arXiv subjects

Simon Fichtner

Publications and source records attributed to Simon Fichtner.

14 recordsLinked to original sources

arXiv2026

Three Million Years Opposite State Data Retention in Partially Switched Wurtzite Ferroelectrics

Ferroelectric memories based on the wurtzite-structured ferroelectrics are projected to store information for more than 3 million years at 150C. These results are extracted by combining standard domain wall motion limited switching kinetics with the near-by-electrode injection model for opposite state retention in ferroelectric random access memory. This impressive performance is greatly aided by switching only a fraction of the total polarization to store data, in order to limit the initial imprint variation of the devices - an effect that is universally observed in films with different thicknesses (60 nm - 270 nm) and different compounds (AlScN and AlScBN). Paradoxically, yet systematically, this reduction in initial imprint consistently results in larger switching polarization after a given time, compared to the fully switching state and 5-7 orders of magnitude improved opposite state retention. Finally, partial switching is able to simultaneously boost endurance against premature polarization loss and breakdown, making it a promising strategy for improved operation of ferroelectric devices with large spontaneous polarization, in particularly wurtzite-structured compounds.

cond-mat.mtrl-sci↗

arXiv2026

Beyond the Parasitic Limit: A Nanoprobing Framework for De-embedding Intrinsic Ferroelectric Properties at the Deep Sub-Micrometer Scale

The continued scaling of ferroelectric devices is critical for next-generation computing architectures, yet it is fundamentally challenged by a metrological bottleneck: at the deep sub-micrometer scale, intrinsic material properties are heavily masked by extrinsic parasitic impedances and geometric fringing fields. Here, we introduce a quantitative, in-situ nanoprobing framework capable of resolving the true electrical response of ferroelectric capacitors down to 165 nm in diameter without the need for lithographic bond pads. Using 20 nm thick AlScN as a model system, we establish a non-linear 'Screened Power Law' model to decouple attofarad-level device capacitances from massive near-field probe interactions. Furthermore, we demonstrate that the apparent degradation of dielectric loss at the nanoscale is a geometric dilution artifact, which we overcome through a conductance scaling analysis. Finally, we apply this framework to large-signal characterization, utilizing leakage-compensation and noise filtering protocols to extract pristine intrinsic hysteresis (C-V and J-E) loops in the discrete few-grain limit. These findings provide a universal analytical toolkit required to overcome the measurement limits of deep-submicron ferroelectrics.

cond-mat.mtrl-sci↗

arXiv2025

Clarification of the Spontaneous Polarization Direction in Crystals with Wurtzite Structure

The wurtzite structure is one of the most frequently found crystal structures in modern semiconductors and its inherent spontaneous polarization is a defining materials property. Despite this significance, confusion has been rampant in the literature with respect to the orientation of the spontaneous polarization inside the unit cell of the wurtzite structure, especially for the technologically very relevant III-N compounds (AlN, GaN, InN). In particular, the spontaneous polarization has been reported to either point up or down for the same unit cell orientation, depending on the literature source - with important implications for, e.g., the carrier type and density expected at interfaces of heterostructures involving materials with wurtzite-structure. This perspective aims to resolve this ambiguity by reviewing available reports on the direction of the energetically preferred polarization direction in the presence of external electric fields, as well as atomically resolved scanning transmission electron microscopy images. While we use ferroelectric wurtzite AlScN as a key example, our conclusions are generalizable to other compounds with the same crystal structure. We demonstrate that a metal-polar unit cell must be associated with an upward polarization vector - which is contrary to long-standing conventional wisdom.

cond-mat.mtrl-sci↗

arXiv2025

Wafer scale reactive sputtering of highly oriented and ferroelectric Al$_{0.6}$Sc$_{0.4}$N from 300 mm AlSc Targets

This paper presents progress towards the large-scale manufacturability of piezo- and ferroelectric Al$_{1-x}$Sc$_x$N thin films with very high Sc content. Al$_{0.6}$Sc$_{0.4}$N layers were deposited by reactive sputtering from a 300 mm diameter Al$_{0.6}$Sc$_{0.4}$N target on standard 200 mm Si wafers with Pt bottom- and Mo top-electrodes. The deposited films were analyzed in depth with X-Ray diffraction (XRD), Reciprocal Space Mapping (RSM), Scanning electron microscopy (SEM) and Energy Dispersive X-Ray Spectroscopy (EDX) showing well oriented c-axis growth over the full wafer with slight variation in the film thickness and Sc content over the wafer radius. An overall low density of abnormally oriented grains (AOG) was found. Further wafer mapping for piezoelectric and dielectric properties showed a piezoelectric performance increase by 40 % in comparison to Al$_{0.7}$Sc$_{0.3}$N while only moderately increasing the permittivity and loss factor. Switching measurements revealed ferroelectric behavior of the film on all measured positions with an average remanent polarization of 88.36 uC/cm$^2$ and an average coercive field of 244 V/um. This successful demonstration opens new opportunities for MEMS applications with demands for high forces like microspeakers or quasi static micromirrors.

