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Shoichi Sato

Publications and source records attributed to Shoichi Sato.

14 recordsLinked to original sources

Spin-transport characteristics in a Si-based spin metal-oxide-semiconductor field-effect transistor (spin MOSFET): Bias dependence of the spin polarization in Si and magnetoresistance in spin-valve signals

We have studied the spin transport characteristics of a spin metal-oxide-semiconductor field-effect transistor (spin MOSFET), particularly the bias voltage dependence of the electron spin polarization P_S in Si and the magnetoresistance ratio MR in spin-valve signals, to optimize the device performance. The spin MOSFET device has an 8-nm-thick p-Si channel with a back gate (G) and ferromagnetic source / drain (S/D) junctions consisting of Fe/Mg/MgO/SiOx/n+-Si. In addition to transistor characteristics with an on-off ratio of 104, clear spin-valve signals and Hanle spin precession signals were observed at 4 K in a wide range of the source-to-gate V_GS and source-to-drain V_DS bias voltages. We achieved a high P_S of 50% and a high MR of 0.35% as the maximum values in their single-peaked curves plotted as a function of the junction voltage V_J, mainly because the ferromagnetic S/D junction can generate high P_S and the spin diffusion length is very long in the Si inversion channel. These P_S and MR values are the highest ever reported in spin-MOSFETs. Our spin transport model for our spin MOSFET structure was improved in this study by taking into account the electron distribution and band profile of the n+-Si regions in the ferromagnetic S/D junctions, which enables the accurate estimation of P_S. Detailed analyses with various V_GS and V_J clarified that P_S is determined only by V_J. Our analyses also revealed that the main parameters for determining MR, such as P_S and the resistance-area products of the S/D ferromagnetic junctions, have different V_J dependences, leading to the finding that the present device does not exploit the full potential of the ferromagnetic S/D junctions to maximize MR. Based on the results, we discuss the device physics and engineering for further enhancement of MR, with a focus on the electrical and spin-related properties of the ferromagnetic S/D junctions.

cond-mat.mes-hall

Spin injection in Si-based ferromagnetic tunnel junctions with MgO/MgAl2O4 barriers:Experimental and theoretical investigation of barrier thickness-dependent spin tunneling efficiency

We have experimentally and theoretically investigated the spin transport in Fe/Mg/MgO/MgAl2O4/n+-Si(001) ferromagnetic tunnel junctions on a Si substrate, by systematically varying the thickness combination of amorphous MgO and MgAl2O4 tunnel barrier layers with a sliding shutter between the evaporation sources and substrate during electron-beam evaporation. A technical advantage of MgAl2O4 is that a continuous and flat thin film is realized on a Si substrate even when the MgAl2O4 thickness is as thin as 0.5 nm, unlike MgO, which enables us to examine the spin transport in a thinner range of the tunnel barrier thickness. Our distinct finding is as follows: When the Fe/Mg/MgO interface is used on the top side, the spin polarization PS of tunneling electrons increases at 10 K as the total MgO/MgAl2O4 tunnel barrier thickness (tox = 0.47 - 1.4 nm) is increased, regardless of different thickness combinations, and PS shows saturation-like behavior when tox is above 1.1 nm. Since this feature cannot be explained by the well-known conductivity mismatch in semiconductor-based ferromagnetic tunnel junctions, we propose a simple phenomenological tunneling model based on two different direct tunneling paths, which have higher/lower spin polarizations with longer/shorter decay lengths. Our numerical calculation reproduces the relationship between the spin polarization PS and total tunnel barrier thickness tox in the experiments, indicating that the dominant mechanism is an increasing contribution of the lower spin polarization path as tox is decreased. We discuss possible origins for this phenomenon including intrinsic and extrinsic tunneling mechanisms. Our analysis method provides an insight into the detailed spin transport physics in semiconductor-based ferromagnetic junctions, particularly, with a very thin tunnel barrier layer.

physics.app-ph

On-chip calibrated radio-frequency measurement at cryogenic temperatures for determination of SrTiO3-based capacitor properties

Quantum computing has emerged as a promising technology for next-generation information processing, utilizing semiconductor quantum dots as one of the candidates for quantum bits. Radio-frequency (rf) reflectometry plays an important role in the readout of quantum dots but requires a precise rf measurement technique at cryogenic temperatures. While cryogenic calibration techniques, essential for rf reflectometry, have been developed, on-chip calibration near the device remains an important challenge. In this study, we develop an on-chip calibrated rf measurement system operating at 4K for characterizing SrTiO3-based varactors, which are promising components for tunable impedance matching circuits. Our system enables accurate measurements by eliminating errors associated with long rf circuit lines. We investigate the effects of annealing conditions, crystal orientation, and Ca doping of SrTiO3 crystals on the varactor properties in the frequency range for rf reflectometry. Our results provide insights for optimizing these components for cryogenic rf applications in quantum information processing systems.

