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Samaresh Das

Publications and source records attributed to Samaresh Das.

10 recordsLinked to original sources

Probing the Valley-Selective Tunneling Density of States in Monolayer MoS2 based Resonant Tunneling Devices

The present work experimentally demonstrates the fabrication of CVD grown monolayer MoS2 ultra thin quantum well based double barrier resonant tunneling device (RTD) architecture well compatible with conventional CMOS fabrication technology. The strongly quantized electronic states from multiple valleys in the momentum space in such ultra 2D sheet along the c-axis sandwiched in between Al2O3 tunneling barriers exhibit multiple resonant tunneling peaks thereby enhancing the FWHM of the NDR region as derived from experimental I-V characteristics as well as theoretical joint invision through Density Functional Theory (DFT) and Non-Equilibrium Greens function (NEGF) visualized via Tunneling Density of States (TDOS). Understanding extended to S-vacancies not only change the bandgap, as evaluated through nanoscale Cathodoluminescence (CL) spectroscopy, but also alters the effective mass hence the mobility as investigated here within the high symmetry path in the k-space. Electrical performances of fabricated RTD, starting from cryogenic to room temperatures, show a significant milestone via exhibiting huge PVR values of 178 at 4K and 24 at RT with more possible improvement in the field of room temperature quantum technology. Momentum conserved and non conserved tunneling from highly n-doped Si through multiple valleys of 1L-MoS2 provides a tremendous opportunity in gate-induced manipulation in Spin-Valley Qubit technology operational at deep cryogenic temperatures (mK).

cond-mat.mes-hall

Giant Damping-like Spin-Torque Conductivity in a GeTe/Py van der Waals Heterostructure

Recent observations of large unconventional spin-orbit torques in van der Waals (vdW) materials are driving intense interest for energy-efficient spintronic applications. A key limitation of ferromagnet (FM)/vdW heterostructures is their lower value of damping-like torque conductivity ($\sigma{\rm_{DL}^{y}}$) compared to the conventional heavy metal-based systems, limiting their prospects for commercial spintronic devices. Here, we report both a giant $\sigma{\rm_{DL}^{y}}$ of $-(1.25 \pm 0.11)\times 10^{5}~\hbar/ 2e~\Omega^{-1}$m$^{-1}$ and an unconventional spin-orbit torque in a heterostructure comprising an FM (Ni$_{80}$Fe$_{20}$) and the vdW material GeTe. The value of $\sigma{\rm_{DL}^{y}}$ represents the highest reported torque conductivity for any FM/vdW interface and is comparable to benchmark heavy metal heterostructures. First-principles calculations reveal that this substantial torque originates from the cooperative interplay of the spin Hall effect, orbital Hall effect, and orbital Rashba effect, assisted by interfacial charge transfer. These findings demonstrate the potential of carefully engineered vdW heterostructures to achieve highly efficient electrical manipulation of magnetization at room temperature, paving the way for next-generation low-power spintronic devices.

cond-mat.mes-hall

Resonant Tunneling in Tri-layer 2H-MoTe2 grown by Molecular Beam Epitaxy Coupled with layered WSe2 carrier Reservoir

Here, we report a prominent quantum oscillation in the conductance of 2H-MoTe2 based resonant tunneling structure. In this work, a n-WSe2/HfO2/i-MoTe2/HfO2/Au resonant tunneling device (RTD) with a symmetric and asymmetric double barrier has been fabricated using Molecular Beam Epitaxy (MBE) grown 2H-MoTe2 and Chemical Vapor Deposition (CVD) grown 2H-WSe2 along with theoretical modeling by adopting non-equilibrium Green function (NEGF) formalism. The impact of MoTe2-quantum well widths equal, and above its excitonic Bohr radius (EBR:0.7 nm) on resonant tunneling current is investigated at cryogenic temperatures. Such peak values increase with downscaling of the well width up to a certain value and then it decreases with further miniaturization. The corresponding maximum peak-to-valley current ratio (PVR) is estimated to be 4 at 4K in the low voltage range for the very first time in MoTe2 based RTD. Therefore, the present work may provide the route for fabrication of WSe2/MoTe2-based high performance resonant tunneling devices integrable with HEMT device for modern Qubit architecture operational at ultra-low temperatures.

cond-mat.mes-hall

Engineering 2D Van der Waals Electrode via MBE Grown Weyl Semimetal 1T-WTe2 for Enhanced Photodetection in InSe

