arXiv subjects

Renae N. Gannon

Publications and source records attributed to Renae N. Gannon.

5 recordsLinked to original sources

arXiv2026

Enabling the Ambient Pressure Growth of ScB2 Crystals for AlGaN Power Electronics

Here we report the growth of single crystalline ScB2, an ultrahigh-temperature ceramic, at ambient pressure in a laser-heated Optical Floating Zone via the travelling solvent method. Crystals have been grown from both Sc-rich (55-65 at% Sc) and B-rich self-flux (80-83 at% B) at growth rates in the range of 0.2-2 mm/hr. The structure of grown crystals is in good agreement with an AlB2-type layered hexagonal phase, space group P6/mmm, with lattice constants a = 3.1423(2) Å (resp. 3.1502(3) Å) and c = 3.5084(3) Å (resp. 3.5041(3) Å) for crystals grown under Sc-rich (resp. B-rich) conditions. Crystals natively grow along the in-plane [100] direction. Electron backscattered diffraction shows that Sc-flux growth results in boules with multiple domains containing Sc inclusions, with the domains highly aligned. In contrast, B-flux boules are single domain after the initial nucleation region. Rocking-curve measurements of B-flux crystals for the (h000) and (000l) reflections show single peaks, establishing that the crystals are free from grain boundaries; the asymmetry in the scattered-intensity tails suggests the presence of point defects. Surface X-ray photoemission spectroscopy shows that the electronic environment in B-flux crystals is superior to that of Sc-flux crystals and produces highly resolved binding-energy peaks for B 1s and Sc 2p. Work-function measurements for the (11-20) plane give a value of approximately 5 eV, consistent with the highly electrically conductive nature of ScB2. These results demonstrate the viable ambient-pressure growth of ScB2, establish it as a lattice-matched substrate candidate for Al-rich AlGaN power microelectronics, and show that this growth route enables scalable manufacturing of ScB2 substrates.

cond-mat.mtrl-sci↗

arXiv2026

Scandium diboride: a semi-metallic, lattice, thermally matched substrate for vertical AlGaN power electronics

We report the properties of hexagonal (space group P6/mmm) scandium diboride ($\mathrm{ScB}_2$) single crystals grown by a laser diode floating zone method at growth rates of ~1mm/hr under B-rich conditions with (002) rocking curve widths $Δω$=38'' approaching the quality of commercial SiC/GaN substrates. Lattice expansion measurements reveal matching to $\mathrm{Al_{0.55}Ga_{0.45}N}$ with a coefficient of thermal expansion ~5ppm/K at typical AlGaN growth temperatures, enabling thick AlGaN layers for ultra-wide bandgap (UWBG) power electronics >1kV. We measure semi-metallic room temperature resistivity ~15$μΩ$ cm, climbing to ~93$μΩ$ cm at 773K with a $T^2$ dependence effectively eliminating substrate parasitic resistance, the limiting factor in exploiting the full potential of UWBG. The Debye temperature $θ_{D,ScB_2}$ from heat capacity and lattice expansion is ~850K well matched to $θ_{D,ScB_2}$, but lower than the 1100K measured for Sc-rich growth conditions. We discuss Debye matching as a key substrate codesign criterion providing significant overlap in phonon modes for heat removal and thermal matching during AlGaN growth. The competitive thermal conductivity at room temperature 53W/mK is half that from full first principles calculations, a discrepancy we attribute to the presence of Sc-vacancies generated by B-rich growth. while the resistivity is ~2x the theoretical value, indicating that both electrons and phonons play equal role in thermal transport. The smooth ~2.5nm rms roughness surface enables advanced heat removal modalities through engineered phonon bridges and phonon polaritons in $\mathrm{ScB}_2$/AlGaN interfacial heterostructures, potentially allowing ~10-100x increase in power handling over state-of-the-art GaN/SiC.

