arXiv subjects

Roudy Hanna

Publications and source records attributed to Roudy Hanna.

3 recordsLinked to original sources

arXiv2026

Highly crystalline superconducting TiN resonators grown on thermally reconstructed sapphire

High quality crystalline growth of a thin film on sapphire requires sufficient substrate preparation, often achieved via the use of aggressive chemical cleaning. Direct thermal reconstruction of the sapphire substrate via a CO$_2$ laser beam may allow for an alternative way to prepare the substrate for epitaxy without the use of any chemical processing. Within this work, we demonstrate that thermal annealing of sapphire into its ($\sqrt{31}$$\times$$\sqrt{31}$)$R$$\pm$9° reconstruction is a valid alternative preparation technique for sapphire substrates. TiN films grown via plasma-assisted molecular beam epitaxy upon these substrates exhibit greater crystallinity than those grown on chemically cleaned sapphire substrates. Superconducting resonators fabricated from these films exhibit similar performance, with many possessing internal quality factors at single photon levels greater than 10$^6$ for both substrate preparation methods.

cond-mat.supr-con↗

arXiv2025

On-chip stencil lithography for superconducting qubits

Improvements in circuit design and more recently in materials and surface cleaning have contributed to a rapid development of coherent superconducting qubits. However, organic resists commonly used for shadow evaporation of Josephson junctions (JJs) pose limitations due to residual contamination, poor thermal stability and compatibility under typical surface-cleaning conditions. To provide an alternative, we developed an inorganic SiO$_2$/Si$_3$N$_4$ on-chip stencil lithography mask for JJ fabrication. The stencil mask is resilient to aggressive cleaning agents and it withstands high temperatures up to 1200°C, thereby opening new avenues for JJ material exploration and interface optimization. To validate the concept, we performed shadow evaporation of Al-based transmon qubits followed by stencil mask lift-off using vapor hydrofluoric acid, which selectively etches SiO$_2$. We demonstrate average $T_1 \approx 75 \pm 11 μ$s over a 200 MHz frequency range in multiple cool-downs for one device, and $T_1 \approx 44\pm 8 μ$s for a second device. These results confirm the compatibility of stencil lithography with state-of-the-art superconducting quantum devices and motivate further investigations into materials engineering, film deposition and surface cleaning techniques.

quant-ph↗

arXiv2024

Observation of Josephson Harmonics in Tunnel Junctions

Approaches to developing large-scale superconducting quantum processors must cope with the numerous microscopic degrees of freedom that are ubiquitous in solid-state devices. State-of-the-art superconducting qubits employ aluminum oxide (AlO$_x$) tunnel Josephson junctions as the sources of nonlinearity necessary to perform quantum operations. Analyses of these junctions typically assume an idealized, purely sinusoidal current-phase relation. However, this relation is only expected to hold in the limit of vanishingly low-transparency channels in the AlO$_x$ barrier. Here we show that the standard current-phase relation fails to accurately describe the energy spectra of transmon artificial atoms across various samples and laboratories. Instead, a mesoscopic model of tunneling through an inhomogeneous AlO$_x$ barrier predicts percent-level contributions from higher Josephson harmonics. By including these in the transmon Hamiltonian, we obtain orders of magnitude better agreement between the computed and measured energy spectra. The presence and impact of Josephson harmonics has important implications for developing AlO$_x$-based quantum technologies including quantum computers and parametric amplifiers. As an example, we show that engineered Josephson harmonics can reduce the charge dispersion and the associated errors in transmon qubits by an order of magnitude, while preserving their anharmonicity.

quant-ph↗