cond-mat.mtrl-sci↗

arXiv2025

The effect of boron incorporation on leakage and wake-up in ferroelectric Al_{1-x}Sc_xN

This study explores the influence of boron incorporation on the structural and electrical properties of ferroelectric Aluminum Scandium Nitride (Al_{1-x}Sc_xN ) thin films, focusing on leakage currents, wake-up effects, and imprint behavior. Al_{1-x}Sc_xN films were incorporated with varying boron concentrations and analyzed under different deposition conditions to determine their structural integrity and ferroelectric performance. Key findings include a reduction in leakage currents, non-trivial alterations in bandgap energy as well as an increasing coercive fields with increasing boron content. Films with 6-13 at.% boron exhibited N-polar growth, while those with 16 at.% boron showed mixed polarity after deposition, which affected their ferroelectric response during the initial switching cycles - as did the addition of boron itself compared to pure Al1-xScxN . With increasing boron content, wake-up became gradually more pronounced and was strongest for pure Al_{1-x}B_xN .

cond-mat.mtrl-sci↗

arXiv2025

Interfacial Polarization Switching in Al0.92Sc0.08N/GaN Heterostructures Grown by Sputter Epitaxy

The integration of ferroelectric nitride thin films such as Al1-xScxN onto GaN templates could enable enhanced functionality in novel high-power transistors and memory devices. This requires a detailed understanding of the ferroelectric domain structures and their impact on the electric properties. In this contribution, the sputter epitaxy of highly coherent Al0.92Sc0.08N thin films grown on GaN approaching lattice-matching conditions is demonstrated. Scanning transmission electron microscopy investigations reveal the formation of polar domains and the mechanism of domain propagation upon ferroelectric switching. Atomic resolution imaging suggests that polarization inversion is initiated by an interfacial switching process in which already the first atomic layer of Al1-xScxN changes its polarization from the as-grown M- to N-polarity. An atomically sharp planar polarization discontinuity is identified at the Al0.92Sc0.08N/GaN interface and described by atomic modeling and chemical structure analysis using electron energy loss spectroscopy, considering local lattice spacings. Moreover, residual domains with M-polarity are identified at the top Pt electrode interface. These insights on the location and the atomic structure of ferroelectric inversion domains in sputter deposited Al1-xScxN/GaN heterostructures will support the development of future non-volatile memory devices and novel HEMT structures based on ferroelectric nitride thin films via interface engineering.

cond-mat.mtrl-sci↗

arXiv2024

Improved Leakage Currents and Polarity Control through Oxygen Incorporation in Ferroelectric Al0.73Sc0.27N Thin Films

This article examines systematic oxygen (O)-incorporation to reduce total leakage currents in sputtered wurtzite-type ferroelectric Al0.73Sc0.27N thin films, along with its impact on the material structure and the polarity of the as-grown films. The O in the bulk Al0.73Sc0.27N was introduced through an external gas source during the reactive sputter process. In comparison to samples without doping, O-doped films showed almost a fourfold reduction of the leakage current near the coercive field. In addition, doping resulted in the reduction of the steady-state leakage currents by roughly one order of magnitude sub-coercive fields. Microstructure analysis using X-ray diffraction 1and scanning transmission electron microscopy (STEM) revealed no significant structural degradation of the bulk Al0.73Sc0.27N. In case of the maximum O-doped film, the c-axis out-of-plane texture increased by only 20% from 1.8{\deg} and chemical mapping revealed a uniform distribution of oxygen incorporation into the bulk. Our results further demonstrate the ability to control the as-deposited polarity of Al0.73Sc0.27N via the O-concentration, changing from nitrogen- to metal-polar orientation. Thus, this article presents a promising approach to mitigate the leakage current in wurtzite-type Al0.73Sc0.27N without incurring any significant structural degradation of the bulk thin film quality, thereby making ferroelectric nitrides more suitable for microelectronic applications.

physics.app-ph↗

arXiv2023

Demonstration and STEM Analysis of Ferroelectric Switching in MOCVD-Grown Single Crystalline Al$_{0.85}$Sc$_{0.15}$N

