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Parthapratim Biswas

Publications and source records attributed to Parthapratim Biswas.

At least 19 recordsLinked to original sources

New insights into the origin of the first sharp diffraction peak in amorphous silica from an analysis of chemical and radial ordering

The structural origin of the first sharp diffraction peak (FSDP) in amorphous silica is studied by analyzing chemical and radial ordering of silicon (Si) and oxygen (O) atoms in binary amorphous networks. The study shows that the chemical order involving Si--O and O--O pairs play a major role in the formation of the FSDP in amorphous silica. This is supplemented by small contributions arising from the relatively weak Si--Si correlations in the Fourier space. A shell-by-shell analysis of the radial correlations between Si--Si, Si--O and O--O atoms in the network reveals that the position and the intensity of the FSDP are largely determined by atomic pair correlations originating from the first two/three radial shells on a length scale of about 5--8 Å, whereas the fine structure of the intensity curve in the vicinity of the FSDP is perturbatively modified by atomic correlations arising from the radial shells beyond 8 Å. The study leads to a simple mathematical relationship between the position of the radial peaks ($r_k$) in the partial pair-correlation functions and the diffraction peaks ($Q_k$) that can be used to obtain approximate positions of the FSDP and the principal peak. The results are complemented by numerical calculations and an accurate semi-analytical expression for the diffraction intensity obtained from the partial pair-correlation functions of amorphous silica for a given radial shell.

cond-mat.dis-nn

Ab initio study of the structure and properties of amorphous silicon hydride from accelerated molecular dynamics simulations

This paper presents a large-scale $ab$ $initio$ simulation study of amorphous silicon hydride ($a$-Si$_{\text{1-x}}$H$_{\text{x}}$) with an emphasis on the structure and properties of the material across a range of hydrogen concentration by combining accelerated molecular dynamics (MD) simulations with first-principles density-functional calculations. The accelerated MD scheme relied on classical metadynamics, which enabled the development of 2600+ high-quality structural models of $a$-Si$_{\text{1-x}}$H$_{\text{x}}$, with system sizes ranging from 150 to 6,000 atoms and hydrogen concentrations vary from 6 to 20 at. %H. The resulting amorphous networks were found to be completely free from any coordination defects and that they all exhibited a pristine band-gap in their electronic spectrum. The microstructural properties of hydrogen distributions were examined with great emphasis on the presence of isolated and clustered environments of hydrogen atoms. The results were compared with a suite of experimental data obtained from x-ray diffraction, infrared spectroscopy, spectroscopic ellipsometry and nuclear magnetic resonance studies.

cond-mat.mtrl-sci

Ab initio studies of the impact of the Debye-Waller factor on the structural and dynamical properties of amorphous semiconductors: The case of $a$-Si

This paper presents a first-principles study of the Debye-Waller factor and the Debye temperature for amorphous silicon ($a$-Si) from lattice-dynamical calculations and direct molecular-dynamics simulations using density-functional theory (DFT). The effects of temperature and structural disorder on the intensity of the diffraction maxima and the vibrational mean-square displacement (MSD) of Si atoms are studied in the harmonic approximation, with particular emphasis on the bond-length disorder, the presence of coordination defects, and microvoids in $a$-Si networks. It has been observed that the MSDs associated with tetrahedrally-bonded Si atoms are considerably lower than their dangling-bond counterparts -- originating from isolated and vacancy-induced clustered defects -- and those on the surface of microvoids, leading to an asymmetric non-gaussian tail in the distribution of atomic displacements. An examination of the effect of anharmonicity on the MSD at high temperatures using direct $ab$ $initio$ molecular-dynamics simulations (without the harmonic approximation) suggests that the vibrational motion in $a$-Si is practically unaffected by anharmonic effects at temperatures below 400 K, as far as the present DFT calculations are concerned. The Debye temperature of $a$-Si is found to be in the range of 488--541 K from specific-heat and MSD calculations using first-principles lattice-dynamical calculations in the harmonic approximation, which matches closely with the experimental value of 487--528 K obtained from specific-heat measurements of $a$-Si at low temperatures.

cond-mat.mtrl-sci

Extended-range order in tetrahedral amorphous semiconductors: The case of amorphous silicon

This paper reports the presence of extended-range ordering in the atomic pair-correlation function of amorphous silicon ($a$-Si) using ultra-large atomistic models obtained from Monte Carlo and molecular-dynamics simulations. The extended-range order manifests itself in the form of radial oscillations, on the length scale of 20-40 angstrom, which are examined by directly analyzing the radial distribution of atoms in distant coordination shells and comparing the same with those from a class of partially-ordered networks of Si atoms and disordered configurations of crystalline silicon from an information-theoretic point of view. The study suggests that the extended-range radial oscillations principally originate from the propagation of radial ordering from the first few atomic shells to a distance of up to 40 angstrom. The effect of these oscillations on the first sharp diffraction peak (FSDP) in the structure factor is addressed by obtaining a semi-analytical expression for the static structure factor of $a$-Si, and calculating an estimate of the error of the intensity of the FSDP associated with the truncation of radial information from distant shells. The results indicate that the extended-range oscillations do not have any noticeable effects on the position and intensity of the FSDP, which are primarily determined by the medium-range atomic correlations of up to a length of 20 angstrom in amorphous silicon.

