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S. Tripura Sundari

Publications and source records attributed to S. Tripura Sundari.

3 recordsLinked to original sources

Spectroscopic Ellipsometry investigation on anisotropic optical properties of sputtered AlN films

We report the uniaxial anisotropic optical constants of Wurtzite type AlN films deposited on Si (100) substrate using DC reactive magnetron sputtering as a function of growth temperature (Ts, 35 to 600 C). Evolution of optical properties with Ts is investigated by Spectroscopic Ellipsometry (SE) technique. Thickness and roughness of these films are determined from the regression analysis of SE data, which are corroborated using TEM and AFM technique. Highly a-axis oriented AlN film grown at 400 C, exhibits high n and low k at 210 nm (deep-UV region) with a small birefringence and dichroism near to band edge, which can be used in isotropic deep UV optoelectronic device applications. All these AlN films exhibit transparent nature from near-infrared (NIR) to 354 nm, where optical band gap energies vary between 5.7 to 6.1 eV.

cond-mat.mtrl-sci↗

Temperature dependence of dielectric constants in Titanium Nitride

The temperature dependence of optical constants of titanium nitride thin film is investigated using spectroscopic ellipsometry between 1.4 to 5 eV in the temperature range 300 K to 650 K in steps of 50 K. The real and imaginary parts of the dielectric functions "1(E) and "2(E) increase marginally with increase in temperature. A Drude Lorentz dielectric analysis based on free electron and oscillator model are carried out to describe the temperature behavior. The parameters of the Lorentz oscillator model also showed that the relaxation time decreased with temperature while the oscillator energies increased. This study shows that owing to marginal change in the refractive index with temperature, titanium nitride can be employed for surface plasmon sensor applications even in environments where rise in temperature is imminent.

cond-mat.mtrl-sci↗

Optical properties and hardness of highly a-axis oriented AlN films

This paper reports optical and nanomechanical properties of seldom studied highly a-axis oriented AlN thin films for the first time. These films were deposited by reactive DC magnetron sputtering technique at an optimal target to substrate distance of 180 mm. Bragg-Brentano geometry X-ray and rocking curve (FWHM = 52 arcsec) studies confirmed the preferred orientation. Spectroscopic ellipsometry revealed that these films exhibit a refractive index of 1.93 at a wavelength of 546 nm. The hardness and elastic modulus of these films were 17 GPa and 190 GPa, respectively. The mechanical properties obtained here are much higher than the earlier reported and therefore can be useful as protective coating in thermo printing devices, piezoelectric films in bulk acoustic wave resonators.

cond-mat.mtrl-sci↗