Wurtzite-type Al$_{1-x}$Sc$_x$N solid solutions grown by metal organic chemical vapour deposition are for the first time confirmed to be ferroelectric. The film with 230 nm thickness and x = 0.15 exhibits a coercive field of 5.5 MV/cm at a measurement frequency of 1.5 kHz. Single crystal quality and homogeneous chemical composition of the film was confirmed by X-ray diffraction spectroscopic methods such as time of flight secondary ion mass spectrometry. Annular bright field scanning transmission electron microscopy served to proof the ferroelectric polarization inversion on unit cell level. The single crystal quality further allowed to image the large-scale domain pattern of a wurtzite-type ferroelectric for the first time, revealing a predominantly cone-like domain shape along the c-axis of the material. As in previous work, this again implies the presence of strong polarization discontinuities along this crystallographic axis, which could be suitable for current transport. The domains are separated by narrow domain walls, for which an upper thickness limit of 3 nm was deduced, but which could potentially be atomically sharp. We are confident that these results will advance the commencing integration of wurtzite-type ferroelectrics to GaN as well as generally III-N based heterostructures and devices.

physics.app-ph↗

arXiv2023

The Interplay Between Imprint, Wake-Up Like Effects and Domains in Ferroelectric AlScN

This paper investigates wake-up and imprint in ferroelectric AlScN films. The study employs a series of I-V and P-E measurements with varying electric field amplitudes and voltage cycles as well as structural investigation via Scanning Electron Microscopy to understand the origin and underlying principle of wake-up and imprint as well as their relation. It is shown that the material can be considered wake-up free, however inherent imprint and imprint shift in combination with minor loops result in a wake-up like effect. We introduce a proposition to explain the influence of initial switching cycles on domains, their stabilization and corresponding changes in imprint. Unipolar fields and temperature investigations are used to explore the reversibility of imprint and ways to program it, while partial switching is applied to investigate domain propagation and support the aforementioned approach. It is concluded, that after an energetically more demanding domain nucleation, domain wall motion can switch the majority of polarization in Al1-xScxN. As a consequence, the presence of initial domains reduces the coercive field in respect to unipolar films.

cond-mat.mtrl-sci↗

arXiv2023

In-Grain Ferroelectric Switching in Sub-5 nm Thin AlScN Films at 1 V

Analog switching in ferroelectric devices promises neuromorphic computing with highest energy efficiency, if limited device scalability can be overcome. To contribute to a solution, we report on the ferroelectric switching characteristics of sub-5 nm thin Al$_{0.74}$Sc$_{0.26}$N films grown on Pt/Ti/SiO2/Si and epitaxial Pt/GaN/sapphire templates by sputter-deposition. In this context, we focus on the following major achievements compared to previously available wurtzite-type ferroelectrics: 1) Record low switching voltages down to 1 V are achieved, which is in a range that can be supplied by standard on-chip voltage sources. 2) Compared to the previously investigated deposition of thinnest Al$_{1-x}$Sc$_x$N films on epitaxial templates, a significantly larger coercive field to breakdown field ratio is observed for Al$_{0.74}$Sc$_{0.26}$N films grown on silicon substrates, the technologically most relevant substrate-type. 3) The formation of true ferroelectric domains in wurtzite-type materials is for the first time demonstrated on the atomic scale by scanning transmission electron microscopy investigations of a sub-5 nm thin partially switched film. The direct observation of inversion domain boundaries within single nm-sized grains supports the theory of a gradual domain-wall motion limited switching process in wurtzite-type ferroelectrics. Ultimately, this should enable the analog switching necessary for mimicking neuromorphic concepts also in highly scaled devices.

cond-mat.mtrl-sci↗

arXiv2022

Ultrathin AlScN for low-voltage driven ferroelectric-based devices

Thickness scaling of ferroelectricity in AlScN is a determining factor for its potential application in neuromorphic computing and memory devices. In this letter, we report on ultrathin (10 nm) Al0.72Sc0.28N films that are ferroelectrically switchable at room temperature. All-epitaxial Al0.72Sc0.28N/Pt heterostructures are grown by magnetron sputtering onto GaN/sapphire substrates followed by an in situ Pt capping approach to avoid oxidation of the Al0.72Sc0.28N film surface. Structural characterization by X-ray diffraction and transmission electron microscopy reveals the established epitaxy. The thus obtained high-quality interfaces in combination with the in situ capping is expected to facilitate ferroelectric switching of AlScN in the ultrathin regime. The analysis of the relative permittivity and coercive field dependence on the Al0.72Sc0.28N film thicknesses in the range of 100 nm down to 10 nm indicates only moderate scaling effects, suggesting that the critical thickness for ferroelectricity is not yet approached. Furthermore, the deposited layer stack demonstrates the possibility of including ultrathin ferroelectric AlScN into all-epitaxial GaN-based devices using sputter deposition techniques. Thus, our work highlights the integration and scaling potential of all-epitaxial ultrathin AlScN offering high storage density paired with low voltage operation desired for state of the art ferroelectric memory devices.