cond-mat.dis-nn

On the origin and the structure of the first sharp diffraction peak of amorphous silicon

The structure of the first sharp diffraction peak (FSDP) of amorphous silicon (${\it a}$-Si) near 2 Angstrom$^{-1}$ is addressed with particular emphasis on the position, intensity, and width of the diffraction curve. By studying a number of continuous random network (CRN) models of ${\it a}$-Si, it is shown that the position and the intensity of the FSDP are primarily determined by radial atomic correlations in the amorphous network on the length scale of 15 Angstroms. A shell-by-shell analysis of the contribution from different radial shells reveals that the key contributions to the FSDP originate from the second and fourth radial shells in the network, which are accompanied by a background contribution from the first shell and small residual corrections from the distant radial shells. The results from numerical calculations are complemented by a phenomenological discussion of the relationship between the peaks in the structure factor in the wavevector space and the reduced pair-correlation function in the real space. An approximate functional relation between the position of the FSDP and the average second-neighbor distance of Si atoms in the amorphous network is derived, which is corroborated by numerical calculations.

cond-mat.dis-nn

$Ab$ $initio$ hydrogen dynamics and the morphology of voids in amorphous silicon

This paper presents an $ab$ $initio$ study of hydrogen dynamics inside nanometer-size voids in $a$-Si within the framework of the density-functional theory for a varying hydrogen load of 10 to 30 H atoms/void at the low and high temperature of 400 K and 700 K, respectively. Using the local density approximation and its generalized-gradient counterpart, the dynamics of hydrogen atoms inside the voids are examined with an emphasis on the diffusion of H atoms/molecules, and the resulting nanostructural changes of the void surfaces. The results from simulations suggest that the microstructure of the hydrogen distribution on the void surfaces and the morphology of the voids are characterized by the presence of a significant number of monohydride Si-H bonds, along with a few dihydride Si-H$_2$ configurations. The study also reveals that a considerable number of (about 10--45 at.%) total H atoms inside voids can appear as H$_2$ molecules for a hydrogen load of 10--30 H atoms/void. The approximate shape of the voids is addressed from a knowledge of the positions of the void-surface atoms using the convex-hull approximation and the Gaussian broadening of the pseudo-atomic surfaces of Si and H atoms.

cond-mat.mtrl-sci

Disorder by design: A data-driven approach to amorphous semiconductors without total-energy functionals

This paper addresses a difficult inverse problem that involves the reconstruction of a three-dimensional model of tetrahedral amorphous semiconductors via inversion of diffraction data. By posing the material-structure determination as a multi-objective optimization program, it has been shown that the problem can be solved accurately using a few structural constraints, but no total-energy functionals/forces, which describe the local chemistry of amorphous networks. The approach yields highly realistic models of amorphous silicon, with no or only a few coordination defects ($\le$ 1%), a narrow bond-angle distribution of width 9-11.5 degree, and an electronic gap of 0.8-1.4 eV. These data-driven information-based models have been found to produce electronic and vibrational properties of amorphous silicon that match accurately with experimental data and rival that of the Wooten-Winer-Weaire (W3) models. The study confirms the effectiveness of a multi-objective optimization approach to the structural determination of complex materials, and resolves a long-standing dispute concerning the uniqueness of a model of tetrahedral amorphous semiconductors obtained via inversion of diffraction data.

cond-mat.dis-nn

Temperature-induced nanostructural evolution of hydrogen-rich voids in amorphous silicon: A first-principles study

The paper presents an $ab$ $initio$ study of temperature-induced nanostructural evolution of hydrogen-rich voids in amorphous silicon. By using large $a$-Si models, obtained from classical molecular-dynamics simulations, with a realistic void-volume density of 0.2%, the dynamics of Si and H atoms on the surface of the nanometer-size cavities were studied and their effects on the shape and size of the voids were examined using first-principles density-functional simulations. The results from $ab$ $initio$ calculations were compared with those obtained from using the modified Stillinger-Weber potential. The temperature-induced nanostructural evolution of the voids was examined by analyzing the three-dimensional distribution of Si and H atoms on/near void surfaces using the convex-hull approximation, and computing the radius of gyration of the corresponding convex hulls. A comparison of the results with those from the simulated values of the intensity in small-angle X-ray scattering of $a$-Si/$a$-Si:H in the Guinier approximation is also provided, along with a discussion on the dynamics of bonded and non-bonded hydrogen in the vicinity of voids.

