Deterioration of water evaporation by impurity accumulation at the liquid-vapor interface during nucleate boiling
The interfacial resistance to evaporation, in particular for the case of water, is a longstanding issue. The previous data on its main characterizing parameter, the accommodation coefficient, manifest a dispersion over three orders of magnitude. We study the evaporation of a thin liquid layer (microlayer) under the growing single bubble in saturated pool boiling of ultra-pure water at atmospheric pressure. However, the water contamination during the experiment cannot be excluded. The local and instantaneous data on interfacial thermal resistance are recovered from the synchronous local measurements of the microlayer thickness and the heater temperature. At each particular interfacial point, the resistance shows a linear increase in time suggesting the effect of accumulation of impurities at the interface. We compute the water mass evaporated at a given point of microlayer that should be proportional to the interfacial concentration of accumulated impurities. A clear increase of the interfacial thermal resistance with the evaporated mass is observed. This demonstrates a link of the temporal increase of the interfacial resistance (i.e. the evaporation deterioration) with the accumulation of impurities at the interface, which can explain the dispersion of the published data on the accommodation coefficient.