SearcharxivSearch

arXiv subjects

Petr Bábor

Publications and source records attributed to Petr Bábor.

4 recordsLinked to original sources

Time-resolved study of carbonization and growth of ultrathin 3C-SiC on Si(111) under ultra-high vacuum

The early-stage formation of silicon carbide (SiC) on Si(111) by ethylene exposure under ultra-high vacuum (UHV) was investigated to resolve the time-dependent chemical and morphological evolution of an ultrathin layer. Clean Si(111) substrates were exposed to C$_2$H$_4$ at 800 °C for 2 min to 4 h, and the surfaces followed by in-situ X-ray photoelectron spectroscopy (XPS) and ex-situ AFM, SEM, AES, SIMS and TEM. Si 2p and C 1s peak analysis shows the progressive conversion of elemental silicon into a carbidic Si-C phase, the SiC fraction overtaking the elemental component between 120 and 160 min and saturating near 80-81% beyond 180 min, leaving about 19-20% residual elemental silicon. Correlative SEM and AFM reveal a parallel morphological progression, from sparse isolated islands to a coalesced, near-continuous layer. AES depth profiling confirms carbon incorporated into the near-surface region rather than weakly adsorbed as contamination, assigning the islands to early SiC nuclei. TEM confirms the zinc-blende lattice and the presence of cubic silicon carbide (3C-SiC). Together, these results provide a time-resolved picture of SiC nucleation, coalescence and layer growth on Si(111), relevant to 3C-SiC heteroepitaxy, and can be utilized in the optimization of SiC/Si(111) templates for growth of III-nitride and other carbide systems on silicon (e.g. Mo$_2$C).

cond-mat.mtrl-sci

Work-Function-Resolved Imaging of Relaxation Oscillations and Chemical Spillover in CO Oxidation over Platinum Surfaces

Chemical waves of CO oxidation on platinum surfaces exhibit complex spatio-temporal self-oscillations, yet the local electronic mechanisms driving their propagation remain poorly understood under operando conditions. In this work, we combine operando scanning electron microscopy with frequency-modulated Kelvin probe force microscopy (FM-KPFM) to simultaneously map secondary electron contrast and local work-function variations during CO oxidation on Pt. By utilizing the KPFM tip as a localized sensor, we provide the first work-function-resolved imaging of reaction fronts, enabling an unambiguous physical assignment of CO- and oxygen-covered states. Our results demonstrate that the spillover process of chemical wave-the transition and expansion of adsorbate phases-is characterized by a pronounced temporal asymmetry and spatial heterogeneity transition thresholds. KPFM identifies a rapid onset of oxygen coverage followed by a gradual, diffuse relaxation back to the CO-covered state, indicative of relaxation-type oscillations even at low pressures (10^-2 Pa). Correlative reaction-diffusion simulations reproduce this wave morphology, confirming that the high-resolution work-function signal provides unique insights into the internal structure and kinetic heterogeneity of the working catalyst surface.

cond-mat.mtrl-sci

Mass-transport-limited reaction rates and molecular diffusion in the van der Waals gap beneath graphene

The confinement of molecules within the van der Waals (vdW) gap between a two-dimensional 2D material and a catalytic substrate offers a promising route toward the development of molecule-selective catalysts with increased reaction rates. However, identifying the kinetic limitations of such confined reactions remains challenging. Here, we employ an inverted wedding-cake configuration of multilayer graphene on platinum to study the dynamics of graphene etching in the vdW gap by various molecules (O2, H2, and CO), using in situ scanning electron microscopy. Under the experimental conditions explored (up to p = 1.4x10-3 Pa and T = 1000 °C), the etching reaction rates are limited by mass transport within the confined space. This limitation persists even for CO, despite its anomalously enhanced transport resulting from a significant lifting of the vdW gap. Reactive molecular dynamics simulations further reveal multiple etching pathways for CO, enabled by confinement within the vdW space. Once mass-transport limitations are overcome, the vdW gap acts as an effective nanoreactor, facilitating reaction pathways that would be otherwise inaccessible on a pristine surface without spatial confinement.

cond-mat.mes-hall

Layer-by-layer growth of bilayer graphene single-crystals enabled by self-transmitting catalytic activity

Direct growth of large-area vertically stacked two-dimensional (2D) van der Waal (vdW) materials is a prerequisite for their high-end applications in integrated electronics, optoelectronics and photovoltaics. Currently, centimetre- to even metre-scale monolayers of single-crystal graphene (MLG) and hexagonal boron nitride (h-BN) have been achieved by epitaxial growth on various single-crystalline substrates. However, in principle, this success in monolayer epitaxy seems extremely difficult to be replicated to bi- or few-layer growth, as the full coverage of the first layer was believed to terminate the reactivity of those adopting catalytic metal surfaces. Here, we report an exceptional layer-by-layer chemical vapour deposition (CVD) growth of large size bi-layer graphene single-crystals, enabled by self-transmitting catalytic activity from platinum (Pt) surfaces to the outermost graphene layers. In-situ growth and real-time surveillance experiments, under well-controlled environments, unambiguously verify that the growth does follow the layer-by-layer mode on open surfaces of MLG/Pt(111). First-principles calculations indicate that the transmittal of catalytic activity is allowed by an appreciable electronic hybridisation between graphene overlayers and Pt surfaces, enabling catalytic dissociation of hydrocarbons and subsequently direct graphitisation of their radicals on the outermost sp2 carbon surface. This self-transmitting catalytic activity is also proven to be robust for tube-furnace CVD in fabricating single-crystalline graphene bi-, tri- and tetra-layers, as well as h-BN few-layers. Our findings offer an exceptional strategy for potential controllable, layer-by-layer and wafer-scale growth of vertically stacked few-layered 2D single crystals.

cond-mat.mtrl-sci