker near the sample surface demonstrated by a changing track etch rate as a function of depth. Measurements of ion tracks using SAXS show only small changes in the radial density distribution profile of the ion tracks. Activation energy of the annealing process at different sample depths was determined and the effect of the capping layer during the annealing process was also studied. Combination of oxygen diffusion and stress relaxation may contribute to the observed behaviour of preferential and anisotropic healing of the ion track. The results add to the fundamental understanding of ion track damage recovery and may have direct implications for materials for radioactive waste storage and solid state nanopores.

cond-mat.mtrl-sci↗