arXiv subjects

Qian Jin

Publications and source records attributed to Qian Jin.

5 recordsLinked to original sources

arXiv2026

LithoDreamer: A Physics-Informed World Model for Multi-Stage Computational Lithography

As semiconductor technology nodes scale, computational lithography is essential for ensuring yield and performance. However, lithography is a continuous physical process involving mask optimization, optical imaging, resist exposure, and development, which existing models fail to capture. To overcome this limitation, we present LithoDreamer, the first physics-informed World Model (WM) framework for computational lithography, which formulates the ``Layout-Mask-Resist Image-After Development Image (ADI)'' pipeline as a decision-driven multi-step evolution system. LithoDreamer captures feature changes between adjacent states to model stage-specific physics-informed latent spaces, in which it controls process intervention exploration and drives subsequent state transitions. To achieve interpretable intervention optimization without continuous supervision, we propose a contrastive variational optimization paradigm that contrasts the latent differences between intervention paths with variational evolution constraints, guiding the model to generate evolutions consistent with real lithography physics. Experiments show LithoDreamer achieves state-of-the-art performance in forward evolution and inverse planning. Our lithography dataset is publicly available at GitHub (https://github.com/7jiangyq/lithodreamer.git).

cs.AI↗

arXiv2025

Unitho: A Unified Multi-Task Framework for Computational Lithography

Reliable, generalizable data foundations are critical for enabling large-scale models in computational lithography. However, essential tasks-mask generation, rule violation detection, and layout optimization-are often handled in isolation, hindered by scarce datasets and limited modeling approaches. To address these challenges, we introduce Unitho, a unified multi-task large vision model built upon the Transformer architecture. Trained on a large-scale industrial lithography simulation dataset with hundreds of thousands of cases, Unitho supports end-to-end mask generation, lithography simulation, and rule violation detection. By enabling agile and high-fidelity lithography simulation, Unitho further facilitates the construction of robust data foundations for intelligent EDA. Experimental results validate its effectiveness and generalizability, with performance substantially surpassing academic baselines.

cs.LG↗

arXiv2025

Generative Flexible Latent Structure Regression (GFLSR) model

Latent structure methods, specifically linear continuous latent structure methods, are a type of fundamental statistical learning strategy. They are widely used for dimension reduction, regression and prediction, in the fields of chemometrics, economics, social science and etc. However, due to the lack of model inference, generative form, and unidentifiable parameters, most of these methods are always used as an algorithm, instead of a model. This paper proposed a Generative Flexible Latent Structure Regression (GFLSR) model structure to address this problem. Moreover, we show that most linear continuous latent variable methods can be represented under the proposed framework. The recursive structure allows potential model inference and residual analysis. Then, the traditional Partial Least Squares (PLS) is focused; we show that the PLS can be specialised in the proposed model structure, named Generative-PLS. With a model structure, we analyse the convergence of the parameters and the latent variables. Under additional distribution assumptions, we show that the proposed model structure can lead to model inference without solving the probabilistic model. Additionally, we proposed a novel bootstrap algorithm that enables uncertainty on parameters and on prediction for new datasets. A simulation study and a Real-world dataset are used to verify the proposed Generative-PLS model structure. Although the traditional PLS is a special case, this proposed GFLSRM structure leads to a potential inference structure for all the linear continuous latent variable methods.

stat.ME↗

arXiv2025

FabGPT: An Efficient Large Multimodal Model for Complex Wafer Defect Knowledge Queries

Intelligence is key to advancing integrated circuit (IC) fabrication. Recent breakthroughs in Large Multimodal Models (LMMs) have unlocked extraditionary abilities in understanding images and text, fostering intelligent fabrication. Leveraging the power of LMMs, we introduce FabGPT, a customized IC fabrication large multimodal model for wafer defect knowledge query. FabGPT manifests expertise in conducting defect detection in Scanning Electron Microscope (SEM) images, performing root cause analysis, and providing expert Q&A on fabrication processes. FabGPT matches enhanced multimodal features to automatically detect minute defects under complex wafer backgrounds and reduce the subjectivity of manual threshold settings. Besides, the proposed modulation module and interactive corpus training strategy embed wafer defect knowledge into the pre-trained model, effectively balancing Q&A queries related to defect knowledge and original knowledge and mitigating the modality bias issues. Experiments on in-house fab data show that FabGPT achieves significant performance improvement in wafer defect detection and knowledge querying.

cs.CV↗

arXiv2025

SEM-CLIP: Precise Few-Shot Learning for Nanoscale Defect Detection in Scanning Electron Microscope Image

In the field of integrated circuit manufacturing, the detection and classification of nanoscale wafer defects are critical for subsequent root cause analysis and yield enhancement. The complex background patterns observed in scanning electron microscope (SEM) images and the diverse textures of the defects pose significant challenges. Traditional methods usually suffer from insufficient data, labels, and poor transferability. In this paper, we propose a novel few-shot learning approach, SEM-CLIP, for accurate defect classification and segmentation. SEM-CLIP customizes the Contrastive Language-Image Pretraining (CLIP) model to better focus on defect areas and minimize background distractions, thereby enhancing segmentation accuracy. We employ text prompts enriched with domain knowledge as prior information to assist in precise analysis. Additionally, our approach incorporates feature engineering with textual guidance to categorize defects more effectively. SEM-CLIP requires little annotated data, substantially reducing labor demands in the semiconductor industry. Extensive experimental validation demonstrates that our model achieves impressive classification and segmentation results under few-shot learning scenarios.

cs.CV↗