arXiv subjects

Shivesh Yadav

Publications and source records attributed to Shivesh Yadav.

5 recordsLinked to original sources

arXiv2025

A Rapid Thermal Chemical Vapor Deposition System for Fast Synthesis of Epitaxial Graphene Under Ambient Pressure

Graphene has emerged as a promising material for next-generation electronic and thermal devices owing to its exceptional charge transport and thermal conductivity. However, high-quality samples are predominantly obtained via mechanical exfoliation from graphite crystals, a process that inherently lacks scalability. Despite extensive efforts toward large-area synthesis, cost-effective approaches for producing high-quality, large-area, single-crystalline graphene with fast turnaround time remain limited. Here, we report the design, fabrication, and performance benchmarking of a rapid thermal chemical vapor deposition (RTCVD) system capable of synthesizing epitaxial monolayer graphene under atmospheric pressure. The entire growth process, from sample loading to unloading, is achieved within $25$ minutes with a temperature ramp rate exceeding $23^\circ\mathrm{C}/s$. Growth at atmospheric pressure eliminates the need for vacuum components, thereby reducing both system complexity and operational costs. The structural and electronic quality of epitaxial graphene is comprehensively characterized using Raman spectroscopy, selected area electron diffraction (SAED), and magnetotransport measurements, which reveal signatures of quantum Hall effect in synthesized graphene samples. Furthermore, we demonstrate van der Waals epitaxial growth of palladium (Pd) thin films on graphene transferred to Si/SiO$_{2}$ substrates, establishing its single-crystalline nature over a large area and its potential as a versatile platform for subsequent heteroepitaxial growth.

cond-mat.mtrl-sci↗

arXiv2025

Imprinting electrically switchable scalar spin chirality by anisotropic strain in a Kagome antiferromagnet

Topological chiral antiferromagnets, such as Mn$_{3}$Sn, are emerging as promising materials for next-generation spintronic devices due to their intrinsic transport properties linked to exotic magnetic configurations. Here, we demonstrate that anisotropic strain in Mn$_{3}$Sn thin films offers a novel approach to manipulate the magnetic ground state, unlocking new functionalities in this material. Anisotropic strain reduces the point group symmetry of the manganese (Mn) Kagome triangles from $C_{3v}$ to $C_{1}$, significantly altering the energy landscape of the magnetic states in Mn$_{3}$Sn. This symmetry reduction enables even a tiny in-plane Dzyaloshinskii-Moriya (DM) interaction to induce canting of the Mn spins out of the Kagome plane. The modified magnetic ground state introduces a finite scalar spin chirality and results in a significant Berry phase in momentum space. Consequently, a large anomalous Hall effect emerges in the Kagome plane at room temperature - an effect that is absent in the bulk material. Moreover, this two-fold degenerate magnetic state enables the creation of multiple-stable, non-volatile anomalous Hall resistance (AHR) memory states. These states are field-stable and can be controlled by thermal assisted current-induced magnetization switching requiring modest current densities and small bias fields, thereby offering a compelling new functionality in Mn$_{3}$Sn for spintronic applications.

cond-mat.mtrl-sci↗

arXiv2025

Four-fold Anisotropic Magnetoresistance in Antiferromagnetic Epitaxial Thin Films of MnPt$_{x}$Pd$_{1-x}$

Antiferromagnets are emerging as promising alternatives to ferromagnets in spintronics applications. A key feature of antiferromagnets is their anisotropic magnetoresistance (AMR), which has the potential to serve as a sensitive marker for the antiferromagnetic order parameter. However, the underlying origins of this behavior remains poorly understood, particularly, in thin film geometries. In this study, we report the observation of AMR in epitaxial thin films of the collinear L1$_{0}$ antiferromagnet MnPt$_{x}$Pd$_{1-x}$. In the thicker films, AMR is dominated by a non-crystalline two-fold component, which emerges from domain reconfiguration and spin canting under applied magnetic field. As the film thickness is reduced, however, a crystalline four-fold component emerges, accompanied by the appearance of uncompensated magnetic moment, which strongly modifies the magnetotransport properties in the thinner films. We demonstrate that interfacial interactions lead to a large density of states (DOS) at the Fermi level. This enhanced DOS, combined with disorder in the thinner films, stabilizes the uncompensated moment and results in a four-fold modulation of the DOS as the Neel vector rotates, explaining the observed AMR behavior.

cond-mat.mtrl-sci↗

arXiv2023

Ni cluster embedded (111)NiO layers grown on (0001)GaN films using pulsed laser deposition technique

(111) NiO epitaxial layers embedded with crystallographically oriented Ni-clusters are grown on c-GaN/Sapphire templates using pulsed laser deposition technique. Structural and magnetic properties of the films are examined by a variety of techniques including high resolution x-ray diffraction, precession-electron diffraction and superconducting quantum interference device magnetometry. The study reveals that the inclusion, orientation, shape, size, density and magnetic properties of these clusters depend strongly on the growth temperature (TG). Though, most of the Ni-clusters are found to be crystallographically aligned with the NiO matrix with Ni(111) parallel to NiO(111), clusters with other orientations also exist, especially in samples grown at lower temperatures. Average size and density of the clusters increase with TG . Proportion of the Ni(111) parallel to NiO(111) oriented clusters also improves as TG is increased. All cluster embedded films show ferromagnetic behaviour even at room temperature. Easy-axis is found to be oriented in the layer plane in samples grown at relatively lower temperatures. However, it turns perpendicular to the layer plane for samples grown at sufficiently high temperatures. This reversal of easy-axis has been attributed to the size dependent competition between the shape, magnetoelastic and the surface anisotropies of the clusters. This composite material thus has great potential to serve as spin-injector and spinstorage medium in GaN based spintronics of the future.

cond-mat.mtrl-sci↗

arXiv2017

One step growth of GaN/SiO2 core/shell nanowire in vapor-liquid-solid route by chemical vapor deposition technique

GaN/SiO2 core/shell nanowires are grown by cobalt phthalocyanine catalyst assisted vapor-liquid-solid route, in which Si wafer coated with a mixture of gallium and indium is used as the source for Ga and Si and ammonia is used as the precursor for nitrogen and hydrogen. Gallium in the presence of indium and hydrogen, which results from the dissociation of ammonia, forms Si-Ga-In alloy at the growth temperature around 910 degree Celsius. This alloy acts as the source of Si, Ga and In. A detailed study using a variety of characterization tools reveals that these wires, which are several tens of micron long, has a diameter distribution of the core ranging from 20 to 50 nm, while the thickness of the amorphous SiO2 shell layer is about 10 nm. These wires grow along direction. It has also been observed that the average width of these wires decreases, while their density increases as the gallium proportion in the Ga-In mixture is increased.

cond-mat.mtrl-sci↗