cond-mat.mtrl-sci↗

arXiv2026

Revealing epitaxial relationships at Ga$_2$O$_3$ interfaces with p-type oxides

p-type oxide contact layers such as Cr$_2$O$_3$ and NiO are attracting increasing interest in pn-heterojunctions with n-type monoclinic $β$-Ga$_2$O$_3$ for high-power electronic devices and other extreme environment applications. However, scientific understanding of their epitaxial relationships remains incomplete. In this work we investigate the epitaxial relation of Cr$_2$O$_3$ and NiO layers to (001) and ($\bar{2}$01) out-of-plane oriented Ga$_2$O$_3$ substrates. Surprisingly, we find that, for the most commercially relevant (001)-orientation of the Ga$_2$O$_3$ substrate, the epitaxial relationships are Cr$_2$O$_3$ (0001) and NiO (111) $\parallel$ Ga$_2$O$_3$ (101), both at the non-intuitive $χ$ = 22.5 $^\circ$ angle with respect to the substrate normal. We explain this unusual discovery by the interfacial atomistic bonding dominated by oxygen sublattice equivalence of these Cr$_2$O$_3$ and NiO polar surface orientations to the tilted Ga$_2$O$_3$ (101), rather than Ga$_2$O$_3$ (001) substrate surface planes. Furthermore, we assign the in-plane orientation for Cr$_2$O$_3$ on ($\bar{2}$01)-oriented Ga$_2$O$_3$ as: Cr$_2$O$_3$ $[12\bar{3}0]$ $\parallel$ Ga$_2$O$_3$ $[010]$ with two in-plane rotational domains. Interface modeling confirms the in-plane orientation for Cr$_2$O$_3$/$(\bar{2}01)$ Ga$_2$O$_3$ and shows that strained O-terminated Ga$_2$O$_3$ $(\bar{2}01)$ surfaces have the lowest interfacial energy with Cr$_2$O$_3$ (0001). Beyond establishing the specific epitaxial relationships for Cr$_2$O$_3$ and NiO on Ga$_2$O$_3$, this work provides a systematic methodology for the unambiguous structural characterization of heterointerfaces involving materials with markedly different crystal symmetries.

cond-mat.mtrl-sci↗

arXiv2026

Revealing the Atomic Structure of NiO/Ga$_{2}$O$_{3}$ Interfaces

NiO/Ga$_{2}$O$_{3}$ heterojunctions have garnered significant attention for use in power electronics due to the ultrawide bandgap and wafer-scale availability of Ga$_{2}$O$_{3}$ and the controllable p-type doping of NiO. However, the structure of NiO/Ga$_{2}$O$_{3}$ interfaces remains underexplored, largely due to the complexity of the junction between their dissimilar cubic and monoclinic crystal structures. Here we investigate the atomistic structure of the NiO/Ga$_{2}$O$_{3}$ interface for (100), (-201), and (001) oriented Ga$_{2}$O$_{3}$ substrates using aberration-corrected scanning transmission electron microscopy (STEM) in combination with interface modeling and image simulations. We evaluate the abruptness and consistency of the interfaces and compare them to calculated interface models, proposing precise atomic structures and assessing potential structural variation arising from complexity of the monoclinic Ga$_{2}$O$_{3}$ crystal structure. Our interface analysis supports increased focus on (100) oriented Ga$_{2}$O$_{3}$ as a candidate for fabricating high quality, low defect density NiO/Ga$_{2}$O$_{3}$ heterojunction devices. Importantly, we consider the effects of specimen thickness and 3D-to-2D projection during the STEM imaging process to differentiate such effects from real crystal variations. This work provides insight into the effect of substrate orientation on NiO film and interface quality, creating a pathway to improving heterojunction properties. It further highlights important considerations for interpretation of stability and interlayer phase formation in these interfaces, which is crucial for their integration into reliable and robust power electronic devices.

cond-mat.mtrl-sci↗

arXiv2026

Atomic-Scale Characterization of Oxide Interfaces and Superlattices Using Scanning Transmission Electron Microscopy

Scanning transmission electron microscopy (STEM) is a cornerstone of our understanding of oxide interfaces and superlattices. No other technique provides the same level of insight into structure, chemistry, composition, and dynamics across as wide a variety of material systems. STEM imaging and diffraction, coupled with electron energy loss (EELS) and energy-dispersive X-ray (EDS) spectroscopies, offer unparalleled, high-resolution analysis of structure--property relationships. In this chapter we highlight investigations into key phenomena, including interfacial conductivity in oxide superlattices, charge screening effects in magnetoelectric heterostructures, interface engineering in iron oxides, and the complex physics governing atomic-scale chemical mapping. We also discuss emerging plasma preparation techniques and artificial intelligence-guided approaches to both ex situ and in situ microscopy. These studies illustrate how unique insights from STEM characterization can be integrated with other techniques and theory calculations to develop more predictive models for the behavior of functional oxides.

cond-mat.mtrl-sci↗