physics.app-ph↗

arXiv2021

On the exceptional temperature stability of ferroelectric AlScN thin films

Through its dependence on low symmetry crystal phases, ferroelectricity is inherently a property tied to the lower temperature ranges of the phase diagram for a given material. This paper presents conclusive evidence that in the case of ferroelectric AlScN, low temperature has to be seen as a purely relative term, since its ferroelectric-to-paraelectric transition temperature is confirmed to surpass 1100{\deg}C and thus the transition temperature of virtually any other thin film ferroelectric. We arrived at this conclusion through investigating the structural stability of 0.4 - 2 ${\mu}$m thick Al$_{0.73}$Sc$_{0.27}$N films grown on Mo bottom electrodes via in situ high-temperature X-ray diffraction and permittivity measurements. Our studies reveal the wurtzite-type structure of Al$_{0.73}$Sc$_{0.27}$N is conserved during the entire 1100{\deg}C annealing cycle, apparent through a constant c over a lattice parameter ratio. In situ permittivity measurements performed up to 1000{\deg}C strongly support this conclusion and include what could be the onset of a diverging permittivity only at the very upper end of the measurement interval. Our in situ measurements are well-supported by ex situ (scanning) transmission electron microscopy and polarization and capacity hysteresis measurements. These results confirm the structural stability on the sub-${\mu}$m scale next to the stability of the inscribed polarization during the complete 1100{\deg}C annealing treatment. Thus, AlScN is the first readily available thin film ferroelectric with a temperature stability that surpasses virtually all thermal budgets occurring in microtechnology, be it during fabrication or the lifetime of a device - even in harshest environments.

cond-mat.mtrl-sci↗

arXiv2020

Ferroelectricity in AlScN: Switching, Imprint and sub-150 nm Films

The discovery of ferroelectricity in AlScN allowed the first clear observation of the effect in the wurtzite crystal structure, resulting in a material with a previously unprecedented combination of very large coercive fields (2-5 MV/cm) and remnant polarizations (70-110 ${\mu}$C/cm$^2$). We obtained initial insight into the switching dynamics of AlScN, which suggests a domain wall motion limited process progressing from the electrode interfaces. Further, imprint was generally observed in AlScN films and can tentatively be traced to the alignment of charged defects with the internal and external polarization and field, respectively. Potentially crucial from the application point of view, ferroelectricity could be observed in films with thicknesses below 30 nm - as the coercive fields of AlScN were found to be largely independent of thickness between 600 nm and 27 nm.

cond-mat.mtrl-sci↗

arXiv2018

AlScN: A III-V semiconductor based ferroelectric

Ferroelectric switching is unambigiously demonstrated for the first time in a III-V semiconductor based material: AlScN -- A discovery which could help to satisfy the urgent demand for thin film ferroelectrics with high performance and good technological compatibility with generic semiconductor technology which arises from a multitude of memory, micro/nano-actuator and emerging applications based on controlling electrical polarization. The appearance of ferroelectricity in AlScN can be related to the continuous distortion of the original wurtzite-type crystal structure towards a layered-hexagonal structure with increasing Sc content and tensile strain, which is expected to be extendable to other III-nitride based solid solutions. Coercive fields which are systematically adjustable by more than 3 MV/cm, high remnant polarizations in excess of 100 \mu C/cm$^2$ which constitute the first experimental estimate of the previously inaccessible spontaneous polarization in a III-nitride based material, an almost ideally square-like hysteresis resulting in excellent piezoelectric linearity over a wide strain interval from -0.3% to +0.4% as well as a paraelectric transition temperature in excess of 600{\deg}C are confirmed. This intriguing combination of properties is to our knowledge as of now unprecedented in the field of polycrystalline ferroelectric thin films and promises to significantly advance the commencing integration of ferroelectric functionality to micro- and nanotechnology, while at the same time providing substantial insight to one of the central open questions of the III-nitride semiconductors - that of their actual spontaneous polarization.

cond-mat.mtrl-sci↗