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Ruben Asanovski

Publications and source records attributed to Ruben Asanovski.

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Wafer-Level 1/f Noise Characterization of Scaled P-Type Nanosheets and Comparison with Planar HKMG Transistors

We present a comprehensive wafer-level 1/f noise study of scaled Gate-All-Around (GAA) p-type nanosheet transistors and benchmark them against large-area planar High- \k{appa} Metal Gate (HKMG) devices to assess the impact of device architecture on reliability. By statistically analyzing noise data from 188 nanosheets, we extract the effective trap density in the dielectric and compare it to that of planar transistors with identical gate stack, comparable processing thermal budgets, and no specific reliability anneals. The effective trap density extracted from 1/f noise is comparable in planar and nanosheet architectures. This indicates that transitioning to GAA nanosheets does not increase noise, which remains governed by gate stack quality.

cond-mat.mes-hall

CryoCMOS RF multiplexer for superconducting qubit control, readout and flux biasing at millikelvin temperatures with picowatt power consumption

Large-scale cryogenic quantum systems are constrained by an input-output bottleneck between room-temperature electronics and millikelvin stages, particularly in superconducting qubit platforms. This bottleneck is most acute for output lines, where bulky and expensive microwave components limit scalability. A promising approach for scalable characterization and testing is to perform signal multiplexing directly at the qubit plane. We demonstrate a cryogenic CMOS (cryoCMOS) RF multiplexer operating at 10 millikelvin with record-low static power consumption of 200 pW. The device provides < 2 dB insertion loss and > 30 dB isolation across DC-8 GHz. Direct connection to transmon qubits marginally affects coherence times in the range of 100 microseconds, enabling multiplexing of readout, flux and, in principle, XY drive lines. This work introduces cryoCMOS multiplexers as valuable tools for scalable, high-throughput cryogenic characterization and testing, and advances co-integrated quantum-classical control for future large-scale quantum processors.

quant-ph

Investigation of Low Frequency Noise in CryoCMOS devices through Statistical Single Defect Spectroscopy

High 1/f noise in CryoCMOS devices is a critical parameter to keep under control in the design of complex circuits for low temperatures applications. Current models predict the 1/f noise to scale linearly with temperature, and gate oxide defects are expected to freeze out at cryogenic temperatures. Nevertheless, it has been repeatedly observed that 1/f noise deviates from the predicted behaviour and that gate oxide defects are still active around 4.2 K, producing random telegraph noise. In this paper, we probe single gate oxide defects in 2500 nMOS devices down to 5 K in order to investigate the origin of 1/f noise in CryoCMOS devices. From our results, it is clear that the number of defects active at cryogenic temperatures resulting in random telegraph noise is larger than at 300 K. Threshold voltage shifts due to charged defects are shown to be exponentially distributed, with different modalities across temperatures and biases: from monomodal at 300 K to trimodal below 100 K. The third mode is interpreted in the framework of percolation theory. By fitting these distributions, it is shown that more than 80% of the detected defects belongs to the oxide bulk. Afterwards, starting from the raw data in time domain, we reconstruct the low frequency noise spectra, highlighting the contributions of defects belonging to different branches and, therefore, to different oxide layers. This analysis shows that, although interface traps and large defects associated with the third mode are the main sources of 1/f noise at 5 K, bulk oxide defects still contribute significantly to low-frequency noise at cryogenic temperatures. Finally, we show that defect time constants and step heights are uncorrelated, proving that elastic tunnelling model for charge trapping is not accurate.

cond-mat.mes-hall