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Riku Isoaho

Publications and source records attributed to Riku Isoaho.

2 recordsLinked to original sources

Hybrid integration of a SESAM with a silicon nitride photonic integrated circuit

The realization of high-performance femtosecond lasers on photonic integrated circuits (PICs) requires robust, low-loss coupling between a saturable absorber and a photonic waveguide. In this work, we demonstrate the hybrid integration of a semiconductor saturable absorber mirror (SESAM) with a silicon nitride (SiN) PIC by micro-assembly. This micro-assembly strategy transfers the non-linear functionality of the absorber onto the PIC. We characterize the linear and non-linear performance of an unbonded SESAM and of a SESAM bonded to inverse-tapered SiN waveguides. At 1560~nm, the bonded device shows a waveguide-coupled modulation depth of 5.2\%, a maximum reflectivity of 37.2\%, and a saturation fluence of 47~\textmu J/cm$^2$. This work demonstrates that SESAMs can be integrated directly onto silicon nitride-based PIC platforms and provides a pathway towards fully integrated, self-starting, chip-scale ultrafast lasers.

physics.optics↗

External busbars for improving current generation in multijunction solar cells

We report an improved device fabrication process employed in the development of an advanced front contact grid design employing external busbars. The advanced fabrication process results in enhanced solar cell performance measured at one-sun illumination. In this grid configuration the busbar area is located outside the active solar cell and the grid fingers travel across the mesa sidewalls. With this design the solar cell size can be scaled down without limitations as the area of the busbar is not restricting the component size. Thus, the demonstrated design is beneficial especially for micro-concentrator solar cells. In general, this approach minimizes the power losses originating from the grid shadowing and dark area related voltage losses. The performance of the proposed design is validated by fabricating GaInP/GaAs/GaInNAsSb triple-junction solar cells employing the grid design with external busbars. Light-biased current-voltage and electroluminescence characteristics of the cells reveal that an additional contact GaAs etching step prior to front contact metal deposition is needed to ensure good photovoltaic performance with a fill factor of 85% at one-sun illumination. The improvement is attributed to removing the plasma-damaged material layer that can extend to a depth beyond 100 nm, leading to resistive losses.

physics.app-ph↗