Achieving low contact resistance in advanced quantum electronic devices remains a critical challenge. With the growing demand for faster and energy-efficient devices, 2D contact engineering offers a promising solution. Beyond graphene, 1T-WTe2 has attracted attention for its excellent electrical transport, quantum phenomena, and Weyl semimetallic properties. Here, we demonstrate the direct wafer-scale growth of 1T-WTe2 via molecular beam epitaxy (MBE) and its use as a 2D contact for layered materials such as InSe. The 1T WTe2/InSe interface exhibits a barrier height nearly half that of conventional metal contacts, and its contact resistance is reduced by a factor of 21, effectively suppressing Fermi level pinning and enabling efficient electron injection. InSe/1T WTe2 photodetectors show broad photoresponsivity (0.14 to 217.58 A/W) under NIR to DUV illumination with fast rise/fall times of 42/126 ms, compared to lower responsivity (0.000865 A/W to 3.64 A/W) and slower response (150/144 ms) for InSe/Ti Au devices. The 1T WTe2/InSe devices thus exhibit approximately 60 times higher responsivity and 4 times faster response than conventional metal contacts. These results establish MBE-grown 1T-WTe2 as an effective 2D electrode, enhancing photodetection performance while simplifying device architecture, making it a strong candidate for next generation nanoelectronic and optoelectronic devices.

physics.optics

Growth of Large Area WSe2 and Observation of Photogenerated Inversion Layer in DMOS Configuration

Here, we report the full-fledged journey towards the material synthesis and characterization of few-layered/thin WSe$_2$ using sputtered W-films on SiO$_2$/Si substrates followed by electrical studies under dark and illumination conditions. Growth temperature 500oC and gas pressure 55 sccm are found to be the optimized parameters for formation of thermodynamically stable WSe$_{2-x}$ with dominant Raman peak at 265 cm-1. XRD and HR-TEM measurement clarify the formation of high crystallinity along the c-axis and quasi-crystallinity along a and b axes respectively. Lower intensities from Raman-measurement and PL-peak at 768 nm (with 532 nm excitation wavelength) infers the thin nature of the grown film, along with strong second harmonic emission with excitation wavelength varying from 350nm to 450 nm. This work also retracks the controlled etching by reactive ions to achieve large area bi/tri-layer films to fabricate advanced devices. We also have fabricated an advanced MOS structure on SiO$_2$/p-Si substrate which shows tremendous performance by means of photo-capacitance under illumination condition where photo-carriers can survive the higher probe frequencies (> 1MHz). Under illumination condition, HfO$_2$/WSe$_2$ embedded MOS shows its dominance showing a huge electron-inversion region over HfO$_2$/ SiO$_2$/p-Si and SiO$_2$/p-Si MOS devices even at high frequencies (1-10 MHz). Thereby, this work also reveals a possible route for capacitance based highly sensitive photodetection using conventional Si-technology with integration of such WSe$_2$/W as an active material.

cond-mat.mtrl-sci

Optically Pumped Terahertz Amplitude Modulation in Type-II Ge QD/Si heterostructures grown via Molecular Beam Epitaxy

This article exploits group-IV germanium (Ge) quantum dots (QDs) on Silicon-on-Insulator (SOI) grown by molecular beam epitaxy (MBE) in order to explore its optical behaviour in the Terahertz (THz) regime. In this work, Ge QDs, pumped by an above bandgap near infrared wavelength, exhibit THz amplitude modulation in the frequency range of 0.1-1.0 THz. The epitaxial Ge QDs outperform reference SOI substrate in THz amplitude modulation owing to higher carrier generation in weakly confined dots compared to its bulk counterpart. This is further corroborated using theoretical model based on the non-equilibrium Green's function (NEGF) method. This model enables the calculation of photo carriers generated (PCG) and their confinement in the Ge QD region. Our model also reroutes the calculation from PCG to corresponding plasma frequency and hence to refractive index and THz photo-conductivity. Moreover, the photo-generated confined holes accumulation at the Ge QDs-Si interface is elevated after optical illumination, leading to a decreased THz photo-conductivity. This augmentation in THz photo-conductivity contributes to a significant enhancement of THz modulation depth ~77% at Ge QDs-Si interfaces compared to bare SOI at 0.1 THz.

physics.optics

Observation of room temperature gate tunable quantum confinement effect in photodoped junctionless MOSFET

