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R. März

Publications and source records attributed to R. März.

2 recordsLinked to original sources

Rigorous Simulation of 3D Masks

We perform 3D lithography simulations by using a finite-element solver. To proof applicability to real 3D problems we investigate DUV light propagation through a structure of size 9 microns times 4 microns times 65 nm. On this relatively large computational domain we perform rigorous computations (No Hopkins) taking into account a grid of 11 times 21 source points with two polarization directions each. We obtain well converged results with an accuracy of the diffraction orders of about one percent. The results compare well to experimental aerial imaging results. We further investigate the convergence of 3D solutions towards quasi-exact results obtained with different methods.

physics.optics↗

Benchmark of FEM, Waveguide and FDTD Algorithms for Rigorous Mask Simulation

An extremely fast time-harmonic finite element solver developed for the transmission analysis of photonic crystals was applied to mask simulation problems. The applicability was proven by examining a set of typical problems and by a benchmarking against two established methods (FDTD and a differential method) and an analytical example. The new finite element approach was up to 100 times faster than the competing approaches for moderate target accuracies, and it was the only method which allowed to reach high target accuracies.

physics.optics↗