cond-mat.mtrl-sci

Atomistic simulation of nearly defect-free models of amorphous silicon: An information-based approach

We present an information-based total-energy optimization method to produce nearly defect-free structural models of amorphous silicon. Using geometrical, structural and topological information from disordered tetrahedral networks, we have shown that it is possible to generate structural configurations of amorphous silicon, which are superior than the models obtained from conventional reverse Monte Carlo and molecular-dynamics simulations. The new data-driven hybrid approach presented here is capable of producing atomistic models with structural and electronic properties which are on a par with those obtained from the modified Wooten-Winer-Weaire (WWW) models of amorphous silicon. Structural, electronic and thermodynamic properties of the hybrid models are compared with the best dynamical models obtained from using machine-intelligence-based potentials and efficient classical molecular-dynamics simulations, reported in the recent literature. We have shown that, together with the WWW models, our hybrid models represent one of the best structural models so far produced by total-energy-based Monte Carlo methods in conjunction with experimental diffraction data and a few structural constraints.

cond-mat.dis-nn

First principles modeling of the structural, electronic, and vibrational properties of Ni$_{40}$Pd$_{40}$P$_{20}$ bulk metallic glass

The structural, vibrational, and electronic properties of Ni$_{40}$Pd$_{40}$P$_{20}$ bulk metallic glass have been studied using ${\it ab\,initio}$ molecular-dynamics simulations and total-energy optimization. Structural analyses of the resulting ${\it ab\,initio}$ models show the presence of few to no P-P bonds and two main building blocks, consisting of tricapped trigonal prism (TTP) and capped square anti-prism (CSAP) with P as the center of these blocks. The computed Pd and Ni K-edge spectra of extended x-ray absorption fine structure (EXAFS) are found to be in good agreement with experimental data. The configurational-average static structure factor and the generalized vibrational density of states are also observed to be in good agreement with experimental data.

cond-mat.dis-nn

${\it Ab \: initio}$ density-functional studies of 13-atom Cu and Ag clusters

The putative ground-state structures of 13-atom Cu and Ag clusters have been studied using ${\it ab \: initio}$ molecular-dynamics (AIMD) simulations based on the density-functional theory (DFT). An ensemble of low-energy configurations, collected along the AIMD trajectory and optimized to nearest local minimum-energy configurations, were studied. An analysis of the results indicates the existence of low-symmetric bilayer structures as strong candidates for the putative ground-state structure of Cu$_{13}$ and Ag$_{13}$ clusters. These bilayer structures are markedly different from a buckled bi-planar (BBP) configuration and energetically favorable, by about 0.4$-$0.5 eV, than the latter proposed earlier by others. Our study reveals that the structure of the resulting putative global-minimum configuration is essentially independent of the nature of basis functions (i.e., plane waves versus pseudoatomic orbitals) employed in the calculations, for a given exchange-correlation functional. The structural configurations obtained from plane-wave-based DFT calculations show a slightly tighter or dense first-shell of Cu and Ag atoms than those from local-basis functions. A comparison of our results with recent full-potential DFT simulations is presented.

cond-mat.dis-nn

Effect of low-temperature annealing on the void-induced microstructure in amorphous silicon: A computational study

We present a computational study of the void-induced microstructure in amorphous silicon ($\it a$-Si) by generating ultra-large models of $\it a$-Si with a void-volume fraction of 0.3$\%$, as observed in small-angle x-ray scattering (SAXS) experiments. The relationship between the morphology of voids and the intensity of scattering in SAXS has been studied by computing the latter from the Fourier transform of the reduced pair-correlation function and the atomic-form factor of amorphous silicon. The effect of low-temperature ($\le$ 600 K) annealing on the scattering intensities and the microstructure of voids has been addressed, with particular emphasis on the shape and size of the voids, by studying atomic rearrangements on the void surfaces and computing the average radius of gyration of the voids from the spatial distribution of surface atoms and the intensity plots in the Guinier approximation. The study suggests that low-temperature annealing can lead to considerable restructuring of void surfaces, which is clearly visible from the three-dimensional shape of the voids but it may not necessarily reflect in one-dimensional scattering-intensity plots.

