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Priyankka Gundlapudi Ravikumar

Publications and source records attributed to Priyankka Gundlapudi Ravikumar.

2 recordsLinked to original sources

Conditions for domain-free negative capacitance

While negative capacitance has been demonstrated in ferroelectric-dielectric heterostructures in the form of capacitance enhancement, all experimental evidence, to date, suggests the existence of domains therein. Here, we address the question: what are the conditions to achieve ideal, domain-free negative capacitance in ferroelectric-dielectric heterostructures? Our main claim is that for given thicknesses of the ferroelectric and the dielectric layers, there is a critical value of domain wall energy parameter -- above which the system would be stabilized in an ideal and robust domain-free negative capacitance state and would be robust against domain formation. Our analyses suggest that to achieve ideal negative capacitance, efforts should lie in understanding the means to control the domain wall energy on all fronts, both theory and experiments via high throughput design, discovery, and engineering of ferroelectrics.

cond-mat.mtrl-sci↗

ALD-Derived WO3-x Leads to Nearly Wake-Up-Free Ferroelectric Hf0.5Zr0.5O2 at Elevated Temperatures

Breaking the memory wall in advanced computing architectures will require complex 3D integration of emerging memory materials such as ferroelectrics-either within the back-end-of-line (BEOL) of CMOS front-end processes or through advanced 3D packaging technologies. Achieving this integration demands that memory materials exhibit high thermal resilience, with the capability to operate reliably at elevated temperatures such as 125C, due to the substantial heat generated by front-end transistors. However, silicon-compatible HfO2-based ferroelectrics tend to exhibit antiferroelectric-like behavior in this temperature range, accompanied by a more pronounced wake-up effect, posing significant challenges to their thermal reliability. Here, we report that by introducing a thin tungsten oxide (WO3-x) layer-known as an oxygen reservoir-and carefully tuning its oxygen content, ultra-thin Hf0.5Zr0.5O2 (5 nm) films can be made robust against the ferroelectric-to-antiferroelectric transition at elevated temperatures. This approach not only minimizes polarization loss in the pristine state but also effectively suppresses the wake-up effect, reducing the required wake-up cycles from 105 to only 10 at 125C- a qualifying temperature for back-end memory integrated with front-end logic, as defined by the JEDEC standard. First-principles density functional theory calculations reveal that WO3 enhances the stability of the ferroelectric orthorhombic phase at elevated temperatures by increasing the tetragonal-to-orthorhombic phase energy gap, and promoting favorable phonon mode evolution, thereby supporting o-phase formation under both thermodynamic and kinetic constraints.

cond-mat.mtrl-sci↗