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Prasanna Venkat Ravindran

Publications and source records attributed to Prasanna Venkat Ravindran.

4 recordsLinked to original sources

Sub-nm2 ferroelectric domains via charged 180 degree walls in ZrO2

Flat phonon bands in fluorite ferroelectrics (HfO2 or ZrO2) shrink polar domains laterally to an irreducible half-unit-cell width (0.27 nm) within which the vertical arrangement of dipoles is expected to remain uniform. We report on the direct observation of nonuniform and nearly discrete vertical arrangements of dipoles in ZrO2 thin films consisting of closely spaced head-to-head (HH) and tail-to-tail (TT) charged 180 degree walls, each exhibiting a distinct bulk-like structure. These charged domain walls (CDWs) further compress the irreducibly narrow, laterally stacked domains vertically to a thickness of 1-2.75 nm, yielding in-plane domains with sub-nm2 footprints-among the smallest ever reported for any ferroelectric material. The HH and TT walls form due to their flat longitudinal optical (LO) polar bands and are electrostatically stabilized by bound-charge compensation via interstitial oxygen atoms, which act as natural structural defects at the HH walls. Moreover, these walls are predicted to be conducting and to exhibit ultralow propagation barriers, with HH walls (1.6 meV) being far more mobile than TT walls (22.3 meV), indicating strong potential for low-voltage, domain-wall-based nanoelectronics.

cond-mat.mtrl-sci↗

Vertical NAND in a Ferroelectric-driven Paradigm Shift

Over the past decades, the relentless scaling and mass production of flash memory have underpinned the data-centric era. Yet charge-trap-based 3D NAND flash is now constrained by intrinsic physical and architectural limits, including reliability degradation at the device level, high operating power at the array level, and vertical scaling saturation at the system level. These bottlenecks hinder further advances in storage density and energy efficiency required by memory-centric computing. This Perspective outlines how coupling ferroelectric polarization with charge trapping can reconfigure the foundations of flash memory. In these hybrid architectures, polarization offers an energy-efficient pathway for charge modulation through enhanced Fowler-Nordheim tunneling, while trapped charges reinforce polarization-driven states to ensure stability. Such synergistic dynamics enable low-voltage operation and integration beyond one thousand layers without compromising process compatibility. We discuss the material, device, and architectural transitions required to realize this hybrid technology and chart future research directions to overcome the remaining scaling bottlenecks. Hybrid ferroelectric NAND extends conventional flash toward a scalable and energy-efficient platform, marking a paradigm shift for next-generation non-volatile memory.

physics.app-ph↗

Kinetic control of ferroelectricity in ultrathin epitaxial Barium Titanate capacitors

Ferroelectricity is characterized by the presence of spontaneous and switchable macroscopic polarization. Scaling limits of ferroelectricity have been of both fundamental and technological importance, but the probes of ferroelectricity have often been indirect due to confounding factors such as leakage in the direct electrical measurements. Recent interest in low-voltage switching electronic devices squarely puts the focus on ultrathin limits of ferroelectricity in an electronic device form, specifically on the robustness of ferroelectric characteristics such as retention and endurance for practical applications. Here, we illustrate how manipulating the kinetic energy of the plasma plume during pulsed laser deposition can yield ultrathin ferroelectric capacitor heterostructures with high bulk and interface quality, significantly low leakage currents and a broad "growth window". These heterostructures venture into previously unexplored aspects of ferroelectric properties, showcasing ultralow switching voltages ($<$0.3 V), long retention times ($>$10$^{4}$s), and high endurance ($>$10$^{11}$cycles) in 20 nm films of the prototypical perovskite ferroelectric, BaTiO$_{3}$. Our work demonstrates that materials engineering can push the envelope of performance for ferroelectric materials and devices at the ultrathin limit and opens a direct, reliable and scalable pathway to practical applications of ferroelectrics in ultralow voltage switches for logic and memory technologies.

physics.app-ph↗

Antiferroelectric negative capacitance from a structural phase transition in zirconia

Crystalline materials with broken inversion symmetry can exhibit a spontaneous electric polarization, which originates from a microscopic electric dipole moment. Long-range polar or anti-polar order of such permanent dipoles gives rise to ferroelectricity or antiferroelectricity, respectively. However, the recently discovered antiferroelectrics of fluorite structure (HfO$_2$ and ZrO$_2$) are different: A non-polar phase transforms into a polar phase by spontaneous inversion symmetry breaking upon the application of an electric field. Here, we show that this structural transition in antiferroelectric ZrO$_2$ gives rise to a negative capacitance, which is promising for overcoming the fundamental limits of energy efficiency in electronics. Our findings provide insight into the thermodynamically 'forbidden' region of the antiferroelectric transition in ZrO$_2$ and extend the concept of negative capacitance beyond ferroelectricity. This shows that negative capacitance is a more general phenomenon than previously thought and can be expected in a much broader range of materials exhibiting structural phase transitions.

cond-mat.mtrl-sci↗