cond-mat.mes-hall

RFSoC-based radio-frequency reflectometry in gate-defined bilayer graphene quantum devices

Quantum computers require both scalability and high performance for practical applications. While semiconductor quantum dots are promising candidates for quantum bits, the complexity of measurement setups poses an important challenge for scaling up these devices. Here, radio-frequency system-on-chip (RFSoC) technology is exepcted for a promising approach that combines scalability with flexibility. In this paper, we demonstrate RF reflectometry in gate-defined bilayer graphene quantum devices using RFSoC-based measurement architecture. By controlling the confinement strength through gate voltages, we achieve both Fabry-Pérot interferometer and quantum dot operations in a single device. Although impedance matching conditions currently limit the measurement sensitivity, we identify pathways for optimization through tunnel barrier engineering and resonator design. These results represent a step toward integrating high-bandwidth measurements with scalable quantum devices.

cond-mat.mes-hall

Spin injection and detection in a Si-based ferromagnetic tunnel junction: A theoretical model based on the band diagram and experimental demonstration

We have experimentally and theoretically investigated the spin injection/detection polarization in a Si-based ferromagnetic tunnel junction with an amorphous MgO layer, and demonstrated that the experimental features of the spin polarization in a wide bias range can be well explained using our theoretical model based on the band diagram of the junction and the direct tunneling mechanism. It is shown that the spin polarization originates from the band diagrams of the ferromagnetic Fe layer and n+-Si channel in the junction, while the spin selectivity of the MgO tunnel barrier is not necessary. Besides, we clarified the mechanism of the reduction in spin polarization when the bias is high and nonlinear properties are prominent, where the widely-used spin injection/detection model proposed by Valet and Fert is not applicable. The dominant mechanism of such reduction is found to be spin accumulation saturation (SAS) at the n+-Si interface in contact with the MgO layer as the bias is increased in the spin extraction geometry, which is inevitable in semiconductor-based ferromagnetic tunnel junctions. We performed numerical calculations on a two-terminal spin transport device with a n+-Si channel using the junction properties extracted from the experiments, and revealed that the magnetoresistance (MR) ratio is suppressed mainly by SAS in a higher bias range. Furthermore, we proposed methods for improving the MR ratio in two-terminal spin transport devices. Our experiments and theoretical model provide a deep understanding of the spin injection/detection phenomena in semiconductor-based spin transport devices, toward the realization of high performance under reasonably high bias conditions for practical use.

physics.app-ph

Wide dynamic range charge sensor operation by high-speed feedback control of radio-frequency reflectometry

Semiconductor quantum dots are useful for controlling and observing quantum states and can also be used as sensors for reading out quantum bits and exploring local electronic states in nanostructures. However, challenges remain for the sensor applications, such as the trade-off between sensitivity and dynamic range and the issue of instability due to external disturbances. In this study, we demonstrate proportional-integral-differential feedback control of the radio-frequency reflectometry in GaN nanodevices using a field-programmable gate array. This technique can maintain the operating point of the charge sensor with high sensitivity. The system also realizes a wide dynamic range and high sensor sensitivity through the monitoring of the feedback signal. This method has potential applications in exploring dynamics and instability of electronic and quantum states in nanostructures.

cond-mat.mes-hall

On the rate of convergence in homogenization of time-fractional Hamilton-Jacobi equations

Here, we consider periodic homogenization for time-fractional Hamilton--Jacobi equations. By using the perturbed test function method, we establish the convergence, and give estimates on a rate of convergence. A main difficulty is the incompatibility between the function used in the doubling variable method, and the non-locality of the Caputo derivative. Our approach is to provide a lemma to prove the rate of convergence without the doubling variable method with respect to the time variable, which is a key ingredient.

math.AP

Special Solutions to the Space Fractional Diffusion Problem

We derive a fundamental solution $\mathscr{E}$ to a space-fractional diffusion problem on the half-line. The equation involves the Caputo derivative. We establish properties of $\mathscr{E}$ as well as formulas for solutions to the Dirichlet and Neumann problems in terms of convolution of $\mathscr{E}$ with data. We also study integrability of derivative of solutions given in this way. We present conditions sufficient for uniqueness. Finally, we show the infinite speed of signal propagation.

math.AP

Spin transport in Si-based spin metal-oxide-semiconductor field-effect transistors: Spin drift effect in the inversion channel and spin relaxation in the n+-Si source/drain regions