In the pursuit of room temperature quantum hardware, our study introduces a gate voltage tunable quantum wire within a tri-gated n-type junctionless MOSFET. The application of gate voltage alters the parabolic potential well of the tri-gated junctionless MOSFET, enabling modification of the nanowire's potential well profile. In the presence of light, photogenerated electrons accumulate at the center of the junctionless nanowire, aligning with the modified potential well profile influenced by gate bias. These carriers at the center are far from interfaces and experience less interfacial noise. Therefore, such clean photo-doping shows clear, repeatable peaks in current for specific gate biases compared to the dark condition, considering different operating drain-to-source voltages at room temperature. We propose that photodoping-induced subband occupation of gate tunable potential well of the nanowire is the underlying phenomenon responsible for this kind of observation. This study reveals experimental findings demonstrating gate-induced switching from semi-classical to the quantum domain, followed by the optical occupancy of electronic sub-bands at room temperature. We developed a compact model based on the Nonequilibrium Green's function formalism to understand this phenomenon in our illuminated device better. This work reveals the survival of the quantum confinement effect at room temperature in such semi-classical transport.

cond-mat.mes-hall

Magnetic Proximity induced efficient charge-to-spin conversion in large area PtSe$_{2}$/Ni$_{80}$Fe$_{20}$ heterostructures

As a topological Dirac semimetal with controllable spin-orbit coupling and conductivity, PtSe$_2$, a transition-metal dichalcogenide, is a promising material for several applications from optoelectric to sensors. However, its potential for spintronics applications is yet to be explored. In this work, we demonstrate that PtSe$_{2}$/Ni$_{80}$Fe$_{20}$ heterostructure can generate a large damping-like current-induced spin-orbit torques (SOT), despite the absence of spin-splitting in bulk PtSe$_{2}$. The efficiency of charge-to-spin conversion is found to be $(-0.1 \pm 0.02)$~nm$^{-1}$ in PtSe$_{2}$/Ni$_{80}$Fe$_{20}$, which is three times that of the control sample, Ni$_{80}$Fe$_{20}$/Pt. Our band structure calculations show that the SOT due to the PtSe$_2$ arises from an unexpectedly large spin splitting in the interfacial region of PtSe$_2$ introduced by the proximity magnetic field of the Ni$_{80}$Fe$_{20}$ layer. Our results open up the possibilities of using large-area PtSe$_{2}$ for energy-efficient nanoscale devices by utilizing the proximity-induced SOT.

cond-mat.mtrl-sci

Large spin-to-charge conversion at the two-dimensional interface of transition metal dichalcogenides and permalloy

Spin-to-charge conversion is an essential requirement for the implementation of spintronic devices. Recently, monolayers of semiconducting transition metal dichalcogenides (TMDs) have attracted considerable interest for spin-to-charge conversion due to their high spin-orbit coupling and lack of inversion symmetry in their crystal structure. However, reports of direct measurement of spin-to-charge conversion at TMD-based interfaces are very much limited. Here, we report on the room temperature observation of a large spin-to-charge conversion arising from the interface of Ni$_{80}$Fe$_{20}$ (Py) and four distinct large area ($\sim 5\times2$~mm$^2$) monolayer (ML) TMDs namely, MoS$_2$, MoSe$_2$, WS$_2$, and WSe$_2$. We show that both spin mixing conductance and the Rashba efficiency parameter ($\lambda_{IREE}$) scales with the spin-orbit coupling strength of the ML TMD layers. The $\lambda_{IREE}$ parameter is found to range between $-0.54$ and $-0.76$ nm for the four monolayer TMDs, demonstrating a large spin-to-charge conversion. Our findings reveal that TMD/ferromagnet interface can be used for efficient generation and detection of spin current, opening new opportunities for novel spintronic devices.

physics.app-ph

Ge-Ge$_{0.92}$Sn$_{0.08}$ core-shell single nanowire infrared photodetector with superior characteristics for on-chip optical communication

Recent development on Ge$_{1-x}$Sn$_x$ nanowires with high Sn content, beyond its solid solubility limit, make them attractive for all group-IV Si-integrated infrared photonics at nanoscale. Herein, we report a chemical vapour deposition-grown high Sn-content Ge-Ge$_{0.92}$Sn$_{0.08}$ core-shell based single nanowire photodetector operating at the optical communication wavelength of 1.55 $\mu$m. The atomic concentration of Sn in nanowires has been studied using X-ray photoelectron and Raman spectroscopy data. A metal-semiconductor-metal based single nanowire photodetector, fabricated via electron beam lithography process, exhibits significant room-temperature photoresponse even at zero bias. In addition to the high-crystalline quality and identical shell composition of the nanowire, the efficient collection of photogenerated carriers under an external electric field result in the superior responsivity and photoconductive gain as high as ~70.8 A/W and ~57, respectively at an applied bias of -1.0 V. The extra-ordinary performance of the fabricated photodetector demonstrates the potential of GeSn nanowires for future Si CMOS compatible on-chip optical communication device applications.

cond-mat.mtrl-sci