cond-mat.dis-nn

Small-angle X-ray scattering in amorphous silicon: A computational study

We present a computational study of small-angle X-ray scattering (SAXS) in amorphous silicon ($a$-Si) with particular emphasis on the morphology and microstructure of voids. The relationship between the scattering intensity in SAXS and the three-dimensional structure of nanoscale inhomogeneities or voids is addressed by generating ultra-large high-quality $a$-Si networks with 0.1-0.3% volume concentration of voids, as observed in experiments using SAXS and positron annihilation spectroscopy. A systematic study of the variation of the scattering intensity in the small-angle scattering region with the size, shape, number density, and the spatial distribution of the voids in the networks is presented. Our results suggest that the scattering intensity in the small-angle region is particularly sensitive to the size and the total volume-fraction of the voids, but the effect of the geometry or shape of the voids is less pronounced in the intensity profiles. A comparison of the average size of the voids obtained from the simulated values of the intensity, using the Guinier approximation and Kratky plots, with those from the spatial distribution of the atoms in the vicinity of void surfaces is presented.

cond-mat.dis-nn

Nearly defect-free dynamical models of disordered solids: The case of amorphous silicon

It is widely accepted in the materials modeling community that defect-free realistic networks of amorphous silicon cannot be prepared by quenching from a molten state of silicon using classical or ab initio molecular-dynamics (MD) simulations. In this work, we address this long-standing problem by producing nearly defect-free ultra-large models of amorphous silicon, consisting of up to half-a-million atoms, using classical molecular-dynamics simulations. The structural, topological, electronic, and vibrational properties of the models are presented and compared with experimental data. A comparison of the models with those obtained from using the modified Wooten-Winer-Weaire bond-switching algorithm shows that the models are on par with the latter, which were generated via event-based total-energy relaxations of atomistic networks in the configuration space. The MD models produced in this work represent the highest quality of amorphous-silicon networks so far reported in the literature using molecular-dynamics simulations.

cond-mat.dis-nn

Large and realistic models of Amorphous Silicon

Amorphous silicon (a-Si) models are analyzed for structural, electronic and vibrational characteristics. Several models of various sizes have been computationally fabricated for this analysis. It is shown that a recently developed structural modeling algorithm known as force-enhanced atomic refinement (FEAR) provides results in agreement with experimental neutron and x-ray diffraction data while producing a total energy below conventional schemes. We also show that a large model (500 atoms) and a complete basis is necessary to properly describe vibrational and thermal properties. We compute the density for a-Si, and compare with experimental results.

cond-mat.dis-nn

Structure of transition metal clusters: A force-biased Monte Carlo approach

We present a force-biased Monte Carlo (FMC) method for structural modeling of transition metal clusters of Fe, Ni, and Cu with 5 to 60 atoms. By employing the Finnis-Sinclair potential for Fe and the Sutton-Chen potential for Ni and Cu, the total energy of the clusters is minimized using a method that utilizes atomic forces in Monte Carlo simulations. The structural configurations of the clusters obtained from this biased Monte Carlo approach are analyzed and compared with the same from the Cambridge Cluster Database (CCD). The results show that the total-energy of the FMC clusters is very close to the corresponding value of the CCD clusters as listed in the Cambridge Cluster Database. A comparison of the FMC and CCD clusters is presented by computing the pair-correlation function, the bond-angle distribution, and the distribution of atomic-coordination numbers in the first-coordination shell, which provide information about the two-body and three-body correlation functions, the local atomic structure, and the bonding environment of the atoms in the clusters.

cond-mat.mtrl-sci

Realistic inversion of diffraction data for an amorphous solid: the case of amorphous silicon

We apply a new method "force enhanced atomic refinement" (FEAR) to create a computer model of amorphous silicon (a-Si), based upon the highly precise X-ray diffraction experiments of Laaziri et al. The logic underlying our calculation is to estimate the structure of a real sample a-Si using experimental data and chemical information included in a non-biased way, starting from random coordinates. The model is in close agreement with experiment and also sits at a suitable minimum energy according to density functional calculations. In agreement with experiments, we find a small concentration of coordination defects that we discuss, including their electronic consequences. The gap states in the FEAR model are delocalized compared to a continuous random network model. The method is more efficient and accurate, in the sense of fitting the diffraction data than conventional melt quench methods. We compute the vibrational density of states and the specific heat, and find that both compare favorably to experiments.

cond-mat.mtrl-sci

Inversion of diffraction data for amorphous materials

The general and practical inversion of diffraction data-producing a computer model correctly representing the material explored - is an important unsolved problem for disordered materials. Such modeling should proceed by using our full knowledge base, both from experiment and theory. In this paper, we describe a robust method to jointly exploit the power of ab initio atomistic simulation along with the information carried by diffraction data. The method is applied to two very different systems: amorphous silicon and two compositions of a solid electrolyte memory material silver-doped GeSe3 . The technique is easy to implement, is faster and yields results much improved over conventional simulation methods for the materials explored. By direct calculation, we show that the method works for both poor and excellent glass forming materials. It offers a means to add a priori information in first principles modeling of materials, and represents a significant step toward the computational design of non-crystalline materials using accurate interatomic interactions and experimental information.

cond-mat.mtrl-sci