We have experimentally and theoretically investigated the electron spin transport and spin distribution at room temperature in a Si two-dimensional (2D) inversion channel of back-gate-type spin metal-oxide-semiconductor field-effect transistors (spin MOSFETs). The magnetoresistance ratio of the spin MOSFET with a channel length of 0.4$μ$m was increased by a factor of 6 from that in our previous paper [Phys. Rev. B 99, 165301 (2019)] by lowering the parasitic resistances at the source/drain junctions with highly-phosphorus-doped n+-Si regions and by increasing the lateral electric field in the channel along the electron transport, called "spin drift". Clear Hanle signals with some oscillation peaks were observed for the spin MOSFET with a channel length of 10 $μ$ m under the lateral electric field, indicating that the effective spin diffusion length is dramatically enhanced by the spin drift. By taking into account the n+-Si regions and the spin drift in the channel, one-dimensional analytic functions were derived for analyzing the effect of the spin drift on the spin transport through the channel and these functions were found to explain almost all the experimental results. From the calculated spin current and spin distribution, it was revealed that almost all the spins are unflipped during the spin-drift-assisted transport through the 0.4-$μ$m-long inversion channel, but the most part of the injected spins from the source electrode are relaxed in the n+-Si regions of both the source and drain junctions. This means that the spin drift is useful and precise design of the device structure is essential to obtain a higher magnetoresistance ratio. Furthermore, we showed that the effective spin resistances that are introduced in this study are very helpful to understand how to improve the magnetoresistance ratio of spin MOSFETs for practical use.

physics.app-ph

Spin injection into Si in three-terminal vertical and four-terminal lateral devices with Fe/Mg/MgO/Si tunnel junctions having an ultrathin Mg insertion layer

We demonstrated that the spin injection/extraction efficiency is enhanced by an ultrathin Mg insertion layer (<= 2 nm) in Fe/Mg/MgO/n+-Si tunnel junctions. In diode-type vertical three-terminal devices fabricated on a Si substrate, we observed the narrower three-terminal Hanle (N-3TH) signals indicating true spin injection into Si, and estimated the spin polarization in Si to be 16% when the thickness of the Mg insertion layer is 1 nm, whereas no N-3TH signal was observed without Mg insertion. This means that the spin injection/extraction efficiency is enhanced by suppressing the formation of a magnetically-dead layer at the Fe/MgO interface. We have also observed clear spin transport signals, such as non-local Hanle signals and spin-valve signals, in a lateral four-terminal device with the same Fe/Mg/MgO/n+-Si tunnel junctions fabricated on a Si-on-insulator substrate. It was found that both the intensity and linewidth of the spin signals are affected by the geometrical effects (device geometry and size). We have derived analytical functions taking into account the device structures, including channel thickness and electrode size, and estimated important parameters; spin lifetime and spin polarizations. Our analytical functions well explain the experimental results. Our study shows the importance of suppressing a magnetically-dead layer, and provides a unified understanding of spin injection/detection signals in different device geometries.

physics.app-ph

Tunneling magnetoresistance in trilayer structures composed of group-IV ferromagnetic semiconductor Ge1-xFex, MgO, and Fe

Group-IV-based ferromagnetic semiconductor Ge1-xFex (GeFe) is one of the most promising materials for efficient spin injectors and detectors for Si and Ge. Recent first principles calculations (Sakamoto et al., Ref. 9) suggested that the Fermi level is located in two overlapping largely spin-polarized bands formed in the bandgap of GeFe; spin-down d(e) band and spin-up p-d(t2) band. Thus, it is important to clarify how these bands contribute to spin injection and detection. In this study, we show the first successful observation of the tunneling magnetoresistance (TMR) in magnetic tunnel junctions (MTJs) containing a group-IV ferromagnetic semiconductor, that is, in MTJs composed of epitaxially grown Fe/MgO/Ge0.935Fe0.065. We find that the p-d(t2) band in GeFe is mainly responsible for the tunneling transport. Although the obtained TMR ratio is small (0.3%), the TMR ratio is expected to be enhanced by suppressing leak current through amorphous-like crystal domains observed in MgO.

cond-mat.mtrl-sci

Influence of anisotropic magnetoresistance on nonlocal signals in Si-based multi-terminal devices with Fe electrodes

We have investigated the influence of anisotropic magnetoresistance (AMR) on nonlocal signals in Si-based multi-terminal devices with ferromagnetic Fe electrodes. The AMR of the Fe electrodes was found to have a significant influence on nonlocal signals when the in-plane device structure is not optimized. Moreover, realization of a pure spin current by spin diffusion was found to be virtually impossible because of the electric potential distribution in the depth direction in the Si channel. Although apparent signals indicating the spin-valve effect were not detected, we mainly present structural influence on the electric potential distribution which is indispensable for the analyses of spin-dependent transport.

cond-mat.mtrl-sci